Hydrogen gas sensor and a method of fabricating thereof

US11525818B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11525818-B2
Application numberUS-201815863823-A
CountryUS
Kind codeB2
Filing dateJan 5, 2018
Priority dateJan 5, 2018
Publication dateDec 13, 2022
Grant dateDec 13, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A hydrogen gas sensor with a substrate and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0, and a method of fabricating a gas sensor by thermally oxidizing a metal thin film under low oxygen partial pressure. Various combinations of embodiments of the hydrogen gas sensor and the method of fabricating the gas sensor are provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A hydrogen gas sensor, comprising: a substrate; and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0; wherein the zinc oxide nanostructured thin film is porous having first pores with an average pore size of 1 to 20 nm and second pores with an average pore size of 4 to 12 Å, and wherein the zinc oxide nanostructured thin film is formed on the substrate by a method comprising: depositing zinc on the substrate; thermally oxidizing the zinc at a temperature of 200 to 1,000° C. in the presence of a gaseous mixture with an oxygen partial pressure in the range of 10 −60 to 10 −1 atm to form the zinc oxide nanostructured thin film on the substrate, thereby fabricating the hydrogen gas sensor. 2. The hydrogen gas sensor of claim 1 , wherein the zinc oxide nanostructured thin film does not contain platinum, palladium, nickel, cobalt, copper, or aluminum. 3. The hydrogen gas sensor of claim 1 , wherein the zinc oxide nanostructured thin film has a thickness in the range of 10 to 1,000 nm. 4. The hydrogen gas sensor of claim 1 , wherein the substrate is a glass substrate or a silicon wafer substrate. 5. The hydrogen gas sensor of claim 1 , wherein the thermally oxidizing of the zinc oxide is at a temperature of 500 to 700° C. in the presence of a gaseous mixture with an oxygen partial pressure in the range of 10 −20 to 10 −1 atm; and the zinc oxide has a leaf shape. 6. The hydrogen gas sensor of claim 1 , wherein the thermally oxidizing of the zinc oxide is at a temperature of 300 to 500° C. in the presence of a gaseous mixture with an oxygen partial pressure in the range of 10 −30 to 10 −20 atm; and the zinc oxide has a flake shape; wherein the flakes have an average size of 10-200 nm. 7. The hydrogen gas sensor of claim 1 , wherein a temperature of the gaseous mixture is in the range of 10 to 100° C. before the thermally oxidizing. 8. The hydrogen gas sensor of claim 1 , wherein the gaseous mixture comprises hydrogen gas and water vapor. 9. The hydrogen gas sensor of claim 8 , wherein a ratio of a partial pressure of hydrogen gas to a partial pressure of water vapor in the gaseous mixture is in the range of 1:100 to 1:2000; and wherein the gaseous mixture has an oxygen partial pressure in the range of 10 −20 to 10 −15 atm. 10. The hydrogen gas sensor of claim 1 , wherein the thermally oxidizing is for 2 to 6 hours. 11. A hydrogen gas sensor, comprising: a substrate; and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0; and wherein the zinc oxide nanostructured thin film is porous with first pores and second pores, wherein the first pores have an average pore size of 1 to 20 nm and the second pores have an average pore size of 4 to 12 Å; and wherein the zinc oxide nanostructured thin film comprises zinc oxide nanostructures having a leaf shape; wherein the leaves have a length up to 500 nm.

Assignees

Inventors

Classifications

  • G01N33/005Primary

    H2 · CPC title

  • Composition or fabrication of the electrodes and coatings thereon, e.g. catalysts · CPC title

  • G01N27/127Primary

    comprising nanoparticles · CPC title

  • using oxygen-containing compounds, e.g. water, carbon dioxide · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11525818B2 cover?
A hydrogen gas sensor with a substrate and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0, and a method of fabricating a gas sensor by thermally oxidizing a metal thin film under low oxy…
Who is the assignee on this patent?
Univ King Fahd Pet & Minerals
What technology area does this patent fall under?
Primary CPC classification G01N33/005. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).