Methods of monitoring conditions associated with aging of silicon carbide power MOSFET devices in-situ, related circuits and computer program products

US11397209B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11397209-B2
Application numberUS-202016897448-A
CountryUS
Kind codeB2
Filing dateJun 10, 2020
Priority dateJun 18, 2019
Publication dateJul 26, 2022
Grant dateJul 26, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method of monitoring a condition of a SiC MOSFET can include (a) applying a first test gate-source voltage across a gate-source of a SiC MOSFET in-situ, the first test gate-source voltage configured to operate the SiC MOSFET in saturation mode to generate a first drain current in the SiC MOSFET, (b) applying a second test gate-source voltage across the gate-source of the SiC MOSFET in-situ, the second test gate-source voltage configured to operate the SiC MOSFET in fully-on mode to generate a second drain current in the SiC MOSFET, (c) determining a drain-source saturation resistance using the first drain current to provide an indication of a degradation of a gate oxide of the SiC MOSFET; and (d) determining a drain-source on resistance using the second drain current to provide an indication of a degradation of contact resistance of the SiC MOSFET.

First claim

Opening claim text (preview).

What is claimed: 1. A method of monitoring a condition of a SiC MOSFET, the method comprising: (a) applying a first voltage across a gate-source of a SiC MOSFET in-situ that is greater than a specified threshold voltage for the SiC MOSFET to conduct a current though a channel region in the SiC MOSFET; (b) determining whether the current exceeds a target current that is pre-selected to monitor a drain-source saturation mode resistance of the SiC MOSFET in-situ; (c) increasing the first voltage by an increment and iteratively performing (a) and (b) until the current exceeds the target current whereupon the first voltage is designated as a test gate-source voltage to be used in monitoring the drain-source saturation mode resistance of the SiC MOSFET in-situ; and then detecting a power-on event associated with operation of the SiC MOSFET in-situ for an application that provides an in-situ drain-source voltage across the SiC MOSFET in-situ; applying the test gate-source voltage across the gate-source of the SiC MOSFET; determining a drain current conducted though the channel region in the SiC MOSFET responsive to applying the test gate-source voltage; and determining the drain-source saturation mode resistance for the SiC MOSFET based on the drain current and the in-situ drain-source voltage. 2. The method according to claim 1 wherein the target current is preselected so that the in-situ drain-source voltage across the SiC MOSFET in-situ provides the target current into a drain of the SiC MOSFET in saturation mode. 3. The method according to claim 1 wherein the target current is preselected so that a change in the drain-source saturation mode resistance is measurable at sufficient resolution over aging of the SiC MOSFET in-situ. 4. The method according to claim 1 wherein the target current is preselected so as to decrease by at least about 30% responsive to the test gate-source voltage and the in-situ drain-source voltage during aging of the SiC MOSFET in-situ. 5. The method of claim 1 wherein applying the test gate-source voltage further comprises applying a test gate-source voltage pulse across the gate-source having a duration including a transient time interval followed by a measurement time interval. 6. The method of claim 5 wherein the duration of the test gate-source voltage pulse is limited to avoid test related aging of the SiC MOSFET due to heating. 7. The method of claim 1 wherein the in-situ drain-source voltage is provided upon completion of the power-on event by a circuit in which the SiC MOSFET is in-situ. 8. The method of claim 1 wherein the test gate-source voltage is provided by a circuit coupled to a gate of the SiC MOSFET. 9. The method of claim 1 wherein the SiC MOSFET is in-situ in a phase-leg based power converter circuit including a shunt resistor coupled in series with a source of the SiC MOSFET, the shunt resistor used to measure the drain current. 10. The method of claim 1 wherein the SiC MOSFET is in-situ in a circuit including a current sensor coupled in series with the drain of the SiC MOSFET in series with an inductive load.

Assignees

Inventors

Classifications

  • Adaptations of individual semiconductor devices to facilitate the testing thereof · CPC title

  • for testing field effect transistors, i.e. FET's · CPC title

  • Testing semiconductor operation lifetime or reliability, e.g. by accelerated life tests · CPC title

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What does patent US11397209B2 cover?
A method of monitoring a condition of a SiC MOSFET can include (a) applying a first test gate-source voltage across a gate-source of a SiC MOSFET in-situ, the first test gate-source voltage configured to operate the SiC MOSFET in saturation mode to generate a first drain current in the SiC MOSFET, (b) applying a second test gate-source voltage across the gate-source of the SiC MOSFET in-situ, t…
Who is the assignee on this patent?
Univ Texas
What technology area does this patent fall under?
Primary CPC classification G01R31/2621. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 26 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).