Processes for producing trifluoroiodomethane and trifluoroacetyl iodide

US11459284B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11459284-B2
Application numberUS-202117181479-A
CountryUS
Kind codeB2
Filing dateFeb 22, 2021
Priority dateAug 24, 2018
Publication dateOct 4, 2022
Grant dateOct 4, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure provides a process for producing trifluoroiodomethane, the process comprising providing a reactant stream comprising hydrogen iodide and at least one trifluoroacetyl halide selected from the group consisting of trifluoroacetyl chloride, trifluoroacetyl fluoride, trifluoroacetyl bromide, and combinations thereof, reacting the reactant stream in the presence of a first catalyst at a first reaction temperature from about 25° C. to about 400° C. to produce an intermediate product stream comprising trifluoroacetyl iodide, and reacting the intermediate product stream in the presence of a second catalyst at a second reaction temperature from about 200° C. to about 600° C. to produce a final product stream comprising the trifluoroiodomethane.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition comprising: at least 99 wt. % of trifluoroiodomethane; less than 500 ppm hexafluoroethane; less than 500 ppm trifluoromethane; less than 100 ppm carbon monoxide; less than 1 ppm hydrogen chloride; and from 1 ppm to 500 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride. 2. The composition of claim 1 comprising: at least 99.5 wt. % of trifluoroiodomethane; less than 250 ppm hexafluoroethane; less than 250 ppm trifluoromethane; less than 50 ppm carbon monoxide; less than 0.5 ppm hydrogen chloride; and from 1 ppm to 250 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride. 3. The composition of claim 1 comprising: at least 99.7 wt. % of trifluoroiodomethane; less than 100 ppm hexafluoroethane; less than 100 ppm trifluoromethane; less than 20 ppm carbon monoxide; less than 0.2 ppm hydrogen chloride; and from 1 ppm to 100 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride. 4. The composition of claim 1 comprising: at least 99.9 wt. % of trifluoroiodomethane; less than 100 ppm hexafluoroethane; less than 100 ppm trifluoromethane; less than 20 ppm carbon monoxide; less than 0.2 ppm hydrogen chloride; and from 1 ppm to 100 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride. 5. A composition comprising: at least 98 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 20,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 6. The composition of claim 5 consisting essentially of: at least 98 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 20,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 7. The composition of claim 5 comprising: at least 99 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 10,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 8. The composition of claim 7 consisting essentially of: at least 99 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 10,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 9. The composition of claim 5 comprising: at least 99.5 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 5,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 10. The composition of claim 9 consisting essentially of: at least 99.5 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 5,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 11. The composition of claim 5 comprising: at least 99.7 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 3,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane. 12. The composition of claim 11 consisting essentially of: at least 99.7 wt. % of trifluoroacetyl iodide, and from about 1 ppm to about 3,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.

Assignees

Inventors

Classifications

  • of the iron group metals or copper · CPC title

  • of the platinum group metals · CPC title

  • Silica · CPC title

  • Separation; Purification; Stabilisation; Use of additives · CPC title

  • by conversion of carboxylic acids or their anhydrides {or esters, lactones, salts} into halides with the same carboxylic acid part · CPC title

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What does patent US11459284B2 cover?
The present disclosure provides a process for producing trifluoroiodomethane, the process comprising providing a reactant stream comprising hydrogen iodide and at least one trifluoroacetyl halide selected from the group consisting of trifluoroacetyl chloride, trifluoroacetyl fluoride, trifluoroacetyl bromide, and combinations thereof, reacting the reactant stream in the presence of a first cata…
Who is the assignee on this patent?
Honeywell Int Inc
What technology area does this patent fall under?
Primary CPC classification C07C19/16. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 04 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).