Specific conductivity measurement method, recording medium recording specific conductivity calculation program, and specific conductivity measurement system

US11435385B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11435385-B2
Application numberUS-202016850054-A
CountryUS
Kind codeB2
Filing dateApr 16, 2020
Priority dateApr 23, 2019
Publication dateSep 6, 2022
Grant dateSep 6, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A specific conductivity measurement method includes: performing first measurement to obtain a resonance frequency f1 that is outputted to a measuring device when the first and second dielectric flat plates each have a thickness t1, and an unloaded Qu1 that corresponds to the resonance frequency f1; performing second measurement to obtain a resonance frequency f2 that is outputted to the measuring device when the first and second dielectric flat plates each have a thickness t2 that is different from the thickness t1, and an unloaded Qu2 that corresponds to the resonance frequency f2; and calculating a specific conductivity σr of the copper foil and the first and second conductor flat plates based on an arithmetic equation that includes the resonance frequency the unloaded Qu1, the resonance frequency f2, and the unloaded Qu2.

First claim

Opening claim text (preview).

What is claimed is: 1. A specific conductivity measurement method comprising: obtaining, by a computer, a resonance frequency f 1 that is acquired by a measuring device coupled to a resonator, which includes a circular copper foil, first and second dielectric flat plates that are disposed on both surface sides of the copper foil to sandwich the copper foil, first and second conductor flat plates that each have a hole at a center part and that sandwich the first and second dielectric flat plates from both sides with the centers of the first and second conductor flat plates aligned with the centers of the first and second dielectric flat plates, and excitation wires that are disposed in the respective holes of the first and second conductor flat plates, based on the first and second dielectric flat plates that each has a thickness t 1 , and an unloaded Q u1 that corresponds to the resonance frequency f 1 ; obtaining a resonance frequency f 2 that is acquired by the measuring device based on the first and second dielectric flat plates that each has a thickness t 2 that is different from the thickness t 1 , and an unloaded Q u2 that corresponds to the resonance frequency f 2 ; and calculating a specific conductivity σ r of the copper foil and the first and second conductor flat plates based on an arithmetic equation that includes the resonance frequency f 1 , the unloaded Q u1 , the resonance frequency f 2 , and the unloaded Q u2 . 2. The specific conductivity measurement method according to claim 1 , wherein the calculating includes calculating the specific conductivity σ r based on Equation (1): σ r ⁡ ( f 0 ) = 1 πμ 0 ⁢ σ 0 ⁢ 1 f 0 ⁡ [ t f ⁢ ⁢ 2 - t f ⁢ ⁢ 1 ⁢ ⁢ Q u ⁢ ⁢ 1 ⁢ Q u ⁢ ⁢ 2 t f ⁢ ⁢ 1 ⁢ t f ⁢ ⁢ 2 ⁢ ⁢ Q u ⁢ ⁢ 2 - Q u ⁢ ⁢ 1

Assignees

Inventors

Classifications

  • of plate type, i.e. with the sample sandwiched in the middle · CPC title

  • Measuring-systems or electronic circuits (G01R27/2635, G01R27/2682 take precedence) · CPC title

  • Cavities, resonators, free space arrangements, reflexion or interference arrangements (G01R27/2647 takes precedence; optical methods G01R27/2682) · CPC title

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What does patent US11435385B2 cover?
A specific conductivity measurement method includes: performing first measurement to obtain a resonance frequency f1 that is outputted to a measuring device when the first and second dielectric flat plates each have a thickness t1, and an unloaded Qu1 that corresponds to the resonance frequency f1; performing second measurement to obtain a resonance frequency f2 that is outputted to the measuri…
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification G01R27/2623. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 06 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).