Widely tunable infrared source system and method

US11658454B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11658454-B2
Application numberUS-202117323003-A
CountryUS
Kind codeB2
Filing dateMay 18, 2021
Priority dateJun 20, 2012
Publication dateMay 23, 2023
Grant dateMay 23, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the grating, and a micro-electro-mechanical systems device containing a plurality of adjustable micro-mirrors.

First claim

Opening claim text (preview).

What is claimed is: 1. A laser system comprising: a plurality of beam emitters each forming an external lasing cavity with an external optical element, whereby each lasing cavity stabilizes a beam emitted by the beam emitter to a different wavelength; and disposed outside and optically downstream of each external lasing cavity, a diffraction grating positioned to receive the stabilized beams, diffract each beam, and direct first-order diffracted light from each beam toward a common direction to thereby form a multi-wavelength output beam. 2. The laser system of claim 1 , wherein the external lasing cavities each share a common external optical element. 3. The laser system of claim 1 , wherein each external optical element comprises a reflector. 4. The laser system of claim 1 , wherein the beam emitters are mechanically positioned so that the beams emitted thereby converge toward the diffraction grating. 5. The laser system of claim 1 , wherein the diffraction grating comprises a reflective diffraction grating. 6. The laser system of claim 1 , further comprising a second optical element configured to collimate and/or focus the output beam downstream of the diffraction grating. 7. The laser system of claim 1 , further comprising a second optical element configured to converge beams emitted by the beam emitters toward the diffraction grating. 8. The laser system of claim 1 , wherein each beam emitter comprises a laser diode. 9. The laser system of claim 1 , wherein each beam emitter comprises a quantum cascade laser. 10. The laser system of claim 1 , wherein each beam emitter is lensed with collimating optics. 11. The laser system of claim 1 , wherein each beam emitter emits visible light. 12. The laser system of claim 1 , wherein the common direction of the reflected first-order diffracted light is away from the plurality of beam emitters. 13. The laser system of claim 1 , wherein the common direction of the reflected first-order diffracted light is approximately perpendicular to a propagation direction of light emitted by at least one of the beam emitters toward the diffraction grating. 14. The laser system of claim 1 , wherein the diffraction grating has a grating dispersion of at least 150 lines per millimeter. 15. The laser system of claim 1 , wherein wavelengths of the beams emitted by the beam emitters are linearly chirped. 16. A laser system of claim 1 comprising: a plurality of beam emitters each forming an external lasing cavity with an external optical element, whereby each lasing cavity stabilizes a beam emitted by the beam emitter to a different wavelength; and a diffraction grating positioned to receive the stabilized beams, diffract each beam, and direct first-order diffracted light from each beam toward a common direction to thereby form a multi-wavelength output beam, wherein the external optical element in each external lasing cavity is rotatable for wavelength selection. 17. A laser system comprising: a plurality of beam emitters each forming an external lasing cavity with an external optical element, whereby each lasing cavity stabilizes a beam emitted by the beam emitter to a different wavelength; and a diffraction grating positioned to receive the stabilized beams, diffract each beam, and direct first-order diffracted light from each beam toward a common direction to thereby form a multi-wavelength output beam, wherein the external optical elements are each a reflector in an array of reflectors. 18. The laser system of claim 17 , wherein the array of reflectors is at least a portion of a micro-electro-mechanical systems device. 19. The laser system of claim 17 , wherein the array of reflectors is at least a portion of a digital light processing chip. 20. The laser system of claim 17 , wherein each of the reflectors within the array of reflectors is individually controllable.

Assignees

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Classifications

  • Lasers provided with means to change the location from which, or the direction in which, laser radiation is emitted · CPC title

  • using beam deflecting elements · CPC title

  • provided with a periodic structure, e.g. using distributed feed-back, grating couplers (controlling, e.g. modulating distributed feed-back lasers H01S3/102) · CPC title

  • Littman-Metcalf configuration, e.g. laser - grating - mirror · CPC title

  • Bottom walls · CPC title

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What does patent US11658454B2 cover?
A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the …
Who is the assignee on this patent?
Chann Bien, Huang Robin, Tayebati Parviz, and 1 more
What technology area does this patent fall under?
Primary CPC classification H01S3/105. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).