Process for producing fumed silica

Patent metadata

Field	Value
Publication number	US-11434139-B2
Application number	US-201816492746-A
Country	US
Kind code	B2
Filing date	Feb 22, 2018
Priority date	Mar 10, 2017
Publication date	Sep 6, 2022
Grant date	Sep 6, 2022

Abstract

Instabilities in the pyrogenic production of fumed silica caused by use of silanes having low ignition temperatures are caused by mixing the silanes, at a temperature above their dew point(s) with fuel gas in the absence of the use of a dynamic or static mixer, and then combining the resultant mixed stream with an oxygen containing gas and igniting. Self-ignition of the silanes and also the deposition of flammable or pyrophoric substances are avoided.

First claim

The invention claimed is:

1. A process for producing fumed silica in a reactor, comprising:
i) combining a stream (a) which comprises at least one fuel gas, with a stream (b), which comprises at least one of silicon compound(s) dichlorosilane (H 2 SiCl 2 ), monochlorosilane (H 3 SiCl), and monosilane (SiH 4 ) without using a static or dynamic mixing element, to give a stream (c),
ii) supplying the stream (c) to a stream (d) which comprises at least one oxygen source,
iii) mixing the stream (c) and the stream (d) with a static or dynamic mixer to give a stream (e),
iv) introducing stream (e) into a reaction chamber and igniting stream (e) to produce fumed silica, and
v) removing the fumed silica from the reactor.

2. The process of claim 1 , wherein the stream (b) further comprises at least one of tetrachlorosilane (SiCl 4 ), trichlorosilane (HSiCl 3 ), trichloromethylsilane (CH 3 SiCl 3 ) or dichloromethylsilane (CH 4 Cl 2 Si), as further silicon compounds(s).

3. The process of claim 1 , wherein the fuel gas comprises natural gas, hydrogen or a mixture of natural gas and hydrogen.

4. The process of claim 1 , wherein the fuel gas consists of hydrogen.

5. The process of claim 1 , wherein the stream (d) comprises air.

6. The process of claim 1 , wherein the proportion of the fuel gas is at least 1 percent by weight based on the total mass of the mixture of fuel gas and silicon compound(s).

7. The process of claim 1 , wherein the stream (c) is filtered prior to mixing with stream (d).

8. The process of claim 1 , wherein the streams (a) and (b) are contacted with each other in a filter.

9. The process of claim 1 , wherein the reactor is configured to allow the supply of stream (c) to be interrupted.

10. The process of claim 1 , which is first conducted in a start-up mode, and subsequently, in a sustained operation mode the stream (a) and the stream (b) are kept separated and are contacted with stream (d) upstream of a mixer, in any sequence.

11. The process of claim 10 , wherein the start-up mode has a duration of one hour at most.

12. The process of claim 1 , wherein stream (b) does not contain methyltrichlorosilane.

13. A process for producing fumed silica in a reactor, comprising:
i) combining a fuel gas-containing stream (a) with a stream (b) containing dichlorosilane, monochlorosilane, monosilane, or a mixture thereof, and optionally further containing one or more chlorosilanes selected from the group consisting of tetrachlorosilane, trichlorosilane, and methyldichlorosilane, without using a static or dynamic mixer, to give a stream (c),
ii) supplying the stream (c) to a stream (d) which comprises at least one oxygen source,
iii) mixing the stream (c) and the stream (d) with a static or dynamic mixer to give a stream (e),
iv) introducing stream (e) into a reaction chamber and igniting stream (e) to produce fumed silica, and
v) removing the fumed silica from the reactor.

14. The process of claim 1 , wherein in stream (c), solid deposits of reactive compounds are formed.

15. The process of claim 7 , wherein the filter fillers out solid deposits of reactive compounds from stream (c).

16. The process of claim 1 , wherein a distance between a point at which streams (a) and (b) contact each other to form stream (c) and a point at which stream (d) contacts stream (c) is at least 0.5 m.

17. The process of claim 1 , wherein a non-return fitting mechanically interrupts a pipeline connecting stream (c) with stream (d).

18. The process of claim 1 , wherein the temperature of stream (d) is at least 5° C. below the ignition temperature of stream (c).

19. The process of claim 1 , wherein the stream (c) has a higher ignition temperature than does a stream of identical component concentration which has been mixed using a static or dynamic mixer.

20. A process for producing fumed silica in a reactor, comprising:
i) combining a stream (a) which comprises at least one fuel gas, with a stream (b), which contains tetrachlorosilane, low ignition temperature silanes selected from the group consisting of dichlorosilane, monochlorosilane, monosilane, and mixtures thereof, and optionally dichloromethylsilane and chlorosilanes other than tetrachlorosilane, without using a static or dynamic mixer, to give a stream (c),
ii) supplying the stream (c) to a stream (d) which comprises at least one oxygen source,
iii) mixing the stream (c) and the stream (d) with a static or dynamic mixer to give a stream (e),
iv) introducing stream (e) into a reaction chamber and igniting stream (e) to produce fumed silica, and
v) removing the fumed silica from the reactor.

Assignees

• Wacker Chemie Ag

Inventors

• Salamon Marcel

Classifications

• C01B33/183 Primary

  by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane · CPC title