Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid
US-9458415-B2 · Oct 4, 2016 · US
US11446708B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11446708-B2 |
| Application number | US-201816172139-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 26, 2018 |
| Priority date | Dec 4, 2017 |
| Publication date | Sep 20, 2022 |
| Grant date | Sep 20, 2022 |
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Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.
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We claim: 1. A method of removing abrasive particles from a post-chemical-mechanical-processing (post-CMP) cleaning brush, the method comprising: providing a post-CMP cleaning brush having a polymeric surface and having abrasive particle residue at the polymeric surface, the polymeric surface including polymer made from monomer that comprises a vinyl alcohol monomer and the abrasive particle residue comprising abrasive particles having hydrogen bonding groups at surfaces of the particles, providing a cleaning solution having a pH in a range from 1 to 4, the cleaning solution comprising: cleaning agent and particle removal agent, and removing the abrasive particle residue from the polymeric surface by contacting the polymeric surface with the cleaning solution. 2. The method of claim 1 , wherein the cleaning solution has a pH in a range from about 2 to 3.5. 3. The method of claim 1 , wherein the particle removal agent includes one or more hydrogen bonding groups. 4. The method of claim 3 , wherein the hydrogen bonding groups are: a carboxylic acid, an amino group, an alcohol, a phosphine, phosphate, phosphonate, an alkanolamine, a carbamide, a urea, urethane, ester, a betaine, a silanol group or a sulfur-containing group. 5. The method of claim 3 , wherein the particle removal agent is: a carboxylic acid compound, an amino acid compound, a polyol with at least 3 hydroxy groups, a polyalkyleneoxide homo- or copolymer, an amine-containing homopolymer or copolymer. 6. The method of claim 5 , wherein the particle removal agent is: lactic acid, maleic acid, urea, glycolic acid, sorbitol, borax (i.e., sodium borate), proline, a betaine, glycine, histidine, TRIS (tris(hydroxymethyl) aminomethane), dimethyl sulfoxide, sulfolane, glycerol, sorbitol, xylitol, fructose, mannitol, arabinol, and dextran or a combination thereof. 7. The method of claim 1 , wherein the abrasive particles exhibit a positive charge at the pH of the cleaning solution. 8. The method of claim 1 , wherein the hydrogen bonding group is a silanol (SiOH) group. 9. The method of claim 1 , wherein the abrasive particles are selected from: silica particles, ceria particles, ceria oxide particles, alumina particles, titanium dioxide, zirconia, diamonds or silicon carbide particles or a combination thereof. 10. The method of claim 1 , wherein the cleaning agent comprises one or more of a chelating agent and an organic solvent. 11. The method of claim 1 , wherein the cleaning agent comprises citric acid, monoethanol amine, polyacrylic acid, or a combination thereof.
using mainly scrubbing means, e.g. brushes · CPC title
using fluids · CPC title
Aminoacids · CPC title
Organic solvents · CPC title
Cleaning involving contact with liquid · CPC title
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