Method of imprinting tilt angle light gratings
US-2019369321-A1 · Dec 5, 2019 · US
US11670482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11670482-B2 |
| Application number | US-202017037935-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 30, 2020 |
| Priority date | Dec 17, 2018 |
| Publication date | Jun 6, 2023 |
| Grant date | Jun 6, 2023 |
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Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.
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What is claimed is: 1. A device comprising: A substrate having a discrete input coupling region, a discrete intermediate coupling region, and a discrete output coupling region, each of the regions having a plurality of optical device fins disposed on the substrate, the plurality of optical device fins of each region comprising: at least one first optical device fin having a first slant angle; at least one second optical device fin having a second slant angle different than the first slant angle; and at least one third optical device fin having a third slant angle different than the first slant angle and the second slant angle, wherein: the second slant angle is greater than the first slant angle and the third slant angle is greater than the second slant angle; or the first slant angle is greater than the second slant angle and the second slant angle is greater than the third slant angle. 2. The device of claim 1 , wherein each of the at least one first optical device fin corresponds to a first portion of optical device fins, the at least one second optical device fin corresponds to a second portion of optical device fins, and the at least one third optical device fin corresponds to a third portion of optical device fins. 3. The device of claim 1 , wherein the first, second, and third slant angles correspond to a rolling k-vector across a surface of the substrate. 4. The device of claim 1 , wherein the plurality of optical device fins include at least one of silicon oxycarbide (SiOC), titanium oxide, titanium oxide nanomaterials, niobium oxide, niobium-germanium (Nb 3 Ge), silicon dioxide (SiO 2 ), silicon oxycarbonitride (SiOCN), vanadium (IV) oxide, aluminum oxide (Al 2 O 3 ), indium tin oxide (ITO), zinc oxide (ZnO), tantalum pentoxide (Ta 2 O 5 ), silicon nitride (Si 3 N 4 ), Si 3 N 4 silicon-rich, Si 3 N 4 hydrogen-doped, Si 3 N 4 boron-doped, silicon carbon nitrate (SiCN), titanium nitride (TiN), zirconium dioxide (ZrO 2 ), germanium (Ge), gallium phosphide (GaP), poly-crystalline (PCD), nanocrystalline diamond (NCD), or doped diamond containing materials.
Grating · CPC title
External mechanical adjustment of electron or ion optical components (H01J37/067, H01J37/20 take precedence) · CPC title
Etching microareas · CPC title
for microworking, e. g. etching of gratings or trimming of electrical components · CPC title
Manufacturing methods · CPC title
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