Methods and apparatuses for emitting electrons from a hollow cathode

US11596049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11596049-B2
Application numberUS-202117183328-A
CountryUS
Kind codeB2
Filing dateFeb 23, 2021
Priority dateAug 31, 2018
Publication dateFeb 28, 2023
Grant dateFeb 28, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods and apparatuses for emitting electrons from a hollow cathode are provided. The cathode includes a plasma holding region configured to hold a plasma, a gas supply source configured to supply gas to the plasma holding region, and an orifice plate disposed on a periphery of the plasma holding region. The orifice plate comprises a plurality of openings constructed to receive electrons from the plasma. The plurality of openings decouple gas conductance and electrical conductance across the orifice plate. The diameters of the plurality of openings are within a range of 20%-60%, inclusive, of a diameter of a circular opening with an area equal to a sum of the areas of the plurality of openings.

First claim

Opening claim text (preview).

What is claimed is: 1. A cathode, comprising: a cathode tube constructed to emit electrons; a keeper constructed to receive a positive bias to draw electrons emitted from the cathode tube; and a keeper orifice plate that includes a plurality of openings and is connected to the keeper, wherein the plurality of openings decouple gas conductance and electrical conductance across the keeper orifice plate, and wherein diameters of the plurality of openings are within a range of 20% -60%, inclusive, of a diameter of a circle with an area equal to a sum of areas of the plurality of openings. 2. The cathode of claim 1 , wherein the keeper comprises molybdenum, tantalum, stainless steel or graphite. 3. The cathode of claim 1 , wherein at least one end of each of the plurality of openings is flared. 4. The cathode of claim 1 , wherein the plurality of openings are arranged in one of a hexagonal packing pattern, a rectangular packing pattern, or a triangular pattern. 5. The cathode of claim 1 , wherein the plurality of openings are arranged in a plurality of rings where a single opening, of the plurality of openings, is defined as a central opening and the plurality of rings are arranged around the central opening. 6. The cathode of claim 1 , wherein each of the plurality of openings has an aspect ratio defined by a length of the opening divided by a diameter of the opening, where the length of the opening is measured perpendicular to a surface of the keeper orifice plate, and the aspect ratios for the plurality of openings are between ¼-5, inclusive. 7. The cathode of claim 1 , wherein diameters of the plurality of openings are between 100 microns and 500 microns, inclusive. 8. The cathode of claim 1 , wherein a center-to-center spacing between the plurality of openings is between 1.1 times a diameter of the plurality of openings to 4 times the diameter of the plurality of openings, inclusive. 9. The cathode of claim 1 , wherein a center-to-center spacing between the plurality of openings is between 1.25 times the diameter of the plurality of openings and 3 times the diameter of the plurality of openings, inclusive. 10. A cathode, comprising: a cathode tube constructed to emit electrons; and a keeper constructed to receive a positive bias to draw electrons emitted from the cathode tube, wherein the keeper includes an orifice that includes a plurality of openings, wherein the plurality of openings decouple gas conductance and electrical conductance across the keeper orifice, and wherein diameters of the plurality of openings are within a range of 20% -60%, inclusive, of a diameter of a circle with an area equal to a sum of areas of the plurality of openings. 11. The cathode of claim 10 , wherein the keeper comprises molybdenum, tantalum, stainless steel or graphite. 12. The cathode of claim 10 , wherein at least one end of each of the plurality of openings is flared. 13. The cathode of claim 10 , wherein the plurality of openings are arranged in one of a hexagonal packing pattern, a rectangular packing pattern, or a triangular pattern. 14. The cathode of claim 10 , wherein the plurality of openings are arranged in a plurality of rings where a single opening, of the plurality of openings, is defined as a central opening and the plurality of rings are arranged around the central opening. 15. The cathode of claim 10 , wherein each of the plurality of openings has an aspect ratio defined by a length of the opening divided by a diameter of the opening, where the length of the opening is measured perpendicular to a surface of the keeper orifice, and the aspect ratios for the plurality of openings are between 0.25-5, inclusive. 16. The cathode of claim 10 , wherein diameters of the plurality of openings are between 100 microns and 500 microns, inclusive. 17. The cathode of claim 10 , wherein a center-to-center spacing between the plurality of openings is between 1.1 times a diameter of the plurality of openings to 4 times the diameter of the plurality of openings, inclusive. 18. The cathode of claim 10 , wherein a center-to-center spacing between the plurality of openings is between 1.25 times the diameter of the plurality of openings to 3 times the diameter of the plurality of openings, inclusive.

Assignees

Inventors

Classifications

  • Hollow cathodes · CPC title

  • H05H1/54Primary

    Plasma accelerators · CPC title

  • H05H1/481Primary

    Hollow cathodes · CPC title

  • H05H1/48Primary

    using an arc (H05H1/26 takes precedence) · CPC title

  • Neutralisers, i.e. means for keeping electrical neutrality · CPC title

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What does patent US11596049B2 cover?
Methods and apparatuses for emitting electrons from a hollow cathode are provided. The cathode includes a plasma holding region configured to hold a plasma, a gas supply source configured to supply gas to the plasma holding region, and an orifice plate disposed on a periphery of the plasma holding region. The orifice plate comprises a plurality of openings constructed to receive electrons from …
Who is the assignee on this patent?
Us Gov Sec Navy, Us Gov Sec Navy
What technology area does this patent fall under?
Primary CPC classification H05H1/54. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 28 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).