Integrated functional multilayer structure and method of manufacture therefor

US11528802B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11528802-B2
Application numberUS-201916724631-A
CountryUS
Kind codeB2
Filing dateDec 23, 2019
Priority dateDec 23, 2019
Publication dateDec 13, 2022
Grant dateDec 13, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacture and an integrated functional multilayer structure, includes a substrate film formed or formable so as to exhibit a selected shape; and a number of functional, preferably including optical, mechanical, optoelectrical, electrical and/or specifically, electronic, elements, such as conductors, insulators, components and/or integrated circuits, provided upon the substrate film in the proximity of the shape; wherein the substrate film has further been provided with a structural tuning element, optionally including an elongated, circumferential or other selected shape, said structural tuning element being configured to locally control induced deformation, optionally including stretching, bending, compression and/or shearing, of the substrate film within said proximity of the shape.

First claim

Opening claim text (preview).

The invention claimed is: 1. An integrated functional multilayer structure, comprising: a substrate film having a first portion having a substantially flat shape, a second portion having a three-dimensional, non-flat shape, and a transition area interconnecting the first and second portions; a number of functional elements provided upon the substrate film, wherein at least one of the functional elements being provided in proximity of or over the transition area of the substrate film; and a structural tuning element positioned over the transition area of the substrate film to locally stiffen the substrate film at the transition area of the substrate film more than at the second portion of the substrate film having the three-dimensional, non-flat shape, the structural tuning element including a printed ink. 2. The integrated functional multilayer structure of claim 1 , further comprising a plastic layer produced upon the substrate film and including at least a portion of the number of functional elements and/or of the structural tuning element embedded therewithin. 3. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is positioned to control a distribution of deforming forces in selected directions. 4. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is located in contact with or adjacent to at least one of the number of functional elements. 5. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is configured to locally limit, reduce or increase deformation of the substrate film. 6. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is configured to limit, reduce or increase a slope of deformation; limit, reduce or increase a magnitude of changes in the slope of deformation; shift a deformed area; shape the deformed area; limit, reduce or increase a magnitude of deformation; and/or extend or reduce a length of deformed area or transition between the deformed area and a neighboring portion of the substrate film. 7. The integrated functional multilayer structure of claim 1 , wherein the printed ink is stiffer and more tear resistant than a second material of the substrate film, of any material layer thereon, or of any of the functional elements. 8. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises an electrically insulating element or an electrically conductive element configured to reduce and/or shift away deformation-caused slope and/or the transition area of the substrate film at a location of at least one functional element of the number of functional elements. 9. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises at least a portion configured to extend towards a maximum of deformation or related slope from the functional elements. 10. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises at least one element selected from the group consisting of: mechanical element, optically functional element, printed electronics technology —provided element, electrically insulating element, electrically conductive element, printed electronics—provided electrically insulating element, printed electronics —provided electrically conductive element, additively produced element, sputtered element, deposited element, vacuum deposited element, etched element, additively produced electrically conductive element, additively produced electrically insulating element, carved element, thinned or thickened portion of a greater element including of an electrically conductive element or an electrically insulating element, cavity, recess, through-hole, subtractively produced element, subtractively produced electrically conductive element, subtractively produced electrically insulating element, physical extension of an electrically conductive element, physical extension of an electrically insulating element, and transmissive, refractive, diffractive, opaque, absorptive, scattering or reflective elements. 11. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises at least a portion of a frame circumferential to any of the functional elements on the substrate film. 12. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is further configured to direct, limit or prevent a flow of material disposed in a flowable state on the substrate film or any of the functional elements so as to remain within a circumferential boundary zone defined by the structural tuning element. 13. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises a frame connected or at least adjacent to at least one functional element of the number of functional elements. 14. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element defines a guiding structure for flowable material, the guiding structure being configured to enable the flowable material, in its flowing state, to contact with a functional element of the number of functional elements. 15. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises a mechanical stress relief structure comprising a plurality of fins, teeth and/or gradually expanding or reducing extension shapes. 16. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises a pattern defined by or at least incorporating a plurality of non-linear or only piece-wise linear and/or non-continuous shapes, wherein an area span by the pattern defines an electromagnetic shielding or radiating structure. 17. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element comprises a pattern with a number of repeating geometric shapes a size and/or other characteristic of which is gradually altered in the pattern, or a diffuser pattern with substantially uniform shapes. 18. The integrated functional multilayer structure of claim 17 , wherein the pattern is configured for light directing, processing or coupling relative to the substrate film or an element thereon. 19. The integrated functional multilayer structure of claim 1 , the functional elements are selected from the group consisting of optical elements, mechanical elements, optoelectrical elements, electrical elements, and electronic elements. 20. The integrated functional multilayer structure of claim 19 , wherein the functional elements are electronic elements, the electronic elements selected from the group consisting of conductors, insulators, electrical components, and integrated circuits. 21. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element has an elongated shape or a circumferential shape. 22. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is configured to locally control stretching, bending, compression, and/or shearing of the substrate film within the proximity of the selected shape. 23. The integrated functional multilayer structure of claim 1 , wherein the structural tuning element is part of a plurality of structural tuning elements, the plurality of structural tuning elements arranged about a

Assignees

Inventors

Classifications

  • Dummy conductors, i.e. not used for normal transport of current; Dummy electrodes of components · CPC title

  • for encapsulating mounted components (H05K1/185 takes precedence) · CPC title

  • Moulded substrate · CPC title

  • Moulding over PCB locally or completely · CPC title

  • Shaping of the substrate, e.g. by moulding · CPC title

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What does patent US11528802B2 cover?
A method of manufacture and an integrated functional multilayer structure, includes a substrate film formed or formable so as to exhibit a selected shape; and a number of functional, preferably including optical, mechanical, optoelectrical, electrical and/or specifically, electronic, elements, such as conductors, insulators, components and/or integrated circuits, provided upon the substrate fil…
Who is the assignee on this patent?
Tactotek Oy
What technology area does this patent fall under?
Primary CPC classification H05K1/0281. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).