High selectivity atomic later deposition process

Patent metadata

Field	Value
Publication number	US-11664215-B2
Application number	US-202016802290-A
Country	US
Kind code	B2
Filing date	Feb 26, 2020
Priority date	Mar 20, 2019
Publication date	May 30, 2023
Grant date	May 30, 2023

Abstract

Methods for depositing a metal containing material formed on a certain material of a substrate using an atomic layer deposition process for semiconductor applications are provided. In one example, a method of forming a metal containing material on a substrate comprises pulsing a first gas precursor comprising a metal containing precursor to a surface of a substrate, pulsing a second gas precursor comprising a carboxylic acid to the surface of the substrate, and forming a metal containing material selectively on a first material of the substrate. In another example, a method of forming a metal containing material on a substrate includes selectively forming a metal containing layer on a silicon material or a metal material on a substrate than on an insulating material on the substrate by an atomic layer deposition process by alternatively supplying a metal containing precursor and a water free precursor to the substrate.

First claim

The invention claimed is:

1. A method of forming a metal containing material on a substrate comprising:
heating a substrate to a temperature in a range from about 150 degrees Celsius to about 300 degrees Celsius during a thermal atomic layer deposition (ALD) process;
performing the thermal ALD process comprising two or more ALD cycles, each ALD cycle comprising:
pulsing a first gas precursor comprising a metal containing precursor to a surface of the substrate, wherein the metal containing precursor is at least one of titanium (IV) isopropoxide (Ti(OCH(CH 3 ) 2 ) 4 , titanium n-butoxide (n-C 4 H 9 O) 4 Ti), and titanium t-butoxide (t-C 4 H 9 O) 3 Ti), and wherein a first portion of the surface is a hydrogen-terminated surface and a second portion of the surface is an alkyl-terminated surface; then
supplying a purge gas to the surface of the substrate; then
pulsing a second gas precursor comprising a carboxylic acid to the surface of the substrate, wherein the carboxylic acid is free of water; then
supplying a purge gas to the surface of the substrate; and

forming a metal containing material selectively on the first portion of the surface while maintaining the second portion of the surface free, or substantially free, of the metal.

2. The method of claim 1 , wherein the first and the second gas precursors are alternatively supplied.

3. The method of claim 1 , wherein the substrate comprises a second material different from the first material.

4. The method of claim 3 , wherein the first material is a silicon material or a metal material.

5. The method of claim 4 , wherein the second material is an insulating material.

6. The method of claim 5 , wherein the insulating material is at least one of SiO 2 , SiON, SiN, SiOC and SiCOH.

7. The method of claim 1 , wherein the carboxylic acid is at least one of acetic acid (CH 3 COOH), benzoic acid (C 6 H 5 COOH), formic acid (HCOOH), chloroacetic acid (CH 2 ClCOOH), dichloroacetic acid (CHCl 2 COOH), oxalic acid (HO 2 CCOOH), trichloroacetic acid (CCl 3 CO 2 H), and trifluoroacetic acid (CF 3 COOH).

8. The method of claim 1 , wherein the metal containing material is a TiO layer.

9. The method of claim 1 , further comprising:
controlling the process temperature to greater than 150 degrees Celsius when forming the metal containing material.

10. The method of claim 1 , wherein the first gas precursor is pulsed at a greater dosing concentration greater than the second gas precursor.

11. The method of claim 1 , a ratio of a dose concentration of the first gas precursor to the second gas precursor is controlled between about 15:1 to about 30:1.

12. A method of forming a metal containing material on a substrate comprising:
heating a substrate to a temperature in a range from about 150 degrees Celsius to about 300 degrees Celsius during a thermal atomic layer deposition (ALD) process;
performing the thermal ALD process by alternatively pulsing a first and a second gas precursor to a surface of a substrate, separated by supplying pulses of a purge gas to the substrate, the surface of the substrate comprising a first and a second material, wherein the first material of the surface is a hydrogen-terminated surface and a second material of the surface is an alkyl-terminated surface, wherein the first gas precursor comprises a metal containing gas and the second gas precursor comprises a water free precursor, and wherein the metal containing gas is at least one of titanium (IV) isopropoxide (Ti(OCH(CH 3 ) 2 ) 4 , titanium n-butoxide (n-C 4 H 9 O) 4 Ti), and titanium t-butoxide (t-C 4 H 9 O) 3 Ti); and
selectively forming a metal containing material on the first material of the substrate while maintaining the second material of the surface substantially free of the metal.

13. The method of claim 12 , further comprising:
maintaining a substrate temperature at greater than 150 degrees Celsius while performing the atomic layer deposition process.

14. The method of claim 12 , wherein the water free precursor is carboxylic acid.

15. A method of forming a metal containing material on a substrate comprising:
heating a substrate to a temperature in a range from about 150 degrees Celsius to about 300 degrees Celsius during a thermal atomic layer deposition (ALD) process
selectively forming a metal containing layer on a silicon material or a metal material on a substrate than on an insulating material on the substrate by the thermal ALD process by alternatively supplying a metal containing precursor and a water free precursor to the substrate, separated by supplying pulses of a purge gas to the substrate, wherein the metal containing precursor is at least one of titanium (IV) isopropoxide (Ti(OCH(CH 3 ) 2 ) 4 , titanium n-butoxide (n-C 4 H 9 O) 4 Ti), and titanium t-butoxide (t-C 4 H 9 O) 3 Ti); and
forming a metal containing material selectively on the first material of the surface while maintaining the second material of the surface free, or substantially free, of the metal wherein the first material of the surface is a hydrogen-terminated surface and a second material of the surface is an alkyl-terminated surface.

Assignees

• Applied Materials Inc

Inventors

• Ahles Christopher
• CHOI Jong
• Kummel Andrew C
• WONG Keith Tatseun
• Nemani Srinivas D

Classifications

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P14/668

  the materials being characterised by the deposition precursor materials · CPC title

• H10P14/69394 Primary

  the material containing titanium, e.g. TiO2 · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P14/69392

  the material containing hafnium, e.g. HfO2 · CPC title