Electroconductive film and method for manufacturing electroconductive pattern

Patent metadata

Field	Value
Publication number	US-11450445-B2
Application number	US-202016895704-A
Country	US
Kind code	B2
Filing date	Jun 8, 2020
Priority date	Sep 2, 2014
Publication date	Sep 20, 2022
Grant date	Sep 20, 2022

Abstract

A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

First claim

The invention claimed is:

1. An acid generating layer-forming composition for forming an acid generating layer that is laminated onto an electrically conductive polymer-containing polymer layer and wherein acid that is generated and proliferates on account of light irradiation migrates onto the polymer layer and acts as a dopant for the electrically conductive polymer,
which acid generating layer-forming composition is characterized by comprising an acid proliferating agent and a photoacid generator,
wherein the photoacid generator comprises an aryl sulfonic acid ester of naphthaleneimide,
wherein a ratio of a content of the photoacid generator to a content of the acid proliferating agent ranges from 1:5 to 1:30.

2. The acid generating layer-forming composition of claim 1 which further comprises a release agent.

3. The acid generating layer-forming composition of claim 1 , wherein the photoacid generator comprises p-toluenesulfonic acid-1,8-naphthalimide.

4. The acid generating layer-forming composition of claim 1 , wherein a solids concentration of the photoacid generator ranges from 0.1 wt % to 20 wt %.

5. A kit for producing an electroconductive film or an electroconductive pattern, which kit is characterized by separately comprising:
a polymer film-forming composition which includes an electrically conductive polymer, and
an acid generating layer-forming composition which includes an acid proliferating agent and a photoacid generator, wherein the photoacid generator comprises an aryl sulfonic acid ester of naphthaleneimide, wherein a ratio of a content of the photoacid generator to a content of the acid proliferating agent ranges from 1:5 to 1:30.

6. The electroconductive film or electroconductive pattern producing kit of claim 5 , wherein the acid generating layer forming composition further includes a release agent.

7. The electroconductive film or electroconductive pattern producing kit of claim 5 , wherein the electrically conductive polymer includes poly(3,4-ethylenedioxythiophene) and the acid proliferating agent is a compound that generates an alkyl or aryl sulfonic acid via acid catalysis.

8. The electroconductive film or electroconductive pattern producing kit of claim 6 , wherein the electrically conductive polymer includes poly(3,4-ethylenedioxythiophene) and the acid proliferating agent is a compound that generates an alkyl or aryl sulfonic acid via acid catalysis.

Assignees

• Univ Tokyo Science Found
• Nissan Chemical Ind Ltd

Inventors

• Arimitsu Koji
• Wakabayashi Makoto

Classifications

• H01B1/127 Primary

  comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes · CPC title

• G03F7/093

  characterised by antistatic means, e.g. for charge depletion · CPC title

• C03C17/28

  with organic material (C03C17/34, C03C17/44 take precedence) · CPC title

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• H01B13/003

  using irradiation · CPC title