Exposure apparatus, exposure method, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-11474439-B2
Application number	US-202016900209-A
Country	US
Kind code	B2
Filing date	Jun 12, 2020
Priority date	Jun 25, 2019
Publication date	Oct 18, 2022
Grant date	Oct 18, 2022

Abstract

An exposure apparatus includes a first temperature controller for controlling a temperature distribution on an optical element of a projection optical system, and a second temperature controller for controlling a temperature distribution on an optical element of the projection optical system, wherein in a first period in which the exposure operation is executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration of the projection optical system due to the exposure operation being executed, and in a second period which follows the first period and in which the exposure operation is not executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration due to the exposure operation not being executed.

First claim

What is claimed is:

1. An exposure apparatus that performs an exposure operation to expose a substrate via a projection optical system, the exposure apparatus comprising:
a temperature adjuster, including a first temperature controller and a second temperature controller arranged at positions different from each other, configured to control a temperature distribution on an optical element of the projection optical system, wherein the temperature adjuster controls the first temperature controller to control heating of a first region of the optical element and controls the second temperature controller to control heating of a second region of the optical element, the second region being different from the first region, so that:
during a first period in which the exposure operation is performed, the optical element has a first non-uniform temperature distribution to reduce a change in an aberration of the projection optical system due to the exposure operation being performed; and
during a second period, which follows the first period, in which the exposure operation is not performed, the optical element has a second non-uniform temperature distribution to reduce a change in the aberration of the projection optical system due to the exposure operation being not performed.

2. The apparatus according to claim 1 , wherein:
the first temperature controller applies a first temperature distribution to the optical element in the first period and the second temperature controller applies a second temperature distribution to the optical element in the second period, and
the first temperature distribution and the second temperature distribution have opposite phases.

3. The apparatus according to claim 1 , wherein the first and second temperature controllers are arranged outside an effective diameter of the optical element.

4. The apparatus according to claim 1 , wherein the temperature adjuster is configured to reduce at least one NO component, where N is a natural number, of Zernike polynomials as the aberration.

5. The apparatus according to claim 1 , wherein the temperature adjuster is configured to reduce astigmatism as the aberration.

6. The apparatus according to claim 1 , wherein the first period is from a start of a first exposure operation on a substrate to an end of a final exposure operation on the substrate.

7. The apparatus according to claim 6 , wherein the second period starts from the end of the final exposure operation on the substrate.

8. The apparatus according to claim 1 , wherein the first period is from a start of a first exposure operation on a first substrate of a first lot to an end of a final exposure operation on a final substrate of the first lot.

9. The apparatus according to claim 8 , wherein the second period is from the end of the final exposure operation on the final substrate of the first lot to the start of the first exposure operation on the first substrate of a second lot following the first lot.

10. The apparatus according to claim 1 , wherein the first period is from a start of an exposure operation on one shot region of a substrate to an end of the exposure operation on the one shot region of the substrate.

11. The apparatus according to claim 10 , wherein the second period is from the end of the exposure operation on the one shot region of the substrate to a start of the exposure operation on a next shot region of the substrate.

12. The apparatus according to claim 1 , wherein:
the first temperature controller operates so as to reduce the change in the aberration of the projection optical system in the first period, and
the second temperature controller operates so as to reduce the change in the aberration of the projection optical system in the second period.

13. The apparatus according to claim 1 , wherein:
the first temperature controller and the second temperature controller operate so as to reduce the change in the aberration of the projection optical system in the first period, and
the first temperature controller and the second temperature controller operate so as to reduce the change in the aberration of the projection optical system in the second period.

14. The apparatus according to claim 13 , wherein, in the first and second periods, the first and second temperature controllers operate so that the aberration does not fall outside a predetermined range while allowing the aberration to change within the predetermined range.

15. A method of manufacturing an article, the method comprising:
exposing a substrate with the exposure apparatus according to claim 1 ;
developing the substrate exposed in the exposing; and
processing the substrate developed in the developing to obtain the article.

16. An exposure method of performing an exposure operation to expose a substrate via a projection optical system including a temperature adjuster, including a first temperature controller and a second temperature controller arranged at positions different from each other, configured to control a temperature distribution on an optical element of the projection optical system, the method comprising:
controlling the temperature adjuster during a first period in which the exposure operation is performed, so that the optical element has a first non-uniform temperature distribution to reduce change in the aberration of the projection optical system due to the exposure operation being performed; and
controlling the temperature adjuster during a second period, which follows the first period, in which the exposure operation is not performed, so that the optical element has a second non-uniform temperature distribution to reduce a change in the aberration of the projection optical system due to the exposure operation being not performed,
wherein the optical element has the first non-uniform temperature distribution and the second non-uniform temperature distribution by controlling the first temperature controller to control heating of a first region of the optical element and controls the second temperature controller to control heating of a second region of the optical element, the second region being different from the first region.

17. The method according to claim 16 , wherein:
in the controlling in the first period, the first temperature controller to applies a first temperature distribution to the optical element,
in the controlling in the second period, the second temperature controller applies a second temperature distribution to the optical element, and
the first temperature distribution and the second temperature distribution have opposite phases.

18. The method according to claim 16 , wherein:
the controlling in the first period controls the first temperature controller in accordance with a first command value corresponding to an elapsed time from a start of the first period, and
the controlling in the second period controls the second temperature controller in accordance with a second command value corresponding to an elapsed time from a start of the second period.

19. The method according to claim 16 , wherein the first and second temperature controllers are arranged outside an effective diameter of the optical element.

20. The method according to claim 16 , wherein the temperature adjuster is configured to reduce at least one Nθ component, where N is a natural number, of Zernike polynomials as the aberration.

21. The method according to claim 16 , wherein the temperature adjuster is configured to reduce astigmatism as the aberration.

Assignees

• Canon Kk

Inventors

• Miyano Kouki
• Koizumi Ryo
• Moizumi Jun
• Mikami Koji

Classifications

• G03F7/70891 Primary

  Temperature · CPC title

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title

• G03F7/706

  Aberration measurement · CPC title