Laser-releasable bonding materials for 3-d ic applications
US-2020234993-A1 · Jul 23, 2020 · US
US11610801B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11610801-B2 |
| Application number | US-202016747271-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2020 |
| Priority date | Jan 22, 2019 |
| Publication date | Mar 21, 2023 |
| Grant date | Mar 21, 2023 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Novel polyketanil-based compositions for use as a laser-releasable composition for temporary bonding and laser debonding processes are provided. The inventive compositions can be debonded using various UV lasers, at wavelengths from about 300 nm to about 360 nm, leaving behind little to no debris. The layers formed from these compositions possess good thermal stabilities and are resistant to common solvents used in semiconductor processing. The compositions can also be used as build-up layers for redistribution layer formation.
Opening claim text (preview).
We claim: 1. A temporary bonding method comprising: providing a stack comprising: a first substrate having a back surface and a front surface; a bonding layer adjacent said front surface; a second substrate having a first surface; and a release layer between said first surface and said bonding layer, said release layer comprising a polyketanil; and exposing said release layer to laser energy so as to facilitate separation of said first and second substrates. 2. The method of claim 1 , wherein said polyketanil is crosslinked. 3. The method of claim 1 , wherein said polyketanil is a polymer of a monomer comprising an amine functional group, a ketone functional group, and an aromatic moiety, wherein said amine functional group and said ketone functional group are bonded to said aromatic moiety. 4. The method of claim 3 , wherein said recurring monomer is 4-aminoacetophenone. 5. The method of claim 1 , further comprising one or both of the following: said front surface is a device surface that comprises an array of devices selected from the group consisting of integrated circuits; MEMS; microsensors; power semiconductors; light-emitting diodes; photonic circuits; interposers; embedded passive devices; and microdevices fabricated on or from silicon, silicon-germanium, gallium arsenide, gallium nitride, and combinations of the foregoing; or said first surface is a device surface that comprises an array of devices selected from the group consisting of integrated circuits; MEMS; microsensors; power semiconductors; light-emitting diodes; photonic circuits; interposers; embedded passive devices; and microdevices fabricated on or from silicon, silicon-germanium, gallium arsenide, gallium nitride, and combinations of the foregoing. 6. The method of claim 1 , wherein one or both of said first substrate or said second substrate comprises glass or other transparent material. 7. The method of claim 1 , further comprising one or both of the following: said front surface is a device surface comprising at least one structure selected from the group consisting of: solder bumps; metal posts; metal pillars; and structures formed from a material selected from the group consisting of silicon, polysilicon, silicon dioxide, silicon (oxy)nitride, metal, low k dielectrics, polymer dielectrics, metal nitrides, metal silicides, and combinations of the foregoing; or said first surface is a device surface comprising at least one structure selected from the group consisting of: solder bumps; metal posts; metal pillars; and structures formed from a material selected from the group consisting of silicon, polysilicon, silicon dioxide, silicon (oxy)nitride, metal, low k dielectrics, polymer dielectrics, metal nitrides, metal silicides, and combinations of the foregoing. 8. The method of claim 1 , further comprising subjecting said stack to processing selected from the group consisting of back-grinding, chemical-mechanical polishing, etching, metallizing, dielectric deposition, patterning, passivation, annealing, and combinations thereof, prior to separating said first and second substrates, prior to separating said first and second substrates. 9. The method of claim 1 , wherein said providing comprises bonding said first and second substrate together to form said stack.
the encapsulations exposing the passive side of the semiconductor body · CPC title
Temporary substrates, e.g. removable substrates · CPC title
between a chip and a stacked insulating package substrate, interposer or RDL · CPC title
using temporary auxiliary substrates (H10W74/017 takes precedence) · CPC title
by a substrate and the encapsulations · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.