Substrate cleaning device

Patent metadata

Field	Value
Publication number	US-11517940-B2
Application number	US-201916713000-A
Country	US
Kind code	B2
Filing date	Dec 13, 2019
Priority date	Dec 13, 2018
Publication date	Dec 6, 2022
Grant date	Dec 6, 2022

Abstract

A substrate cleaning device that facilitates control of the amount of liquid supplied to a substrate and reduces adverse influences of the liquid supplied to a bearing part on the substrate is provided. The substrate cleaning device includes: a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate; a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and a second supply part that supplies a second liquid to the bearing part.

First claim

What is claimed is:

1. A substrate cleaning device comprising:
a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate;
a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and
a second supply part that supplies a second liquid to the bearing part,
wherein the holding part has a reservoir part for storing the second liquid,
wherein the holding part is provided with a discharge part that has a discharge port for discharging the second liquid, and
a height position of the discharge port is higher than a lowermost surface of an inner circumferential bottom surface of the holding part, and the reservoir part is formed between the lowermost surface of the inner circumferential bottom surface and the discharge port in a height direction.

2. The substrate cleaning device according to claim 1 ,
wherein the bearing part has two or more bearing members provided in an axial direction of the cleaning member, and
the second supply part supplies the second liquid between the bearing members in the axial direction.

3. The substrate cleaning device according to claim 1 , wherein the second supply part has an adjustment part that adjusts the flow rate.

4. The substrate cleaning device according to claim 1 ,
wherein the holding part has a rotation part that rotates along with the cleaning member and a tightly closed part that is provided to face the bearing part,
an outer circumference of the bearing part abuts on the rotation part,
the bearing part has a bearing ball, and
in a plane with a normal line in an axial direction of the cleaning member, a circumferential edge outer end of the tightly closed part is located further outward at the circumferential edge than a circumferential edge outer end of the bearing ball.

5. The substrate cleaning device according to claim 1 ,
wherein the holding part has a rotation part that rotates along with the cleaning member,
the first supply part has a first supply pipe that supplies the first liquid into the cleaning member, and
the first supply pipe extends up to inside of the rotation part without being disconnected at a gap between the bearing part and the rotation part.

6. The substrate cleaning device according to claim 1 , wherein the second supply part supplies the second liquid to the bearing part even when the first supply part does not supply the first liquid into the cleaning member.

7. The substrate cleaning device according to claim 1 , wherein the holding part has a rotation part that rotates along with the cleaning member and is provided with one or more holes for supplying the second liquid to the bearing part.

8. A substrate cleaning device comprising:
a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate;
a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and
a second supply part that supplies a second liquid to the bearing part,
wherein the holding part has a rotation part that rotates along with the cleaning member and a tightly closed part provided to face the bearing part,
the tightly closed part has a first tightly closed part provided with a first notch and a second tightly closed part provided with a second notch, and
the first notch and the second notch do not overlap when seen in an axial direction of the cleaning member.

Assignees

• Ebara Corp

Inventors

• Uozumi Shuji
• Motoshima Yasuyuki
• Maruyama Toru

Classifications

• H10P72/0412

  using mainly scrubbing means, e.g. brushes · CPC title

• B08B3/04 Primary

  Cleaning involving contact with liquid · CPC title

• B08B1/007

  Operations & Transport · mapped topic

• H01L21/67046

  Electricity · mapped topic

• B08B1/04 Primary

  Operations & Transport · mapped topic