Magnetoresistive effect element
US-2020303634-A1 · Sep 24, 2020 · US
US10921392B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10921392-B2 |
| Application number | US-201816138031-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 21, 2018 |
| Priority date | Sep 26, 2017 |
| Publication date | Feb 16, 2021 |
| Grant date | Feb 16, 2021 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A stacked structure is positioned on a nonmagnetic metal layer. The stacked structure includes a ferromagnetic layer and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer. The intermediate layer includes a NiAlX alloy layer represented by Formula (1): Niγ1Alγ2Xγ3 . . . (1), [X indicates one or more elements selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and satisfies an expression of 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3)].
Opening claim text (preview).
What is claimed is: 1. A stacked structure which is positioned on a nonmagnetic metal layer, the structure comprising: a ferromagnetic layer; and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer, wherein the intermediate layer includes a NiAlX alloy layer represented by Formula (1), Ni γ1 Al γ2 X γ3 (1); wherein X indicates one or more elements selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and satisfies an expression of 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3); and wherein a value of γ3 changes along an in-plane direction or a thickness direction. 2. The stacked structure according to claim 1 , wherein the ferromagnetic layer includes a Heusler alloy represented by Formula (2): Co 2 L α M β (2); and wherein, when L indicates one or more elements selected from the group consisting of Mn and Fe, M indicates one or more elements selected from the group consisting of Si, Al, Ga, and Ge, and α and β are set to have positive values. 3. The stacked structure according to claim 2 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1), (2-2), and (2-3): 0.7<α<1.6 (2-1) 0.65<β<1.35 (2-2) 2<α+β<2.6 (2-3). 4. The stacked structure according to claim 1 , wherein the nonmagnetic metal layer includes one or more elements selected from the group consisting of Ag, Cr, Al, Au, and NiAl. 5. The stacked structure according to claim 1 , wherein the X in the NiAlX alloy layer is one or more elements selected from the group consisting of Si, Cr, Fe, Co, and Zr. 6. The stacked structure according to claim 1 , wherein, in Formula (1), an expression of 0<γ<0.3 is satisfied. 7. The stacked structure according to claim 1 , wherein, when a thickness of the NiAlX alloy layer is set as t1, an expression of 0.2 nm≤t1≤10 nm is satisfied. 8. A magnetoresistive effect element comprising: the stacked structure according to claim 1 . 9. A magnetic head comprising: the magnetoresistive effect element according to claim 8 . 10. A sensor comprising: the magnetoresistive effect element according to claim 8 . 11. A high frequency filter comprising: the magnetoresistive effect element according to claim 8 . 12. An oscillator comprising: the magnetoresistive effect element according to claim 8 . 13. A stacked structure which is positioned on a nonmagnetic metal layer, the structure comprising: a ferromagnetic layer; and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer, wherein the intermediate layer includes NiAlX alloy layer representated by Formula (1): Ni γ1 Al γ2 X γ3 (1); wherein X indicates one or more elements selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and satisfies an expression of 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3); and wherein a value of γ3 decreases as becoming farther from the ferromagnetic layer in a thickness direction thereof. 14. The stacked structure according to claim 13 , wherein the ferromagnetic layer includes Heusler alloy represented by Formula (2): Co 2 L α M β (2); and wherein, L indicates one or more elements selected from the group consisting of Mn and Fe, M indicates one or more elements selected from the group consisting of Si, Al, Ga, and Ge, and α and β are set to have positive values. 15. The stacked structure according to claim 14 , wherein, in the Heusler alloy represented by Formula (2), α and β satisfy the following relational expressions (2-1), (2-2), and (2-3): 0.7<α<1.6 (2-1) 0.65<β<1.35 (2-2) 2<α+β<2.6 (2-3). 16. The stacked structure according to claim 13 , wherein the nonmagnetic metal layer includes one or more elements selected from the group consisting of Ag, Cr, Al, Au, and NiAl. 17. The stacked structure according to claim 13 , wherein the X in the NiAlX alloy layer is one or more elements selected from the group consisting of Si, Cr, Fe, Co, and Zr. 18. The stacked structure according to claim 13 , wherein, in Formula (1), an expression of 0<γ<0.3 is satisfied. 19. The stacked structure according to claim 13 , wherein, when a thickness of the NiAlX alloy layer is set as t1, an expression of 0.2 nm≤t1≤10 nm is satisfied. 20. A magnetoresistive effect element comprising: the stacked structure according to claim 13 . 21. A magnetic head comprising: the magnetoresistive effect element according to claim 20 . 22. A sensor comprising: the magnetoresistive effect element according to claim 20 . 23. A high frequency filter comprising: the magnetoresistive effect element according to claim 20 . 24. An oscillator comprising: the magnetoresistive effect element according to claim 20 .
Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy · CPC title
using multilayer structures, e.g. giant magnetoresistance sensors (thin magnetic films H01F10/00) · CPC title
Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding · CPC title
Magnetic layer composition · CPC title
large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.