Member for plasma processing devices

Patent metadata

Field	Value
Publication number	US-11527388-B2
Application number	US-201816633351-A
Country	US
Kind code	B2
Filing date	Jul 27, 2018
Priority date	Jul 28, 2017
Publication date	Dec 13, 2022
Grant date	Dec 13, 2022

Abstract

A member for a plasma processing device of the present disclosure is a member for a plasma processing device made of ceramics and having a shape of a cylindrical body with a through hole in an axial direction. The ceramics is mainly composed of aluminum oxide, and has a plurality of crystal grains and a grain boundary phase that is present between the crystal grains. An inner peripheral surface of the cylindrical body has an arithmetic average roughness Ra of 1 μm or more and 3 μm or less, and an arithmetic height Rmax of 30 μm or more and 130 μm or less.

First claim

The invention claimed is:

1. A member for a plasma processing device made of ceramics and having a shape of a cylindrical body with a through hole in an axial direction,
wherein the ceramics is mainly composed of aluminum oxide, and has a plurality of crystal grains and a grain boundary phase that is present between the crystal grains, and
wherein the cylindrical body has an inner peripheral surface having an arithmetic average roughness Ra of 1 μm or more and 3 μm or less, and an arithmetic height Rmax of 30 μm or more and 130 μm or less.

2. The member for a plasma processing device according to claim 1 , wherein the inner peripheral surface of the cylindrical body has an average value of kurtosis Rku of 6.0 or more.

3. The member for a plasma processing device according to claim 1 , wherein the inner peripheral surface of the cylindrical body has a projected part composed of aluminum oxide crystal grains, and a surface of the projected part is composed of a plurality of planes.

Assignees

• Kyocera Corp

Inventors

• Matsufuji Hiromasa

Classifications

• H10P72/0421

  for drying etching · CPC title

• H01J2237/006

  Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, (H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608) · CPC title

• H01J37/32009

  Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title

• C04B35/62635

  Mixing details · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title