Integrated electrospray ion source

Patent metadata

Field	Value
Publication number	US-11664210-B2
Application number	US-201916971436-A
Country	US
Kind code	B2
Filing date	Feb 20, 2019
Priority date	Feb 20, 2018
Publication date	May 30, 2023
Grant date	May 30, 2023

Abstract

In one aspect, an ion source for use in a mass spectrometry system is disclosed, which comprises a housing, a first and a second ion probe coupled to said housing, and a first and a second emitter configured for coupling, respectively, to said first and second ion probes. The first ion probe is configured for receiving a sample at a flow rate in nanoflow regime and the second ion probe is configured for receiving a sample at a flow rate above the nanoflow regime. Each of the ion probes includes a discharge end (herein also referred to as the discharge tip) for ionizing at least one constituent of the received sample. In some embodiment, each ion probe receives the sample from a liquid chromatography (LC) column. Further, the ion probes can be interchangeably disposed within the housing.

First claim

What is claimed is:

1. An ion source for use in a mass spectrometry system, comprising:
a housing providing first and second openings,
a first ion probe accommodating sample flow rates in a nanoflow regime and a second ion probe accommodating sample flow rates above nanoflow regime,
the first opening being configured for coupling the first ion probe to the housing and the second opening being configured for coupling the second ion probe to the housing,
each of said ion probes comprising a discharge tip for ionizing at least a constituent of a sample received by said probe,
wherein each of said probes comprises an emitter extending beyond the discharge tip of the probe by a non-adjustable length,
circuitry for determining if any of said first and second openings is plugged,
wherein said circuitry comprises a resistance-measuring device for measuring electrical resistance across said first and second openings, and a controller for receiving values of said measured electrical resistance and processing said received resistance values to determine if any of said first and second opening is plugged.

2. The ion source of claim 1 , wherein said two openings are configured such that said first and second probes are disposed at an angle relative to one another.

3. The ion source of claim 2 , wherein said angle is about 90 degrees.

4. The ion source of claim 1 , wherein said housing and said probes are configured such that the probes can be interchangeably disposed in said housing.

5. The ion source of claim 1 , further comprising at least one heater disposed in said housing.

6. The ion source of claim 5 , wherein said at least one heater comprises a first and a second heater and said first and second heaters are disposed non-coaxially relative to a longitudinal axis of at least one of said first and second probes.

7. The ion source of claim 6 , wherein said first and second heaters and said at least one of said first and second ion probe are arranged in a non-coplanar manner.

8. The ion source of claim 1 , wherein said ion source is configured for interfacing with a curtain plate of a mass spectrometer, wherein said curtain plate comprises an orifice through which at least a portion of the ions generated by any of said first and second ion probes enters downstream components of the mass spectrometer.

9. The ion source of claim 8 , wherein said first opening of the housing and said first probe are configured such that said first probe is positioned in the housing such that a longitudinal axis thereof is substantially co-axial with a central axis associated with said orifice of said curtain plate.

10. The ion source of claim 9 , wherein said second opening of the housing and said second probe are configured for positioning said second probe in the housing such that a longitudinal axis thereof is substantially orthogonal to said orifice axis.

11. The ion source of claim 1 , wherein said first and second openings of the housing are configured for positioning said first and second ion probes in the housing such that discharge tips thereof are non-adjustably disposed relative to said orifice of the curtain plate.

12. The ion source of claim 1 , wherein said ion source is operable with any of said first or said second probe.

13. The ion source of claim 1 , wherein said ion source is operable with at least one of said first and second ion probes.

14. The ion source of claim 1 , wherein any of said first and second ion probe is an electrospray ion probe.

15. The ion source of claim 14 , wherein said electrospray ion probe comprises a nebulization assist.

16. The ion source of claim 1 , further comprising at least one cap having a resistive element for plugging at least one of said openings in absence of an ion probe being coupled to the opening.

17. The ion source of claim 1 , wherein each of the ion probes comprises an identification electrical resistance that differs from the respective identification electrical resistance of the other ion probe.

18. The ion source of claim 17 , further comprising a resistance-measuring device for measuring the electrical resistance of each of said ion probes.

19. The ion source of claim 18 , further comprising a controller in communication with said resistance-measuring device to receive the measured electrical resistance associated with each of the ion probes and process said measured electrical resistances to identify each of said probes as accommodating a flow rate in the nanoflow regime or above nanoflow regime.

20. The ion source of claim 19 , further comprising a power supply for providing electrical power to said ion probes, and wherein said controller is in communication with the power supply to control the power supply based on received measurements of electrical resistance of the ion probes for application of electrical power to the probes.

21. The ion source of claim 1 , wherein the source housing is sealed and comprises an actively pumped exhaust for removing gaseous by-products.

22. An ion source for use in a mass spectrometry system, comprising:
a housing providing first and second openings,
a first ion probe accommodating sample flow rates in a nanoflow regime and a second ion probe accommodating sample flow rates above nanoflow regime,
said first opening being configured for coupling the first ion probe to the housing and said second opening being configured for coupling the second ion probe to the housing,
each of said ion probes comprising a discharge tip for ionizing at least a constituent of a sample received by said ion probe,
wherein each of said ion probes comprises an emitter fixedly positioned relative to a discharge tip of the probe, and
at least one cap having a resistive element for plugging at least one of said openings in absence of an ion probe being coupled to the opening, and
wherein said circuitry is configured to measure resistance of said resistive element for determining whether said opening is plugged.

23. The ion source of claim 22 , wherein said circuitry comprises a resistance-measuring device for measuring the resistance of said resistive element and a controller for receiving said measured resistance and processing said measured resistance to determine whether the opening is plugged.

24. A mass spectrometer system, comprising:
an ion source for generating ions,
a curtain plate having an orifice for receiving at least a portion of said ions, and
one or more mass analyzers disposed downstream of said orifice of the curtain plate,
wherein said ion source comprises:
a housing providing first and second openings,
a first ion probe accommodating sample flow rates in a nanoflow regime and a second ion probe accommodating sample flow rates above nanoflow regime,
the first opening being configured for coupling the first ion probe to the housing and the second opening being configured for coupling the second ion probe to the housing,
each of said probes comprising an emitter for ionizing at least one constituent of a sample flowing through the ion probe,
wherein the emitter of each of said ion probes extends beyond a discharge tip of the ion probe by a non-adjustable length,
circuitry for determining if any of said first and second openings is plugged,
wherein said circuitry comprises a resistance-measuring device for measuring electrical resistance across said first and second openings, and a controller for receiving values of said measured electrical resistance

Assignees

• Dh Technologies Dev Pte Ltd

Inventors

• Corr John J
• Covey Thomas R
• Kovarik Peter
• Schneider Bradley B

Classifications

• H01J49/107 Primary

  Arrangements for using several ion sources · CPC title

• H01J49/165 Primary

  Electrospray ionisation · CPC title

• H01J49/0031

  Step by step routines describing the use of the apparatus (H01J49/0081 takes precedence) · CPC title