Biasable rotatable electrostatic chuck

Patent metadata

Field	Value
Publication number	US-10490434-B2
Application number	US-201615337942-A
Country	US
Kind code	B2
Filing date	Oct 28, 2016
Priority date	Oct 28, 2015
Publication date	Nov 26, 2019
Grant date	Nov 26, 2019

Abstract

Embodiments of the present disclosure relate to a rotatable RF coupling device and an electrostatic chuck incorporating the same. In some embodiments, a rotatable RF coupling device includes a conductive plate; a rotatable split cylinder configured to be coupled to a dielectric disk of an electrostatic chuck to provide RF power to one or more RF bias electrodes disposed within the dielectric disk; a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate; a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder.

First claim

The invention claimed is:

1. A rotatable radio frequency (RF) coupling device, comprising:
a conductive plate;
a rotatable split cylinder configured to be coupled to a dielectric disk of an electrostatic chuck to provide RF power to one or more RF bias electrodes disposed within the dielectric disk;
a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate;
a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and
a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder.

2. The rotatable RF coupling device of claim 1 , further comprising:
one or more insulators disposed between the grounded shield, the conductive plate, and the stationary ring.

3. The rotatable RF coupling device of claim 1 , further comprising:
a gap disposed between the stationary ring and the rotatable split cylinder to facilitate capacitive coupling of RF power from the stationary ring to the rotatable split cylinder.

4. The rotatable RF coupling device of claim 3 , further comprising:
a plurality of electrical taps extending through the rotatable split cylinder and configured to be coupled to at least one chucking electrode.

5. The rotatable RF coupling device of claim 4 , wherein the plurality of electrical taps includes three electrical taps, and wherein a first electrical tap carries positive voltage, a second electrical tap carried negative voltage, and a third electrical tap is electrically floating.

6. An electrostatic chuck, comprising:
a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk;
a lamp housing disposed below the dielectric disk and having a plurality of lamps to heat the dielectric disk;
a metallic plate disposed below the lamp housing to absorb heat generated by the plurality of lamps;
a rotatable radio frequency (RF) coupling device extending through the lamp housing and the metallic plate and coupled to the dielectric disk at a first end of the rotatable RF coupling device to support the dielectric disk in a spaced relation to the lamp housing;
a shaft coupled to a second end of the rotatable RF coupling device at a first end of the shaft; and
a rotation assembly coupled to the shaft to rotate the shaft, a portion of the RF coupling device, and the dielectric disk with respect to the lamp housing and the metallic plate.

7. The electrostatic chuck of claim 6 , wherein the electrostatic chuck is a bipolar electrostatic chuck.

8. The electrostatic chuck of claim 6 , wherein the rotatable RF coupling device comprises:
a conductive plate;
a rotatable split cylinder coupled to the dielectric disk to provide RF power to one or more RF bias electrodes disposed within the dielectric disk;
a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate;
a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and
a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder.

9. The electrostatic chuck of claim 8 , wherein the rotatable RF coupling device further comprises:
one or more insulators disposed between the grounded shield, the conductive plate, and the stationary ring.

10. The electrostatic chuck of claim 8 , wherein the rotatable RF coupling device further comprises:
a gap disposed between the stationary ring and the rotatable split cylinder to facilitate capacitive coupling of RF power from the stationary ring to the rotatable split cylinder.

11. The electrostatic chuck of claim 10 , wherein the rotatable RF coupling device further comprises:
a plurality of electrical taps extending through the rotatable split cylinder and coupled to the at least one chucking electrode.

12. The electrostatic chuck of claim 11 , wherein the plurality of electrical taps includes three electrical taps, and wherein a first electrical tap carries positive voltage, a second electrical tap carries negative voltage, and a third electrical tap is electrically floating.

13. The electrostatic chuck of claim 6 , wherein the plurality of lamps include an inner array of lamps and an independently controllable outer array of lamps.

14. The electrostatic chuck of claim 6 , wherein the rotation assembly is a magnetic rotation assembly.

15. The electrostatic chuck of claim 14 , wherein the magnetic rotation assembly includes an inner magnet attached to a lower portion of the shaft proximate to a second end of the shaft opposite the first end and an outer magnet disposed about the inner magnet to drive the rotation of the inner magnet.

16. The electrostatic chuck of claim 6 , further comprising:
a bearing assembly disposed about the shaft.

17. The electrostatic chuck of claim 16 , wherein the bearing assembly is electrically coupled to the at least one chucking electrode such that power can be fed through the bearing assembly to provide power to the at least one chucking electrode.

18. The electrostatic chuck of claim 6 , further comprising:
a torsion spring disposed beneath the rotatable RF coupling device to align the rotatable RF coupling device with the electrostatic chuck.

19. The electrostatic chuck of claim 6 , further comprising:
a housing surrounding the lamp housing and the metallic plate; and
a gap disposed between an outer diameter of the metallic plate and an inner surface of the housing, wherein the gap is sized such that when the metallic plate absorbs heat from the plurality of lamps, thermal expansion of the metallic plate causes the outer diameter of the metallic plate to contact the inner surface of the housing.

20. An electrostatic chuck, comprising:
a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode and one or more radio frequency (RF) bias electrodes are disposed within the dielectric disk;
a lamp housing disposed below the dielectric disk and having a plurality of lamps to heat the dielectric disk;
a metallic plate disposed below the lamp housing to absorb heat generated by the plurality of lamps;
a rotatable radio frequency (RF) coupling device extending through the lamp housing and the metallic plate and coupled to the dielectric disk at a first end of the rotatable RF coupling device to support the dielectric disk in a spaced relation to the lamp housing, wherein the rotatable RF coupling device comprises:
a conductive plate;
a rotatable split cylinder coupled to the dielectric disk to provide RF power to one or more RF bias electrodes disposed within the dielectric disk;
a plurality of RF input taps coupled to the conductive plate to couple RF power to the conductive plate;
a stationary ring coupled to the conductive plate and surrounding the rotatable split cylinder; and
a grounded shield surrounding the conductive plate, the stationary ring, and the rotatable split cylinder;

a shaft coupled to a second end of the rotatable RF coupling device at a first end of the shaft;
a housing surrounding the lamp housing and the metallic plate;
a gap disposed between an outer diameter of the metallic plate and an inner surface of the housing, wherein the gap is sized such that when the metallic plate absorbs heat from the plurality of lamps, thermal expansion of the metallic plate causes the outer diameter of the metallic

Assignees

• Applied Materials Inc

Inventors

• Swaminathan Bharath
• Subramani Anantha K

Classifications

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title