Method and device for laser-assisted electrochemical composite deposition using rifling-type hollow rotating electrode

Patent metadata

Field	Value
Publication number	US-11512407-B2
Application number	US-202117617005-A
Country	US
Kind code	B2
Filing date	Jul 12, 2021
Priority date	Aug 18, 2020
Publication date	Nov 29, 2022
Grant date	Nov 29, 2022

Abstract

The present invention discloses a method and a device for laser-assisted electrochemical composite deposition using a rifling-type hollow rotating electrode, which relate to the field of micro-composite processing in special processing technologies. A center of a laser beam is allowed to pass through a rifling-type hollow rotating electrode and focus onto a cathode substrate. When the rifling-type hollow rotating electrode is rotated at a constant speed, an electrodeposition solution rotates in the rifling-type hollow rotating electrode and generates a certain centripetal force to improve the precision and localization of deposition. During the process of the present invention, an internal rifling structure of the electrode is rotated at a high speed so that the deposition solution generates a centripetal force. The internal rifling structure and an external helical structure of the rifling-type hollow rotating electrode make the deposition solution move upward to form a “self-circulation” system.

First claim

What is claimed is:

1. A method for laser-assisted electrochemical composite deposition using a rifling-type hollow rotating electrode, the method comprising the following steps:
arranging a rifling-type hollow rotating electrode and a cathode substrate in a working tank, and connecting the rifling-type hollow rotating electrode and the cathode substrate to a positive electrode and a negative electrode of an electrochemical power supply, respectively;
allowing a center of a laser beam to pass through the rifling-type hollow rotating electrode and focus onto the cathode substrate; and
rotating the rifling-type hollow rotating electrode at a constant speed, whereby an electrodeposition solution rotates in the rifling-type hollow rotating electrode and generates a certain centripetal force to improve precision and localization of a deposition, wherein the rifling-type hollow rotating electrode has an internal rifling structure and an external helical structure, and the internal rifling structure is in a direction opposite to a helical direction of the external helical structure.

2. The method for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 1 , wherein the electrodeposition solution contains nanoparticles.

3. The method for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 1 , wherein the rifling-type hollow rotating electrode is an insoluble hollow anode tube and is resistant to high temperature, acid, and alkali and externally insulated.

4. A device for laser-assisted electrochemical composite deposition using a rifling-type hollow rotating electrode, the device comprising a laser processing system, an electrochemical processing system, and a control system;
wherein the laser processing system comprises a pulsed laser, a reflector, and a focusing lens; the reflector is arranged in a horizontal direction of the pulsed laser, and the focusing lens is arranged directly below the reflector; a laser beam is aligned with a center of a rifling-type hollow rotating electrode and is focused onto an upper surface of a workpiece;
the electrochemical processing system comprises an electrochemical power supply, the rifling-type hollow rotating electrode, and a cathode substrate; a positive electrode of the electrochemical power supply ( 3 ) is connected to the rifling-type hollow rotating electrode and a negative electrode of the electrochemical power supply is connected to the cathode substrate; the rifling-type hollow rotating electrode is located directly above the cathode substrate with a certain initial gap in between;
the control system comprises a computer, a control cabinet, an X-Y-Z workbench, and a numerical control platform; the computer is connected to the control cabinet and the pulsed laser via connection ports; the control cabinet is connected to the numerical control platform and the X-Y-Z workbench; the rifling-type hollow rotating electrode has an internal rifling structure and an external helical structure, and the internal rifling structure is in a direction opposite to a helical direction of the external helical structure.

5. The device for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 4 , characterized in that wherein the initial gap between the rifling-type hollow rotating electrode and the cathode substrate is 20 μm-30 μm.

6. The device for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 4 , wherein a square hole is provided on the rifling-type hollow rotating electrode, and an electrodeposition solution enters the rifling-type hollow rotating electrode through the square hole.

7. The device for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 4 , wherein the rifling-type hollow rotating electrode is rotated at a speed of 500r/min-1000r/min.

8. The device for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 4 , wherein the pulsed laser generates a laser beam with a diameter smaller than an inner diameter of the rifling-type hollow rotating electrode; the pulsed laser has a wavelength of 1064 nm, a frequency of 1 Hz-100 Hz, and single pulse energy of 100 mJ-200 mJ.

9. The device for the laser-assisted electrochemical composite deposition using the rifling-type hollow rotating electrode according to claim 4 , wherein the electrochemical power supply is a pulse power supply with a voltage of 0-20V, a frequency of 1 kHz-2 MHz, and a duty cycle of 0-100%.

Assignees

• Univ Jiangsu

Inventors

• Zhang Zhaoyang
• Wu Yucheng
• Xu Kun
• Dai Xueren
• Yang Shuai
• Guo Sheng
• Zhao Douyan

Classifications

• C25D5/024 Primary

  using locally applied electromagnetic radiation, e.g. lasers · CPC title

• C25D13/00

  Electrophoretic coating characterised by the process (C25D15/00 takes precedence; compositions for electrophoretic coating C09D5/44) · CPC title

• C25D5/18 Primary

  Electroplating using modulated, pulsed or reversing current · CPC title

• C25D5/08

  Electroplating with moving electrolyte e.g. jet electroplating {(using locally applied jets of electrolyte C25D5/026)} · CPC title

• C25D17/12 Primary

  Shape or form (C25D17/14 takes precedence) · CPC title