Resist composition, method of forming resist pattern, and compound

Patent metadata

Field	Value
Publication number	US-11460770-B2
Application number	US-201916700780-A
Country	US
Kind code	B2
Filing date	Dec 2, 2019
Priority date	Dec 4, 2018
Publication date	Oct 4, 2022
Grant date	Oct 4, 2022

Abstract

A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

First claim

What is claimed is:

1. A resist composition which generates an acid upon exposure and of which solubility in a developing solution is changed due to an action of an acid, the resist composition comprising:
a base material component (A) of which solubility in a developing solution is changed due to an action of an acid; and
a compound (BD1) including an anion moiety and a cation moiety and represented by Formula (bd1):

wherein R 01 represents a fluorinated alkyl group which may have a substituent, R 05 represents a hydrogen atom or a fluorinated alkyl group which may have a substituent; R 02 to R 04 represent a hydrogen atom; R bd2 and R bd3 each independently represent an aryl group which may have a substituent, R bd2 and R bd3 may be bonded to each other to form a fused ring together with the sulfur atom in the formula; provided that a total number of the fluorinated alkyl groups which may have a substituent bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula is 2 or more; and X − represents a counter anion.

2. The resist composition according to claim 1 , wherein the compound (BD1) is a compound represented by Formula (bd1-1),

wherein
R 01 represents a fluorinated alkyl group which may have a substituent, R 05 , R 06 , R 10 , R 11 , and R 15 each independently represent a hydrogen atom or a fluorinated alkyl group which may have a substituent; provided that two or more of R 01 , R 05 , R 06 , R 10 , R 11 , and R 15 are fluorinated alkyl groups which may have a substituent; R 02 to R 04 represent a hydrogen atom; R 07 to R 09 , and R 12 to R 14 represent a hydrogen atom, an alkyl group, an alkoxy group, an acyl group, a sulfonyl group, a sulfonylalkyl group, a hydroxyl group, a carbonyl group, a cyano group, a nitro group, or an amino group; and X − represents a counter anion.

3. A method of forming a resist pattern, comprising:
forming a resist film on a support using the resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.

4. The method of forming a resist pattern according to claim 3 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beams (EB).

5. A compound comprising an anion moiety and a cation moiety and represented by Formula (bd1):

wherein R 01 represents a fluorinated alkyl group which may have a substituent, R 05 represents a hydrogen atom or a fluorinated alkyl group which may have a substituent; R 02 to R 04 represent a hydrogen atom; R bd2 and R bd3 each independently represent an aryl group which may have a substituent, R bd2 and R bd3 may be bonded to each other to form a fused ring together with the sulfur atom in the formula; provided that a total number of the fluorinated alkyl groups which may have a substituent bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula is 2 or more; and X − represents a counter anion.

6. The compound according to claim 5 comprising an anion moiety and a cation moiety and represented by Formula (bd1-1):

wherein R 01 represents a fluorinated alkyl group which may have a substituent, R 05 , R 06 , R 10 , R 11 , and R 15 each independently represent a hydrogen atom or a fluorinated alkyl group which may have a substituent; provided that two or more of R 01 , R 05 , R 06 , R 10 , R 11 , and R 15 are fluorinated alkyl groups which may have a substituent; R 02 to R 04 represent a hydrogen atom; R 07 to R 09 , and R 12 to R 14 represent a hydrogen atom, an alkyl group, an alkoxy group, an acyl group, a sulfonyl group, a sulfonylalkyl group, a hydroxyl group, a carbonyl group, a cyano group, a nitro group, or an amino group; and X − represents a counter anion.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Ikeda Takuya
• Miyakawa Junichi

Classifications

• G03F7/16

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C07C381/12

  Sulfonium compounds · CPC title

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title