Surfactants for electronics

Patent metadata

Field	Value
Publication number	US-11427760-B2
Application number	US-202017127048-A
Country	US
Kind code	B2
Filing date	Dec 18, 2020
Priority date	Feb 5, 2020
Publication date	Aug 30, 2022
Grant date	Aug 30, 2022

Abstract

Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as siloxane derivatives of amino acids that have surface-active properties.

First claim

The invention claimed is:

1. A formulation for a pre-texturing agent, comprising:
at least one surfactant of Formula I,

wherein R 1 and R 2 may be the same or different, and comprise at least one group selected from the group consisting of C 1 -C 6 alkyl, optionally the C 1 -C 6 alkyl may include one or more of oxygen, nitrogen, or sulfur atoms or groups that include at least one of these atoms, and the alkyl chain may be optionally substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, sulfonate, carbonyl, carboxyl, and carboxylate;
n is an integer from 3 to 12;
the terminal nitrogen is optionally further substituted with R 3 , wherein R 3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C 1 -C 6 alkyl;
an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, and iodide; and
at least one of one or more solvents and one or more defoaming agents.

2. The formulation of claim 1 , further comprising one or more acids.

3. The formulation of claim 1 , further comprising one or more bases.

4. The formulation of claim 1 , further comprising one or more chelating agents.

5. The formulation of claim 1 , wherein the surfactant is 6-(dimethylamino)-N-(3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)hexanamide, having the following formula:

6. The formulation of claim 1 , wherein the surfactant is 6-(dimethylamino)-N-(3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)hexaminium chloride, having the following formula:

7. The formulation of claim 1 , wherein the surfactant is 3 6-((3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)amino)-N,N,N-trimethyl-6-oxohexan-1-aminium iodide, having the following formula:

8. The formulation of claim 1 , wherein the surfactant is 6-((3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)amino)-N,N-dimethyl-6-oxohexan-1-amine oxide, having the following formula:

9. The formulation of claim 1 , wherein the surfactant is 4-((6-((3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)amino)-6-oxohexyl)dimethylammonio)butane-1-sulfonate, having the following formula:

10. The formulation of claim 1 , wherein the surfactant is 5-((6-((3-(1,1,1,5,5,5-hexamethyl-3-((trimethylsilyl)oxy)trisiloxan-3-yl)propyl)amino)-6-oxohexyl)dimethylammonio)pentane1-sulfonate, having the following formula:

Assignees

• Advansix Resins & Chemicals Llc

Inventors

• Asirvatham Edward

Classifications

• G03F7/426

  containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title

• G03F7/425

  containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen · CPC title

• G03F7/0041

  providing an etching agent upon exposure (G03F7/075 takes precedence; photolytic halogen compounds G03F7/0295) · CPC title

• C11D3/34

  containing sulfur {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)} · CPC title

• C11D3/2065

  Polyhydric alcohols · CPC title