In-situ DC plasma for cleaning pedestal heater

Patent metadata

Field	Value
Publication number	US-11623253-B2
Application number	US-202217582100-A
Country	US
Kind code	B2
Filing date	Jan 24, 2022
Priority date	Sep 19, 2019
Publication date	Apr 11, 2023
Grant date	Apr 11, 2023

Abstract

Substrate supports, substrate support assemblies and methods of using an arc generated between a first electrode and a second electrode to clean a support surface. The first electrode comprises a plurality of first branches which are interdigitated with a plurality of branches of the second electrode in a finger-joint like pattern creating a gap between the first electrode and the second electrode.

First claim

What is claimed is:

1. A substrate support having an electrostatic chuck, the substrate support comprising:
a first electrode having a middle hub with a first trunk extending in a first direction from the middle hub to a first outer peripheral end;
a second electrode with a second trunk extending in a second direction opposite the first direction from an inner end adjacent to and spaced from the middle hub to a second outer peripheral end;
a plurality of first branches crossing the first trunk, each of the first branches located a respective first trunk distance from the middle hub and spaced from adjacent first branches, each of the first branches having a first leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg first radius equal to the respective first trunk distance, and a second leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a second direction opposite the first direction around the middle hub with a respective second leg first radius equal to the respective first trunk distance;
a plurality of second branches crossing the second trunk, each of the second branches located a respective second trunk distance from the middle hub and spaced from adjacent second branches, each of the second branches having a first leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg second radius equal to the respective second trunk distance and a second leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a second direction around the middle hub with a respective second leg second radius equal to the respective second trunk distance, the plurality of second branches inter-digitated with and spaced from the plurality of first branches by a gap; and
a power supply connected to the first and second electrodes configured to provide direct current (DC) and alternating current (AC),
wherein the gap is configured to ignite a plasma immediately adjacent a support surface.

2. The substrate support of claim 1 , wherein each of the branch ends of the first legs of the plurality of first branches, and each of the branch ends of the second legs of the plurality of first branches extend to and are separated from the second trunk by a gap.

3. The substrate support of claim 1 , wherein each of the branch ends of the first legs of the plurality of second branches, and each of the branch ends of the second legs of the plurality of second branches extend to and are separated from the first trunk by a gap.

4. The substrate support of claim 1 , wherein an innermost branch of the plurality of second branches extends around the middle hub of the first electrode.

5. The substrate support of claim 4 , wherein the innermost branch of the plurality of the plurality of second branches and the middle hub of the first electrode are separated by a gap.

6. The substrate support of claim 1 , wherein an outermost branch of the first plurality of branches forms a complete ring around an outermost branch of the second plurality of branches.

7. The substrate support of claim 6 , wherein the second trunk extends to the complete ring of the outermost branch of the first plurality of branches.

8. The substrate support of claim 6 , wherein a surface area of the outermost ring of the first plurality of branches and a surface area of an outermost branch of the second plurality of branches are the same.

9. The substrate support of claim 6 , wherein the outermost branch of the first plurality of branches varies in width.

10. The substrate support of claim 6 , wherein the outermost branch of the second plurality of branches varies in width.

11. The substrate support of claim 1 further comprising a plurality of lift pin openings configured to allow a lift pin to pass through.

12. The substrate support of claim 11 , wherein the lift pins are configured to elevate a substrate over the substrate support by a height sufficient to generate plasma without damaging a bottom surface of the substrate.

13. The substrate support of claim 11 , wherein each of the lift pin openings are within the plurality of first branches.

14. The substrate support of claim 11 , wherein each of the lift pin openings are within the plurality of second branches.

15. The substrate support of claim 1 further comprising a plurality of gas openings to allow for a flow of gas to pass through a substrate support surface of the substrate support out of the support surface.

16. The substrate support of claim 1 , wherein the first trunk shifts a number of degrees in a first direction at an outermost branch of the plurality of first branches.

17. The substrate support of claim 1 , wherein each of the first and second legs of each of the plurality of first branches extend about 180 degrees from the first trunk to each of the corresponding branch ends, and each of the first and second legs of each of the plurality of second branches extend about 180 degrees from the second trunk to each of the corresponding the branch ends.

Assignees

• Applied Materials Inc

Inventors

• Ulavi Tejas
• Dan Arkaprava
• Baluja Sanjeev
• Tang Wei V

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/0452

  characterised by the layout of the process chambers · CPC title