Modulation of rolling k vectors of angled gratings

US11670482B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11670482-B2
Application numberUS-202017037935-A
CountryUS
Kind codeB2
Filing dateSep 30, 2020
Priority dateDec 17, 2018
Publication dateJun 6, 2023
Grant dateJun 6, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.

First claim

Opening claim text (preview).

What is claimed is: 1. A device comprising: A substrate having a discrete input coupling region, a discrete intermediate coupling region, and a discrete output coupling region, each of the regions having a plurality of optical device fins disposed on the substrate, the plurality of optical device fins of each region comprising: at least one first optical device fin having a first slant angle; at least one second optical device fin having a second slant angle different than the first slant angle; and at least one third optical device fin having a third slant angle different than the first slant angle and the second slant angle, wherein: the second slant angle is greater than the first slant angle and the third slant angle is greater than the second slant angle; or the first slant angle is greater than the second slant angle and the second slant angle is greater than the third slant angle. 2. The device of claim 1 , wherein each of the at least one first optical device fin corresponds to a first portion of optical device fins, the at least one second optical device fin corresponds to a second portion of optical device fins, and the at least one third optical device fin corresponds to a third portion of optical device fins. 3. The device of claim 1 , wherein the first, second, and third slant angles correspond to a rolling k-vector across a surface of the substrate. 4. The device of claim 1 , wherein the plurality of optical device fins include at least one of silicon oxycarbide (SiOC), titanium oxide, titanium oxide nanomaterials, niobium oxide, niobium-germanium (Nb 3 Ge), silicon dioxide (SiO 2 ), silicon oxycarbonitride (SiOCN), vanadium (IV) oxide, aluminum oxide (Al 2 O 3 ), indium tin oxide (ITO), zinc oxide (ZnO), tantalum pentoxide (Ta 2 O 5 ), silicon nitride (Si 3 N 4 ), Si 3 N 4 silicon-rich, Si 3 N 4 hydrogen-doped, Si 3 N 4 boron-doped, silicon carbon nitrate (SiCN), titanium nitride (TiN), zirconium dioxide (ZrO 2 ), germanium (Ge), gallium phosphide (GaP), poly-crystalline (PCD), nanocrystalline diamond (NCD), or doped diamond containing materials.

Assignees

Inventors

Classifications

  • Grating · CPC title

  • H01J37/15Primary

    External mechanical adjustment of electron or ion optical components (H01J37/067, H01J37/20 take precedence) · CPC title

  • Etching microareas · CPC title

  • for microworking, e. g. etching of gratings or trimming of electrical components · CPC title

  • Manufacturing methods · CPC title

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What does patent US11670482B2 cover?
Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/15. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 06 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).