Air data probe corrosion protection

Patent metadata

Field	Value
Publication number	US-11629403-B2
Application number	US-201816165772-A
Country	US
Kind code	B2
Filing date	Oct 19, 2018
Priority date	Oct 19, 2018
Publication date	Apr 18, 2023
Grant date	Apr 18, 2023

Abstract

A method can include vapor depositing a corrosion resistant coating to internal and external surfaces of a metallic air data probe. For example, vapor depositing can include using atomic layer deposition (ALD). The method can include placing the metallic air data probe in a vacuum chamber and evacuating the vacuum chamber before using vapor deposition. The corrosion resistant coating can be or include a ceramic coating. In certain embodiments, vapor depositing can include applying a first precursor, then applying a second precursor to the first precursor to form the ceramic coating.

First claim

What is claimed is:

1. A method, comprising:
metal plating a metallic layer to at least a portion of a metallic air data probe before applying a first precursor;
vapor depositing a corrosion resistant coating to internal and external surfaces of the metallic air data probe, wherein vapor depositing includes using chemical vapor deposition (CVD) or atomic layer deposition (ALD) on at least the portion of the metallic air data probe covered by the metallic layer and/or on at least a portion of the metallic air data probe not covered by the metallic layer,
wherein the corrosion resistant coating is a uniform thickness across the internal and external surfaces of the metallic air data probe, wherein the corrosion resistant coating is or includes a ceramic coating, wherein vapor depositing includes applying the first precursor, then applying a second precursor to the first precursor to form the ceramic coating, wherein applying the first precursor includes applying the first precursor to at least a portion of the metallic layer, wherein the metallic layer includes at least one of platinum, Pd, Ru, or gold having a thickness between about 5 nm to about 20 nm.

2. The method of claim 1 , wherein the method includes placing the metallic air data probe in a vacuum chamber and evacuating the vacuum chamber before using vapor deposition.

3. The method of claim 1 , wherein the ceramic coating is an oxide.

4. The method of claim 3 , wherein the ceramic coating is silicon dioxide (SiO 2 ).

5. The method of claim 4 , wherein the first precursor is a reactive, volatile material and the second precursor is an oxide former.

6. The method of claim 3 , wherein the ceramic coating is aluminum oxide (Al 2 O 3 ).

7. The method of claim 6 , wherein the first precursor is triethyl aluminum and the second precursor is an oxide former.

8. The method of claim 7 , wherein applying the second precursor includes applying heat simultaneously.

9. The method of claim 3 , wherein the ceramic coating is tantalum pentoxide (Ta 2 O 5 ) or zirconium oxide.

10. The method of claim 1 , wherein the corrosion resistant coating is about 10 nm to about 5 micron thick.

11. The method of claim 1 , wherein the metallic air data probe is or includes nickel or nickel alloy.

12. The method of claim 1 , wherein the ceramic coating is a nitride.

13. The method of claim 12 , wherein the ceramic coating is one of titanium nitride (TiN), titanium aluminum nitride (TiAlN), zirconium nitride, or tantalum nitride (TaN).

14. The method of claim 13 , wherein the first precursor includes Titanium chloride and the second precursor includes a nitride former.

15. The method of claim 14 , wherein applying the first precursor includes applying heat simultaneously.

Assignees

• Rosemount Aerospace Inc

Inventors

• Poteet Steven
• Gage Marc E
• Smith Blair A

Classifications

• C23C16/0281 Primary

  of metallic sub-layers (C23C16/029 takes precedence) · CPC title

• C23C16/303

  Nitrides · CPC title

• C23C16/34

  Nitrides {(C23C16/303 takes precedence)} · CPC title

• C23C16/403

  of aluminium, magnesium or beryllium · CPC title

• C23C16/45555

  applied in non-semiconductor technology · CPC title