Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device
US-2020291155-A1 · Sep 17, 2020 · US
Polymer for pattern forming material
US11639402B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11639402-B2 |
| Application number | US-202016814030-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 10, 2020 |
| Priority date | Sep 11, 2019 |
| Publication date | May 2, 2023 |
| Grant date | May 2, 2023 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below,wherein, R5 is a hydrogen atom or a methyl group, each R6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below,wherein, R11 is a hydrogen atom or a methyl group, each R12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.
First claim
Opening claim text (preview).
What is claimed is: 1. A polymer including at least one of: a monomer unit selected from a monomer unit derived from a compound represented by a general formula (1) described below, wherein, R 5 is a hydrogen atom or a methyl group, each R 6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, wherein, R 11 is a hydrogen atom or a methyl group, each R 12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.
Assignees
Inventors
Classifications
of masks comprising organic materials · CPC title
carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title
of organic photoresist masks · CPC title
of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen · CPC title
- C08F20/30Primary
containing aromatic rings in the alcohol moiety · CPC title
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- What does patent US11639402B2 cover?
- A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below,wherein, R5 is a hydrogen atom or a …
- Who is the assignee on this patent?
- Kioxia Corp
- What technology area does this patent fall under?
- Primary CPC classification C08F20/30. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).