Method of forming an anti-glare coating on a substrate
US-9707592-B2 · Jul 18, 2017 · US
US11465934B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11465934-B2 |
| Application number | US-201816629149-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 5, 2018 |
| Priority date | Jul 7, 2017 |
| Publication date | Oct 11, 2022 |
| Grant date | Oct 11, 2022 |
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A process for obtaining a material including a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, includes a stage of application, to the at least one textured face of the substrate, of a solution containing at least one silica precursor and at least one pore-forming agent, then a heat treatment stage targeted at consolidating the antireflective coating. Before the application stage, the glass substrate is subjected to a preheating stage, so that the at least one textured face intended to be coated with the antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before the application stage.
Opening claim text (preview).
The invention claimed is: 1. A process for obtaining a material comprising a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, said process comprising: applying, to said at least one textured face of said substrate, a solution containing at least one silica precursor and at least one solid pore-forming agent, said at least one solid pore-forming agent being in form of hollow or solid beads in said solution, then performing a heat treatment for consolidating said antireflective coating, said process further comprising, before said applying, subjecting the glass substrate to a preheating stage, so that said at least one textured face intended to be coated with said antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before said applying. 2. The process as claimed in claim 1 , wherein the solution is aqueous. 3. The process as claimed in claim 1 , wherein a light transmittance factor within the meaning of Standard EN 410 of the glass substrate is at least 90%. 4. The process as claimed in claim 3 , wherein the light transmittance factor within the meaning of Standard EN 410 of the glass substrate is at least 91%. 5. The process as claimed in claim 1 , wherein the solution is applied by coating by means of at least one roll. 6. The process as claimed in claim 1 , wherein the silica precursor is a compound chosen from silicon alkoxides and halides. 7. The process as claimed in claim 1 , wherein the at least one pore-forming agent is an organic agent. 8. The process as claimed in claim 7 , wherein the at least one pore-forming agent comprises polymeric beads made of polymethyl methacrylate, methyl (meth)acrylate/(meth)acrylic acid copolymers, polycarbonates, polyesters or polystyrene. 9. The process as claimed in claim 1 , wherein the preheating stage is carried out by radiation or by convection. 10. The process as claimed in claim 9 , wherein preheating stage is carried out by means of infrared lamps or by blowing of hot air. 11. The process as claimed in claim 1 , wherein the heat treatment is a tempering treatment of the glass. 12. The process as claimed in claim 1 , further comprising, immediately after the applying and before the heat treatment, a drying stage. 13. The process as claimed in claim 1 , wherein the antireflective coating exhibits a mean thickness within a range extending from 10 nm to 10 μm. 14. The process as claimed in claim 13 , wherein the antireflective coating exhibits a mean thickness within a range extending from 20 nm to 1 μm. 15. The process as claimed in claim 1 , wherein the temperature is within a range extending from 50° C. to 80° C. 16. The process as claimed in claim 1 , wherein the glass substrate exhibits a haze of at least 20%. 17. The process as claimed in claim 1 , wherein at least one textured face of the glass substrate intended to be coated with the antireflective coating exhibits a profile such that, within the meaning of Standard ISO 4287:1997: the parameter Rz is within a range extending from 18 to 200 μm, and the parameter RSm is within a range extending from 500 to 2500 μm. 18. A process for obtaining a material comprising a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, said process comprising: applying, to said at least one textured face of said substrate, a solution containing at least one silica precursor and at least one pore-forming agent, then performing a heat treatment for consolidating said antireflective coating, said process further comprising, before said applying, subjecting the glass substrate to a preheating stage, so that said at least one textured face intended to be coated with said antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before said applying, wherein at least one textured face of the glass substrate intended to be coated with the antireflective coating exhibits a profile such that, within the meaning of Standard ISO 4287:1997: the parameter Rz is within a range extending from 18 to 200 μm, and the parameter RSm is within a range extending from 500 to 2500 μm. 19. A process for obtaining a material comprising a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, said process comprising: applying, to said at least one textured face of said substrate, a solution containing at least one silica precursor and at least one pore-forming agent, then performing a heat treatment for consolidating said antireflective coating, said process further comprising, before said applying, subjecting the glass substrate to a preheating stage, so that said at least one textured face intended to be coated with said antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before said applying, wherein the glass substrate exhibits a haze of at least 20%. 20. The process as claimed in claim 19 , wherein the glass substrate exhibits a haze of at least 50%.
by sol-gel processes · CPC title
Polymers · CPC title
by deposition from the liquid phase · CPC title
containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase · CPC title
using inorganic layer materials only · CPC title
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