Nanopore forming method and uses thereof

US11401625B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11401625-B2
Application numberUS-202117174230-A
CountryUS
Kind codeB2
Filing dateFeb 11, 2021
Priority dateMar 12, 2015
Publication dateAug 2, 2022
Grant dateAug 2, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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The invention relates to a method for making nanopores in thin layers or monolayers of transition metal dichalcogenides that enables accurate and controllable formation of pore within those thin layer(s) with sub-nanometer precision.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a nanopore in a layer of transition metal dichalcogenide crystals residing between a first electrode on a first side of the layer of transition metal dichalcogenide crystals and a second electrode on a second side of the layer of transition metal dichalcogenide crystals, wherein a first liquid is disposed on the first side and a second liquid is disposed on the second side, the method comprising: applying a voltage at a first voltage level across the first electrode and the second electrode and across the layer of transition metal dichalcogenide crystals such that an aperture is created in the layer of transition metal dichalcogenide crystals, wherein the voltage is an alternating current voltage; maintaining the voltage at the first voltage level for a specified amount of time, the specified amount of time corresponding to the aperture widening to have at least a specified diameter; and after the specified amount of time, reducing the applied voltage to a second voltage level to inhibit the widening of the aperture. 2. The method of claim 1 , wherein: the transition metal of the transition metal dichalcogenide crystals has an oxidation potential, and the first voltage level is higher than the oxidation potential. 3. The method of claim 1 , further comprising measuring a current between the first electrode and the second electrode, and wherein reducing the applied voltage comprises reducing the applied voltage after the current reaches a current level corresponding to the specified diameter of the aperture. 4. The method of claim 3 , wherein reducing the voltage comprises activating a switch through a feedback control circuit when the current level is reached. 5. The method of claim 4 , wherein the activation of the switch turns off the applied voltage. 6. The method of claim 1 , wherein the first voltage level is in a range from 800 mV to 1,000 mV. 7. The method of claim 1 , wherein the transition metal dichalcogenide crystals comprise a compound having a chemical formula MX2, wherein M is a transition metal atom, and wherein X is selected from a group consisting of sulfur, selenium, and tellurium. 8. The method of claim 1 , wherein the transition metal dichalcogenide crystals comprises a compound selected from the group consisting of MoS 2 , SnSe 2 , WS 2 , TeS 2 , MoSe 2 , WSe 2 , TeSe 2 NbS 2 , NbSe 2 , TiS 2 , TiSe 2 , ReS 2 , and ReSe 2 . 9. The method of claim 1 , wherein the layer of transition metal dichalcogenide crystals is disposed on an insulating material. 10. The method of claim 1 , wherein: the first electrode is disposed in the first liquid, and the second electrode is disposed in the second liquid. 11. The method of claim 1 , wherein the layer of transition metal dichalcogenide crystals has a thickness in a range from 0.3 nm to 5 nm. 12. The method of claim 1 , wherein the layer of transition metal dichalcogenide crystals is one monolayer thick. 13. The method of claim 1 , wherein the layer of transition metal dichalcogenide crystals is two monolayers thick. 14. The method of claim 1 , wherein the specified diameter is in a range from 1 nm to 5 nm. 15. The method of claim 1 , further comprising detecting a subunit of a polymer molecule in the nanopore based on electrical signals detected by at least one of the first electrode and the second electrode. 16. The method of claim 1 , wherein the specified amount of time is based on average times for apertures to be created with the specified diameter in previous samples. 17. The method of claim 1 , wherein the second voltage level is non-zero. 18. A method of forming a nanopore in a layer of transition metal dichalcogenide crystals residing between a first electrode on a first side of the layer of transition metal dichalcogenide crystals and a second electrode on a second side of the layer of transition metal dichalcogenide crystals, wherein a first liquid is disposed on the first side and a second liquid is disposed on the second side, the method comprising: applying a voltage at a first voltage level across the first electrode and the second electrode and across the layer of transition metal dichalcogenide crystals such that an aperture is created in the layer of transition metal dichalcogenide crystals, wherein the first voltage level is in a range from 800 mV to 1,000 mV; maintaining the voltage at the first voltage level for a specified amount of time, the specified amount of time corresponding to the aperture widening to have at least a specified diameter; and after the specified amount of time, reducing the applied voltage to a second voltage level to inhibit the widening of the aperture.

Assignees

Inventors

Classifications

  • Investigating individual macromolecules, e.g. by translocation through nanopores (Coulter counters in general G01N15/12; fabrication methods for nanoscale apertures B81B1/00; sequencing of nucleic acids C12Q1/68) · CPC title

  • Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects (for both electrolytic coating and removal C25D); Servicing or operating · CPC title

  • C25F3/12Primary

    of semiconducting materials · CPC title

  • specially adapted for biomolecules, e.g. gate electrode with immobilised receptors · CPC title

  • Methods for sequencing · CPC title

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Frequently asked questions

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What does patent US11401625B2 cover?
The invention relates to a method for making nanopores in thin layers or monolayers of transition metal dichalcogenides that enables accurate and controllable formation of pore within those thin layer(s) with sub-nanometer precision.
Who is the assignee on this patent?
Ecole Polytechnique Fed Lausanne Epfl, Roche Sequencing Solutions Inc
What technology area does this patent fall under?
Primary CPC classification C25F3/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 02 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).