Electrochemical processing device and method for operating electrochemical processing device

Patent metadata

Field	Value
Publication number	US-11414776-B2
Application number	US-201916411589-A
Country	US
Kind code	B2
Filing date	May 14, 2019
Priority date	Dec 10, 2018
Publication date	Aug 16, 2022
Grant date	Aug 16, 2022

Abstract

An electrochemical processing device includes a current supply unit, a jig, and a controller. The current supply unit provides current for an electrochemical process. The jig includes a clamping region for clamping a substrate, a plurality of processing electrodes disposed in the clamping region and connected to the current supply unit, and a plurality of measuring electrodes disposed in the clamping region. The controller is connected to the plurality of measuring electrodes. When the jig clamps the substrate to perform the electrochemical process, the controller provides a measuring current to the measuring electrode to measure the thickness of the metal layer of the substrate.

First claim

What is claimed is:

1. An electrochemical processing device, comprising:
a current supply unit, used to provide a current for performing an electrochemical process;
a jig, comprising:
a clamping region, used to clamp a substrate;
a plurality of processing electrodes, disposed in the clamping region, the plurality of processing electrodes being connected to the current supply unit; and
a plurality of measuring electrodes, disposed in the clamping region; and

a controller, connected to the plurality of measuring electrodes when the jig clamps the substrate to perform the electrochemical process, the controller providing a measuring current to the plurality of measuring electrodes to measure the thickness of a metal layer of the substrate.

2. The electrochemical processing device as claimed in claim 1 , wherein the substrate has a plurality of space regions, disposed in a region where the substrate is clamped by the clamping region.

3. The electrochemical processing device as claimed in claim 1 , wherein the measuring current provided by the controller is an alternating current.

4. The electrochemical processing device as claimed in claim 3 , wherein the number of the plurality of measuring electrodes is two, and when the jig clamps the substrate, a line segment of the two measuring electrodes passes through the center of gravity of the substrate.

5. The electrochemical processing device as claimed in claim 3 , wherein the number of the plurality of measuring electrodes is four and the four measuring electrodes define a rectangle, and wherein a line segment between a first electrode and a second electrode of the four measuring electrode is in parallel with and equal to a line segment between a third electrode and a fourth electrode of the four measuring electrodes and a line segment between the first electrode and the third electrode is in parallel with and equal to a line segment between the second electrode and the fourth electrode.

6. The electrochemical processing device as claimed in claim 5 , wherein when the jig clamps the substrate to perform the electrochemical process,
the controller provides the measuring current to the first electrode and the second electrode, and measures the voltage between the third electrode and the fourth electrode, thereby measuring and calculating a first resistance;
the controller provides the measuring current to the third electrode and the fourth electrode, and measures the voltage between the first electrode and the second electrode, thereby measuring and calculating a second resistance;
the controller provides the measuring current to the first electrode and the third electrode, and measures the voltage between the second electrode and the fourth electrode, thereby measuring and calculating a third resistance;
the controller provides the measuring current to the second electrode and the fourth electrode, and measures the voltage between the first electrode and the third electrode, thereby measuring and calculating a fourth resistance; and
the controller calculates the thickness of the metal layer of the substrate according to the first resistance, the second resistance, the third resistance, and the fourth resistance.

7. A method for operating an electrochemical processing device, comprising:
clamping a substrate in a clamping region of a jig to perform an electrochemical process; and
providing a measuring current to a plurality of measuring electrodes in the clamping region by a controller to measure the thickness of the metal layer of the substrate when performing the electrochemical process.

8. The method as claimed in claim 7 , wherein the measuring current provided by the controller is an alternating current.

9. The method as claimed in claim 7 , wherein the number of the plurality of measuring electrodes is two and when the jig clamps the substrate, a line segment of the two measuring electrodes passes through the center of gravity of the substrate.

10. The method as claimed in claim 7 , wherein the number of the plurality of measuring electrodes is four and the four measuring electrodes define a rectangle, and wherein a line segment between a first electrode and a second electrode of the four measuring electrodes is in parallel with and equal to a line segment between a third electrode and a fourth electrode of the four measuring electrodes, and a line segment between the first electrode and the third electrode is in parallel with and equal to a line segment between the second electrode and the fourth electrode.

11. The method as claimed in claim 10 , wherein the step of performing the electrochemical process comprises:
providing the measuring current to the first electrode and the second electrode, and measuring the voltage between the third electrode and the fourth electrode, thereby measuring and calculating a first resistance;
providing the measuring current to the third electrode and the fourth electrode, and measuring the voltage between the first electrode and the second electrode, thereby measuring and calculating a second resistance;
providing the measuring current to the first electrode and the third electrode, and measuring the voltage between the second electrode and the fourth electrode, thereby measuring and calculating a third resistance;
providing the measuring current to the second electrode and the fourth electrode, and measuring the voltage between the first electrode and the third electrode, thereby measuring and calculating a fourth resistance; and
calculating the thickness of the metal layer of the substrate by the controller according to the first resistance, the second resistance, the third resistance, and the fourth resistance.

Assignees

• Ind Tech Res Inst

Inventors

• Lin Shih-Ming
• Yen Ming-Huei

Classifications

• H10P74/23

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0426

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• H10P50/667

  by liquid etching only · CPC title

• H10P74/207

  Electrical properties, e.g. testing or measuring of resistance, deep levels or capacitance-voltage characteristics · CPC title