Z-axis structure in accelerometer
US-2017363656-A1 · Dec 21, 2017 · US
Micromechanical sensor and methods for producing a micromechanical sensor and a micromechanical sensor element
US11493532B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11493532-B2 |
| Application number | US-202016997218-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 19, 2020 |
| Priority date | Jun 29, 2017 |
| Publication date | Nov 8, 2022 |
| Grant date | Nov 8, 2022 |
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Abstract
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A method produces a micromechanical sensor element having a first electrode and a second electrode, wherein electrode wall surfaces of the first and the second electrodes are situated opposite one another in a first direction and form a capacitance, wherein one of the first electrode or the second electrode is movable in a second direction, in response to a variable to be detected, and a second one of the first electrode and the second electrode is fixed. The method includes producing a cavity in a semiconductor substrate, the cavity being closed by a doped semiconductor layer; producing the first and the second electrodes in the semiconductor layer, including modifying the electrode wall surface of the first electrode in order to have a smaller extent in the second direction than the electrode wall surface of the second electrode.
First claim
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What is claimed is: 1. A method for producing a micromechanical sensor element having a first electrode and a second electrode, wherein electrode wall surfaces of the first and the second electrodes are situated opposite one another in a first direction and form a capacitance, wherein a first one of the first electrode and the second electrode is movable in a second direction, which is different than the first direction, in response to a variable to be detected, and a second one of the first electrode and the second electrode is fixed, the method comprising: producing a cavity in a semiconductor substrate, the cavity being closed by a doped semiconductor layer; and producing the first and the second electrodes in the doped semiconductor layer, including modifying the electrode wall surface of the first electrode in order to have a smaller extent in the second direction than the electrode wall surface of the second electrode, wherein modifying the electrode wall surface of the first electrode comprises forming a counterdoped region in the electrode wall surface of the first electrode in a part of the semiconductor layer which faces away from the cavity, and wherein the counterdoped region is adjacent to a remaining portion of the electrode wall surface of the first electrode. 2. The method as claimed in claim 1 , wherein: the counterdoped region comprises a first doping type that is different than a second doping type of the semiconductor layer, and the counterdoped region does not contribute to an active capacitor area of the first electrode.
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Inventors
Classifications
Transducers for transforming electrical into mechanical energy or vice versa (dynamo-electric machines H02K99/00; electrostatic machines H02N1/00; piezoelectric devices H10N30/00) · CPC title
Accelerometers · CPC title
- G01P15/125Primary
by capacitive pick-up · CPC title
Details · CPC title
Electrodes · CPC title
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- What does patent US11493532B2 cover?
- A method produces a micromechanical sensor element having a first electrode and a second electrode, wherein electrode wall surfaces of the first and the second electrodes are situated opposite one another in a first direction and form a capacitance, wherein one of the first electrode or the second electrode is movable in a second direction, in response to a variable to be detected, and a second…
- Who is the assignee on this patent?
- Infineon Tech Dresden Gmbh & Co Kg
- What technology area does this patent fall under?
- Primary CPC classification G01P15/125. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).