Charged particle beam device

Patent metadata

Field	Value
Publication number	US-11640897-B2
Application number	US-201716641870-A
Country	US
Kind code	B2
Filing date	Sep 4, 2017
Priority date	Sep 4, 2017
Publication date	May 2, 2023
Grant date	May 2, 2023

Abstract

The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.

First claim

The invention claimed is:

1. A charged particle beam apparatus for irradiating a specimen with a charged particle beam, the apparatus comprising:
an electron beam irradiation unit that emits an electron beam to the specimen; and
an objective lens for focusing the electron beam on the specimen, wherein
the objective lens includes
a first magnetic pole piece,
a second magnetic pole piece that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece, and
a second coil that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,

the charged particle beam apparatus further comprises:
a control unit that controls a current to be passed to the first coil and a current to be passed to the second coil; and
a storage unit that stores an instruction to the control unit, wherein
according to the instruction stored in the storage unit, the control unit performs at least one of a first mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the second coil after turning off a current flowing through to the first coil and a second mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the second coil after turning off a current flowing through to the first coil; and
an ion beam irradiation unit that emits a focused ion beam to the specimen, wherein
the control unit irradiates the specimen with the focused ion beam by controlling the ion beam irradiation unit while performing the first mode to process the specimen.

2. The charged particle beam apparatus according to claim 1 , wherein
the control unit reduces a residual magnetic field remaining in the second magnetic pole piece with time by reducing an amplitude of the alternating current with time while the second mode is being performed.

3. The charged particle beam apparatus according to claim 1 , wherein
the control unit is configured to be switchable between a first magnetic lens mode for forming a magnetic lens by passing a current to the first coil and a second magnetic lens mode for forming a magnetic lens by passing a current to the second coil, and
the control unit performs at least one of the first mode and the second mode when an operation mode is switched between the first magnetic lens mode and the second magnetic lens mode.

4. The charged particle beam apparatus according to claim 1 , further comprising:
a third coil that is disposed at a position away from the electron beam path with respect to the second magnetic pole piece, wherein
according to the instruction stored in the storage unit, the control unit performs at least one of a third mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the third coil after turning off the current flowing through the first coil and the current flowing through the second coil and a fourth mode for reducing an effect of the residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the third coil after turning off the current flowing through the first coil and the current flowing through the second coil.

5. The charged particle beam apparatus according to claim 4 , further comprising:
a third magnetic pole piece that is disposed at a position away from the electron beam path with respect to the second coil, wherein
the second magnetic pole piece and the third magnetic pole piece form a magnetic path surrounding the second coil.

6. The charged particle beam apparatus according to claim 1 ,
wherein at least one of the first coil and the second coil is formed by a plurality of coils.

7. The charged particle beam apparatus according to claim 4 , wherein
the number of turns of the second coil is equal to or greater than the number of turns of the first coil, and
the number of turns of the first coil is equal to or greater than the number of turns of the third coil.

8. The charged particle beam apparatus according to claim 1 , wherein
the number of turns of the second coil is equal to or greater than the number of turns of the first coil.

9. A charged particle beam apparatus for irradiating a specimen with a charged particle beam, the apparatus comprising:
an electron beam irradiation unit that emits an electron beam to the specimen; and
an objective lens for focusing the electron beam on the specimen, wherein
the objective lens includes
a first magnetic pole piece,
a second magnetic pole piece that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece, and
a second coil that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,

the charged particle beam apparatus further comprises:
a control unit that controls a current to be passed to the first coil and a current to be passed to the second coil; and
a storage unit that stores an instruction to the control unit, wherein
according to the instruction stored in the storage unit, the control unit performs at least one of a first mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the second coil after turning off a current flowing through to the first coil and a second mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the second coil after turning off a current flowing through to the first coil;
an ion beam irradiation unit that emits a focused ion beam to the specimen; and
a user interface for inputting an instruction to the control unit, wherein
the user interface has a specification field for specifying which of the first mode and the second mode is to be performed when the specimen is processed by using the focused ion beam, and
according to the instruction entered for the specification field,
the control unit performs at least one of the first mode and the second mode when processing the specimen by using the focused ion beam.

Assignees

• Hitachi High Tech Corp

Inventors

• Hirano Ryo
• Nomaguchi Tsunenori
• Kamiya Chisato
• Katane Junichi

Classifications

• H01J37/3056 Primary

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• H01J2237/0266

  electromagnetic · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• H01J37/141

  Electromagnetic lenses · CPC title

• H01J2237/1415

  Bores or yokes, i.e. magnetic circuit in general · CPC title