Photocurable compositions for stereolithography, method of forming the compositions, stereolithography methods using the compositions, polymer components formed by the stereolithography methods, and a device including the polymer components

US11401353B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11401353-B2
Application numberUS-202016887320-A
CountryUS
Kind codeB2
Filing dateMay 29, 2020
Priority dateMay 30, 2019
Publication dateAug 2, 2022
Grant dateAug 2, 2022

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  1. Title

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  5. First independent claim

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Abstract

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A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010, preferably less than 0.008, more preferably less than 0.006, most preferably less than 0.004, each determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.

First claim

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What is claimed is: 1. A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, wherein the photoreactive monomer component comprises at least 50% by weight of a methacrylate-functional monomer, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010 determined by split-post dielectric resonator testing at 10 gigahertz at 23° C. 2. The photocurable composition of claim 1 , comprising 35 to 85 weight percent of the photoreactive oligomer component, 15 to 65 weight percent of the photoreactive monomer component, and 0.01 to 15 weight percent of the photoinitiation composition, wherein each weight percent is based on the total weight of the photoreactive oligomer component, the photoreactive monomer component, and the photoinitiation composition, and totals 100 weight percent. 3. The photocurable composition of claim 1 , wherein the hydrophobic oligomer of the photoreactive oligomer component comprises a (meth)acrylate end group. 4. The photocurable composition of claim 1 , wherein the hydrophobic oligomer of the photoreactive oligomer component is a (meth)acrylate-derivatized polyester, a (meth)acrylate urethane-derivatized polybutadiene oligomer, or a combination thereof. 5. The photocurable composition of claim 1 , wherein the hydrophobic oligomer of the photoreactive oligomer component comprises a urethane (meth)acrylate-derivatized polybutadiene oligomer having a number average molecular weight of 500 to 5,000 grams per mole. 6. The photocurable composition of claim 1 , wherein the photoreactive monomer comprises a methacrylate end group. 7. The photocurable composition of claim 6 , wherein a monomer having an acrylate end group is present in an amount of 20 weight percent or less, based on the total weight of the photoreactive oligomer component and the photoreactive monomer component. 8. The photocurable composition of claim 7 , wherein the photoreactive monomer component comprises a combination of ethylene glycol dimethacrylate, trimethylol propane trimethacrylate, and isobornyl methacrylate. 9. The photocurable composition of claim 1 , further comprising a particulate filler in an amount of 5 to 60 vol % based on the total volume of the photocurable composition. 10. The photocurable composition of claim 9 , wherein the particulate filler comprises silica, alumina, calcium titanate, strontium titanate, barium titanate, barium nonatitanate, boron nitride, aluminum nitride, or a combination thereof. 11. The photocurable composition of claim 1 , wherein the photoinitiation composition further comprises an ultraviolet light-absorbing agent in an amount of 0.01 to 10 weight percent, based on the total weight of the photoreactive oligomer component, the photoreactive monomer component, and the photoinitiation composition, which totals 100 weight percent. 12. The photocurable composition of claim 1 , wherein the photoinitiation composition further comprises scintillating agent in an amount of 0.01 to 2 weight percent, based on the total weight of the photoreactive oligomer component, the photoreactive monomer component, and the photoinitiation composition and totals 100 weight percent. 13. The photocurable composition of claim 1 , having a relative permittivity of 2 to 12 at 10 gigahertz. 14. A three-dimensional structure comprising a photocured product of the composition of claim 1 . 15. The three-dimensional structure of claim 14 , having a dielectric loss of less than 0.004 at 10 GHz as determined by split-post dielectric resonator testing at 10 gigahertz at a temperature of 23° C. 16. The three-dimensional structure of claim 14 , wherein the structure is porous. 17. An electronic device comprising the three-dimensional structure of claim 14 . 18. The electronic device of claim 17 , wherein the device is an impedance-matching layer, a dielectric waveguide, a lens, a reflective array, an antenna matching structure, a superstrate, a coupler, a divider, a radome, or a dielectric antenna, wherein at least one electrical conductor is disposed on or in contact with the photocured product. 19. A stereolithographic method of manufacture of a three-dimensional polymer structure, the method comprising: providing a volume comprising the photocurable composition of claim 1 ; irradiating a portion of the composition with activating radiation in a pattern to form a photocured layer of the structure; contacting the layer with the photocurable composition; irradiating the photocurable composition with activating radiation in a pattern to form a second photocured layer on the first layer; and repeating the contacting and irradiating to form the three-dimensional polymer structure. 20. The method of claim 19 , further comprising thermally curing the three-dimensional structure. 21. A three-dimensional structure made by the method of claim 19 wherein the structure is porous. 22. An electronic device comprising the three-dimensional structure of claim 21 , wherein the device is an impedance-matching layer, a dielectric waveguide, a lens, a reflective array, an antenna matching structure, a superstrate, a coupler, a divider, a radome, or a dielectric antenna. 23. The photocurable composition of claim 1 , having a dielectric loss of less than 0.004. 24. The photocurable composition of claim 3 , wherein the hydrophobic oligomer of the photoreactive oligomer component comprises two or more methacrylate end groups. 25. The photocurable composition of claim 6 , wherein the photoreactive monomer comprises two or more methacrylate end groups. 26. The photocurable composition of claim 9 , comprising the particulate filler in an amount of 10 to 50 vol %, based on the total volume of the photocurable composition. 27. The photocurable composition of claim 10 , wherein the particulate filler comprises alumina, barium nonatitanate, or combination thereof. 28. The photocurable composition of claim 1 , wherein the photoreactive monomer component comprises at least 60% by weight of the methacrylate-functional monomer. 29. The photocurable composition of claim 1 , wherein the photoreactive monomer component comprises at least 70% by weight of the methacrylate-functional monomer.

Assignees

Inventors

Classifications

  • G03F7/027Primary

    Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

  • C08F279/02Primary

    on to polymers of conjugated dienes · CPC title

  • C08F2/50Primary

    with sensitising agents · CPC title

  • Production of three-dimensional images · CPC title

  • of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate · CPC title

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What does patent US11401353B2 cover?
A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator;…
Who is the assignee on this patent?
Rogers Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/027. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 02 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).