Substrate processing apparatus and rotating electrical connector for vacuum

US11600512B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11600512-B2
Application numberUS-202217822704-A
CountryUS
Kind codeB2
Filing dateAug 26, 2022
Priority dateJun 16, 2017
Publication dateMar 7, 2023
Grant dateMar 7, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate processing apparatus includes: a disk including a plurality of electrostatic chucks periodically disposed at a constant radius from a central axis; a disk support supporting the disk; a DC line electrically connected to the plurality of electrostatic chucks through the disk support; and a power supply configured to supply power to the DC line. The DC line includes: a first DC line penetrating through the disk support from the power supply; a power distribution unit configured to distribute the first DC line to connect the first DC line to each of the plurality of electrostatic chucks; and a plurality of second DC lines respectively connected to the plurality of electrostatic chucks in the power distribution unit.

First claim

Opening claim text (preview).

What is claimed is: 1. A rotating electrical connector for vacuum, comprising: a rotator formed of an insulating material and having a cylindrical shape; an upper conductive ring and a lower conductive ring disposed to cover side surfaces of the rotator and spaced apart from each other; and an intermediate insulating barrier disposed between the upper conductive ring and the lower conductive ring, wherein the intermediate insulating barrier blocks generation of plasma between the upper conductive ring and the lower conductive ring. 2. The rotating electrical connector as set forth in claim 1 further comprising: an upper insulating barrier disposed above the upper conductive ring; and a lower insulating barrier disposed below the lower conductive ring, wherein the intermediate insulating barrier protrudes further in an external radius direction than the upper insulating barrier and the lower insulating barrier. 3. The rotating electrical connector as set forth in claim 2 further comprising: an upper bearing disposed on an upper side surface of the rotator; a lower bearing vertically aligned with the upper bearing and disposed on a lower side surface of the rotator; and a stator disposed to be in contact with the upper bearing and the lower bearing and to cover the upper insulating barrier, the lower insulating barrier, and the intermediate insulating barrier. 4. The rotating electrical connector as set forth in claim 3 further comprising: a first insulating brush support portion disposed in an internal space of the stator; an upper brush fixed to the first insulating brush support portion and is in electrical contact with the upper conductive ring; a second insulating brush support portion disposed in the internal space of the stator and e disposed to face the first insulating brush support portion; and a lower brush fixed to the second insulating brush support portion and is in electrical contact with the lower conductive ring; wherein the upper brush and the lower brush are formed of a conductive wire having elasticity or a strip and have a “U” shape. 5. The rotating electrical connector set forth in claim 3 , wherein the upper insulating barrier or the intermediate insulating barrier protrudes to be in contact with an internal side surface of the upper conductive ring, wherein the lower insulating barrier or the intermediate insulating barrier protrudes to be in contact with an internal surface of the lower conductive ring. 6. The rotating electrical connector as set forth in claim 3 , wherein the stator has a cylindrical shape, and has a cutting surface formed by vertically cutting a portion of a side surface of the stator, wherein an input connector insulation block extends in a length direction and is disposed along the cutting surface, wherein each of a first input terminal and a second input terminal ise spaced apart from the input connector insulating block. 7. The rotating electrical connector as set forth in claim 3 , further comprising: a top auxiliary insulating barrier disposed between the top insulating barrier and the intermediate insulating barrier, wherein an inner side surface of the top insulating barrier protrudes in a direction of the intermediate insulating barrier, wherein an inner side surface of the intermediate insulating barrier protrudes in a direction of the bottom insulating barrier, wherein an inner surface of the bottom insulating barrier protrudes a direction of the intermediate insulating barrier to be coupled to a protrusion of the intermediate insulating barrier with a step. 8. The rotating electrical connector as set forth in claim 7 , wherein the top auxiliary insulating barrier is coupled to a protrusion of the top insulating barrier with a step. 9. The rotating electrical connector as set forth in claim 8 , further comprising: a top brush support supporting a top brush; and a bottom brush support supporting a bottom brush; wherein each of the top brush support and the bottom brush support has an arc shape, wherein a portion of the bottom brush is buried in the bottom brush support to be insulated, and a portion of the top brush is buried in the top brush support to be insulated. 10. A rotating electrical connector for vacuum, comprising: a cylindrical rotator formed of an insulating material; a top bearing disposed on a top side surface of the rotator; a bottom bearing vertically aligned with the top bearing and disposed on a bottom side surface of the rotator; a top conductive ring and a bottom conductive ring disposed to cover a side surface of the rotator and spaced apart from each other; an insulating barrier disposed between the top conductive ring and the bottom conductive ring, disposed to cover the rotator, and having a washer shape; a stator disposed to be in contact with the top bearing and the bottom bearing and disposed to cover the insulating barrier and the top and bottom conductive rings; a top brush disposed to be in electrical contact with the top conductive ring and; a bottom brush rotating in an azimuthal direction with respect to the center axis of the stator to be disposed in order not to overlap the top brush. 11. A substrate processing apparatus, comprising: a first disk having a plurality of seating holes periodically arranged on a constant radius from a center axis and disposed inside a chamber to rotate, a plurality of electrostatic chucks which rotates while revolving with the rotation of the first disk, and a plurality of first rotary electrical connectors which are disposed in the seating holes to provide an electrical connection while providing a rotation motion to the plurality of electrostatic chuck, respectively, each of the first rotary electrical connectors comprises: a cylindrical rotator formed of an insulating material, a top conductive ring and a bottom conductive ring disposed to cover a side surface of the rotator and spaced apart from each other, and an insulating barrier disposed between the top conductive ring and the bottom conductive ring, wherein the insulating barrier blocks plasma generation of the top conductive ring and the bottom conductive ring.

Assignees

Inventors

Classifications

  • H10P72/722Primary

    Details of electrostatic chucks · CPC title

  • characterised by supporting two or more semiconductor substrates · CPC title

  • characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

  • Workpiece holder · CPC title

  • Brush holders · CPC title

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What does patent US11600512B2 cover?
A substrate processing apparatus includes: a disk including a plurality of electrostatic chucks periodically disposed at a constant radius from a central axis; a disk support supporting the disk; a DC line electrically connected to the plurality of electrostatic chucks through the disk support; and a power supply configured to supply power to the DC line. The DC line includes: a first DC line p…
Who is the assignee on this patent?
Jusung Eng Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 07 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).