Strain gauge and sensor module

US11543309B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11543309-B2
Application numberUS-201816955329-A
CountryUS
Kind codeB2
Filing dateDec 19, 2018
Priority dateDec 22, 2017
Publication dateJan 3, 2023
Grant dateJan 3, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A strain gauge includes a flexible substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; a resistor formed of a Cr composite film, on one surface of the functional layer; and an insulating resin layer with which the resistor is coated.

First claim

Opening claim text (preview).

The invention claimed is: 1. A strain gauge comprising: a flexible resin substrate; a functional layer including a chemical material and formed of a metal, an alloy, or a metal compound, on one surface of the substrate; a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer, wherein the chemical material is diffused into the film; and an insulating resin layer with which the resistor is coated, wherein the functional layer promotes crystal growth of the resistor. 2. The strain gauge according to claim 1 , wherein a film thickness of the resistor is between 0.05 μm and 0.5 μm. 3. The strain gauge according to claim 1 , wherein a line width of the resistor is between 5 μm and 40 μm. 4. The strain gauge according to claim 1 , wherein the substrate has an expansion coefficient in a range of from 7 ppm/K to 20 ppm/K. 5. The strain gauge according to claim 1 , wherein surface unevenness on the one surface of the substrate is 15 nm or less, and wherein the resistor has a film thickness of 0.05 μm or more. 6. The strain gauge according to claim 1 , further comprising electrodes electrically coupled to the resistor, wherein each electrode includes: a terminal section extending from a given end portion of the resistor; a first metallic layer formed of copper, a copper alloy, nickel, or a nickel alloy, on or above the terminal section; and a second metallic layer formed of material having greater solder wettability than the first metallic layer, on or above the first metallic layer. 7. The strain gauge according to claim 1 , further comprising an insulating layer which is formed, in a lower layer of the insulating resin layer, of material having higher resistance than the resistor and the insulating resin layer, and with which the resistor is coated. 8. The strain gauge according to claim 1 , wherein a main component of the resistor is alpha-chromium. 9. The strain gauge according to claim 8 , wherein the resistor includes alpha-chromium at 80% by weight or more. 10. The strain gauge according to claim 1 , wherein the functional layer includes titanium. 11. The strain gauge according to claim 10 , wherein the resistor includes titanium. 12. The strain gauge according to claim 10 , wherein the resistor includes titanium nitride. 13. A sensor module comprising: the strain gauge according to claim 1 ; and a flexure element disposed on another surface of the substrate.

Assignees

Inventors

Classifications

  • G01L1/2287Primary

    constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

  • for measuring the deformation in a solid, e.g. by resistance strain gauge · CPC title

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Frequently asked questions

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What does patent US11543309B2 cover?
A strain gauge includes a flexible substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; a resistor formed of a Cr composite film, on one surface of the functional layer; and an insulating resin layer with which the resistor is coated.
Who is the assignee on this patent?
Minebea Mitsumi Inc
What technology area does this patent fall under?
Primary CPC classification G01L1/2287. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 03 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).