Stacked structure, magnetoresistive effect element, magnetic head, sensor, high frequency filter, and oscillator

US11422211B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11422211-B2
Application numberUS-202117148686-A
CountryUS
Kind codeB2
Filing dateJan 14, 2021
Priority dateSep 26, 2017
Publication dateAug 23, 2022
Grant dateAug 23, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A stacked structure is positioned on a nonmagnetic metal layer. The stacked structure includes a ferromagnetic layer and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer. The intermediate layer includes a NiAlX alloy layer represented by Formula (1): Niγ1Alγ2Xγ3 . . . (1), [X indicates one or more elements selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and satisfies an expression of 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3)].

First claim

Opening claim text (preview).

What is claimed is: 1. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a nonmagnetic spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the nonmagnetic spacer layer includes: a nonmagnetic metal layer, and at least one of a first intermediate layer provided under the nonmagnetic metal layer and a second intermediate layer provided over the nonmagnetic metal layer, the at least one of the first intermediate layer and the second intermediate layer being in contact with the nonmagnetic metal layer, and the first intermediate layer and the second intermediate layer include an NiAlX alloy that is expressed by General Formula (1): Ni γ1 Al γ2 X γ3   (1) where X indicates one element selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3). 2. The magnetoresistive effect element according to claim 1 , wherein the ferromagnetic layer includes a Heusler alloy represented by Formula (2): Co 2 L α M β   (2) where when L indicates one or more elements selected from the group consisting of Mn and Fe, M indicates one or more elements selected from the group consisting of Si, Al, Ga, and Ge, and α and β are set to have positive values. 3. The magnetoresistive effect element according to claim 2 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1) and (2-2): 0.7<α<1.6  (2-1) 2<α+β<2.6  (2-3). 4. The magnetoresistive effect element according to claim 2 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1), (2-2), and (2-3): 0.7<α<1.6  (2-1) 0.65<β<1.35  (2-2) 2<α+β<2.6  (2-3). 5. The magnetoresistive effect element according to claim 1 , wherein the nonmagnetic metal layer includes one or more elements selected from the group consisting of Ag, Cr, Al, Au, and NiAl. 6. The magnetoresistive effect element according to claim 1 , wherein X in the NiAlX alloy is one or more elements selected from the group consisting of Si, Cr, Fe, Co, and Zr. 7. The magnetoresistive effect element according to claim 1 , wherein, in Formula (1), an expression of 0<γ<0.3 is satisfied. 8. The magnetoresistive effect element according to claim 1 , wherein, when a thickness of the NiAlX alloy is set as t 1 , an expression of 0.2 nm≤t 1 ≤10 nm is satisfied. 9. A magnetic head comprising the magnetoresistive effect element according to claim 1 . 10. A sensor comprising the magnetoresistive effect element according to claim 1 . 11. A high frequency filter comprising the magnetoresistive effect element according to claim 1 . 12. An oscillator comprising the magnetoresistive effect element according to claim 1 . 13. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a nonmagnetic spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the nonmagnetic spacer layer includes: a nonmagnetic metal layer, and at least one of a first intermediate layer provided under the nonmagnetic metal layer and a second intermediate layer provided over the nonmagnetic metal layer, the first intermediate layer and the second intermediate layer include an NiAlX alloy that is expressed by General Formula (1): Ni γ1 Al γ2 X γ3   (1) where X indicates one element selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3), and a value of γ 3 changes along an in-plane direction or a thickness direction thereof. 14. The magnetoresistive effect element according to claim 13 , wherein the ferromagnetic layer includes a Heusler alloy represented by Formula (2): Co 2 L α M β   (2) where when L indicates one or more elements selected from the group consisting of Mn and Fe, M indicates one or more elements selected from the group consisting of Si, Al, Ga, and Ge, and α and β are set to have positive values. 15. The magnetoresistive effect element according to claim 14 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1) and (2-2): 0.7<α<1.6  (2-1) 2<α+β<2.6  (2-3). 16. The magnetoresistive effect element according to claim 14 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1), (2-2), and (2-3): 0.7<α<1.6  (2-1) 0.65<β<1.35  (2-2) 2<α+β<2.6  (2-3). 17. The magnetoresistive effect element according to claim 13 , wherein the nonmagnetic metal layer includes one or more elements selected from the group consisting of Ag, Cr, Al, Au, and NiAl. 18. The magnetoresistive effect element according to claim 13 , wherein X in the NiAlX alloy is one or more elements selected from the group consisting of Si, Cr, Fe, Co, and Zr. 19. The magnetoresistive effect element according to claim 13 , wherein, in Formula (1), an expression of 0<γ<0.3 is satisfied. 20. The magnetoresistive effect element according to claim 13 , wherein, when a thickness of the NiAlX alloy is set as t 1 , an expression of 0.2 nm≤t 1 ≤10 nm is satisfied. 21. A magnetic head comprising the magnetoresistive effect element according to claim 13 . 22. A sensor comprising the magnetoresistive effect element according to claim 13 . 23. A high frequency filter comprising the magnetoresistive effect element according to claim 13 . 24. An oscillator comprising the magnetoresistive effect element according to claim 13 . 25. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a nonmagnetic spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the nonmagnetic spacer layer includes: a nonmagnetic metal layer, and at least one of a first intermediate layer provided under the nonmagnetic metal layer and a second intermediate layer provided over the nonmagnetic metal layer, the first intermediate layer and the second intermediate layer include an NiAlX alloy that is expressed by General Formula (1): Ni γ1 Al γ2 X γ3   (1) where X indicates one element selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3), and a value of γ 3 decreases as becoming farther from the ferromagnetic layer in a thickness direction thereof. 26. The magnetoresistive effect element according to claim 25 , wherein the ferromagnetic layer includes a Heusler alloy represented by Formula (2): Co 2 L α M β   (2) where when L indicates one or more elements selected from the group consisting of Mn and Fe, M indicates one or more elements selected from the group consisting of Si, Al, Ga, and Ge, and α and β are set to have positive values. 27. The magnetoresistive effect element according to claim 26 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1) and (2-2): 0.7<α<1.6  (2-1) 2<α+β<2.6  (2-3). 28. The magnetoresistive effect element according to claim 26 , wherein, in the Heusler alloy represented by Formula (2)

Assignees

Inventors

Classifications

  • using elements in which the storage effect is based on magnetic spin effect · CPC title

  • Magnetic layer composition · CPC title

  • characterised by the composition of the intermediate layers {, e.g. seed, buffer, template, diffusion preventing, cap layers (H01F10/06 and H01F10/32 take precedence)} · CPC title

  • details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

  • Spin resolved measurements; Influencing spins during measurements, e.g. in spintronics devices · CPC title

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What does patent US11422211B2 cover?
A stacked structure is positioned on a nonmagnetic metal layer. The stacked structure includes a ferromagnetic layer and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer. The intermediate layer includes a NiAlX alloy layer represented by Formula (1): Niγ1Alγ2Xγ3 . . . (1), [X indicates one or more elements selected from the group consisting of Si,…
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification G01R33/093. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 23 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).