General four-port on-wafer high frequency de-embedding method

US9922888B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9922888-B2
Application numberUS-201615143921-A
CountryUS
Kind codeB2
Filing dateMay 2, 2016
Priority dateMar 30, 2016
Publication dateMar 20, 2018
Grant dateMar 20, 2018

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Abstract

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The present invention provides a general four-port on-wafer high frequency de-embedding method. The method comprises: for each on-wafer de-embedding dummy, building a model considering the distributive nature of high frequency characteristics of the on-wafer de-embedding dummy; obtaining the intrinsic Y-parameter admittance matrix of said N on-wafer de-embedding dummies by calculation or simulation by using said models; and solving the equation set which the corresponding measurement and calculation or simulation data of said on-wafer de-embedding dummies satisfy for the elements of the related admittance matrices of the parasitic four-port network to be stripped in de-embedding and model parameters of models on which said calculation or simulation is based.

First claim

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The invention claimed is: 1. A general four-port on-wafer high frequency de-embedding method, comprising the following steps: 1.1: fabricating, together with a device under test (DUT) to be de-embedded, N on-wafer de-embedding dummies; 1.2: measuring to obtain the whole Y-parameter admittance matrix Y M of said DUT and the whole Y-parameter admittance matrix Y Mj (j=1,2, . . . , N) of each of said de-embedding dummies; 1.3: for each de-embedding dummy, building a model considering the distributive nature of high frequency characteristics of the de-embedding dummy; 1.4: obtaining the intrinsic Y-parameter admittance matrix Y Aj (p 1 , p 2 , . . . p M ) (j=1,2, . . . , N) of said N de-embedding dummies by calculation or simulation by using said models, where, p 1 , p 2 , . . . , p M are M model parameters of models on which said calculation or simulation is based, and 4N−16≥M; 1.5: solving an equation set Y Mj =Y ee −Y ei (Y Aj (p 1 , p 2 , . . . p M )+Y ii ) −1 Y ie (j=1,2, . . . , N) for the elements of four sub-matrices Y ee , Y ii , Y ei and Y ie of the admittance matrix Y of the parasitic four-port network to be stripped in de-embedding and said model parameters p 1 , p 2 , . . . , p M as unknowns, wherein, as shown in the following equation, Y ee , Y ii , Y ei and Y ie as four sub-matrices, form an admittance matrix Y of said parasitic four-port network: Y = [ Y ee Y ei Y ie Y ii ] ; and 1.6: substituting Y ee , Y ii , Y ei and Y ie obtained in Step 1.5 and the whole Y-parameter admittance matrix Y M of said DUT obtained by measurement in Step 1.2 into Equation Y A =Y ii −Y ie (Y M −Y ee ) −1 Y ei , to obtain by calculation the intrinsic Y-parameter admittance matrix Y A of said DUT. 2. The general four-port on-wafer high frequency de-embedding method according to claim 1 , characterized in that solving the equation set Y Mj =Y ee −Y ei (Y Aj (p 1 , p 2 , . . . p M )+Y ii ) −1 Y ie (j=1,2, . . . , N) for the elements of four sub-matrixes Y ee , Y ii , Y ei and Y ie of the admittance matrix Y of the parasitic four-port network to be stripped in de-embedding and said model parameters p 1 , p 2 , . . . , p M as unknowns in Step 1.5 comprises the following steps: 2.1: assigning initial values to said model parameters p 1 , p 2 , . . . p M , respectively; 2.2: obtaining the values of Y Aj (p 1 , p 2 , . . . p M )(j=1,2, . . . , N) by calculation or simulation by using the assigned model parameters p 1 , p 2 , . . . p M ; 2.3: after solving an equation set Y Mj =Y ee −Y ei (Y Aj (p 1 , p 2 , . . . p M )+Y ii ) −1 Y ie (j=1,2,3,4) by using the known measurement values Y Mj (j=1,2,3,4) of the first four de-embedding dummies and said calculated or simulated values Y Aj (p 1 , p 2 , . . . p M )(j=1,2,3,4) to obtain the values of Y ee , Y ii , Y ei and Y ie , substituting the known measurement values Y Mj (j=5,6, . . . , N) of the remaining de-embedding dummies and said obtained values of Y ee , Y ii , Y ei and Y ie into Y Dj =−Y ii −Y ie (Y Mj −Y ee ) −1 Y ei (j=5,6, . . . , N) to obtain by calculation the de-embedded Y-parameter admittance matrix Y Dj (j=5,6, . . . , N) of said remaining de-embedding dummies; 2.4: comparing the calculated Y Dj (j=5,6, . . . , N) with the calculated or simulated values Y Aj (p 1 , p 2 , . . . p M )(j=5,6, . . . , N) of the corresponding remaining de-embedding dummies already obtained in Step 2.1, determining final values for undetermined model parameters p 1 , p 2 , . . . p M which are necessary for the calculation or simulation of the de-embedding dummies, if a difference between the two meets the set error standard, and correcting the values of the model parameters p 1 , p 2 , . . . p M and reassigning them, and then turning back to Step 2.2, if the difference between the two does not meet the set error standard. 3. A general four-port on-wafer high frequency de-embedding method of passivity, reciprocity and symmetry, comprising the following steps: 3.1: fabricating, together with a device under test (DUT) to be de-embedded, N de-embedding dummies of passivity, reciprocity and symmetry; 3.2: measuring to obtain the whole Y-parameter admittance matrix Y M of said DUT and the whole Y-parameter admittance matrix Y Mj (j=1,2, . . . , N) of each of said de-embedding dummies; 3.3: for each de-embedding dummy, building a model considering the distributive nature of high frequency characteristics of the de-embedding dummy; 3.4: obtaining the intrinsic Y-parameter admittance matrices Y Aj (p 1 , p 2 , . . . p M )(j=1,2, . . . , N) of said N de-embedding dummies by calculation or simulation by using said models, where, p 1 , p 2 , . . . , p M are M model parameters of models on which said calculation or simulation is based, and 2N−6≥M; 3.5: solving an equation set Y Mj =Y ee −Y ei (Y Aj (p 1 , p 2 , . . . p M )+Y ii ) −1 Y ei (j=1,2, . . . , N) for the elements of three sub-matrices Y ee , Y ii and Y ei of the admittance matrix Y of the parasitic four-port network to be stripped in de-embedding and said model parameters p 1 , p 2 , . . . , p M as unknowns, wherein, as shown in the following equation, Y ee , Y ii and Y ei , as three sub-matrices, form the admittance matrix Y of said parasitic four-port network: Y = [ Y ee Y ei Y ei Y ii ] ; and 3.6: substituting Y ee , Y ii and Y ei obtained in Step 3.5 and the whole Y-parameter admittance matrix Y M of said DUT obtained by measurement in Step 3.2 into Equation Y A =−Y ii −Y ei (Y M −Y ee ) −1 Y ei , to obtain by calculation the intrinsic Y-parameter admittance matrix Y A of said DUT. 4. The special general four-port on-wafer high frequency de-embedding method according to claim 3 , characterized in that solving the equation set Y Mj =Y ee −Y ei (Y Aj (p 1 , p 2 , . . . p M )+Y ii ) −1 Y ei (j=1,2, . . . , N for the elements of three sub-matri

Assignees

Inventors

Classifications

  • Circuits for electrically characterising or monitoring manufacturing processes, e.g. circuits in tested chips or circuits in testing wafers · CPC title

  • Interconnections for measuring or testing, e.g. probe pads · CPC title

  • H10P74/207Primary

    Electrical properties, e.g. testing or measuring of resistance, deep levels or capacitance-voltage characteristics · CPC title

  • H01L22/14Primary

    Electricity · mapped topic

  • Measuring-systems or electronic circuits (G01R27/2635, G01R27/2682 take precedence) · CPC title

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What does patent US9922888B2 cover?
The present invention provides a general four-port on-wafer high frequency de-embedding method. The method comprises: for each on-wafer de-embedding dummy, building a model considering the distributive nature of high frequency characteristics of the on-wafer de-embedding dummy; obtaining the intrinsic Y-parameter admittance matrix of said N on-wafer de-embedding dummies by calculation or simula…
Who is the assignee on this patent?
Univ Tsinghua
What technology area does this patent fall under?
Primary CPC classification H10P74/207. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).