Gas-pulsing-based shared precursor distribution system and methods of use

US11520358B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11520358-B2
Application numberUS-202117521469-A
CountryUS
Kind codeB2
Filing dateNov 8, 2021
Priority dateApr 28, 2018
Publication dateDec 6, 2022
Grant dateDec 6, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of calibrating a flow controller, the method comprising: opening a pressure controller at an upstream end of a shared volume to pressurize the shared volume, the shared volume having an upstream end and a plurality of downstream ends, each downstream end having a flow controller comprising a fast pulsing valve and an orifice; closing the pressure controller at the upstream end to isolate the shared volume; measuring the pressure of the shared volume; opening a fast pulsing valve of one flow controller a predetermined number of times; measuring the pressure of the shared volume after opening the fast pulsing valve the predetermined number of times; and determining a difference in the pressure of the shared volume per opening of the fast pulsing valve. 2. The method of claim 1 , further comprising repeating the method for each flow controller to calibrate the volume of gas delivered per pulse of each fast pulsing valve. 3. The method of claim 2 , further comprising adjusting a pulse window for one or more of the fast pulsing valves to compensate for differences in the orifices and/or fast pulsing valves.

Assignees

Inventors

Classifications

  • using calibrated reservoirs · CPC title

  • G05D7/0652Primary

    the plurality of throttling means being arranged in parallel · CPC title

  • Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume · CPC title

  • G05D7/0664Primary

    the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow (G05D7/0652 takes precedence; ratio control G05D11/13) · CPC title

  • Process monitoring, e.g. flow or thickness monitoring · CPC title

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What does patent US11520358B2 cover?
Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G05D7/0652. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 06 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).