Coating processing apparatus, coating processing method, and storage medium

Patent metadata

Field	Value
Publication number	US-11378728-B2
Application number	US-201716313524-A
Country	US
Kind code	B2
Filing date	Jun 6, 2017
Priority date	Jun 30, 2016
Publication date	Jul 5, 2022
Grant date	Jul 5, 2022

Abstract

A coating processing apparatus that applies a coating liquid containing an optical material includes a substrate holder that holds a substrate, a coating nozzle that ejects the coating liquid to the substrate held by the substrate holder, and a moving mechanism that relatively moves the substrate holder and the coating nozzle in an orthogonal direction.

First claim

The invention claimed is:

1. A coating processing apparatus comprising:
a substrate holder that holds a substrate;
an elongated nozzle including a slit-shaped ejecting port that ejects a coating liquid containing an optical material to the substrate held by the substrate holder to apply the coating liquid to the substrate; and
a moving mechanism including a substrate mover and a nozzle mover that relatively moves the substrate holder and the elongated nozzle, respectively, in an orthogonal direction; and
a controller that controls the moving mechanism,
wherein the controller is configured to control a coating direction of the coating liquid applied to the substrate by controlling a relative moving speed of the substrate holder and the elongated nozzle,
the controller is configured to control the moving mechanism to move the substrate holder in one direction from a first position to a second position, and, at the same time, move the elongated nozzle in a direction orthogonal to the one direction while the coating liquid is ejected from the elongated nozzle, so as to apply the coating liquid in a direction inclined with respect to the substrate held by the substrate holder, and
wherein the slit-shaped ejecting port extends in the one direction for a distance longer than a moving range of the substrate between the first position and the second position in the one direction.

2. The coating processing apparatus according to claim 1 , wherein the moving speed of the elongated nozzle is the same as the moving speed of the substrate held by the substrate holder.

3. The coating processing apparatus according to claim 1 , wherein the substrate holder is smaller in size than the substrate in a plan view.

4. The coating processing apparatus according to claim 1 , wherein a collector for the coating liquid is provided below the substrate holder and the elongated nozzle.

5. A coating processing apparatus comprising:
a substrate holder that holds a substrate;
an elongated nozzle including a slit-shaped ejecting port that ejects a coating liquid containing an optical material to the substrate held by the substrate holder to apply the coating liquid to the substrate;
a moving mechanism including a substrate mover and a nozzle mover that relatively moves the substrate holder and the elongated nozzle, respectively, in an orthogonal direction; and
a controller that controls the moving mechanism,
wherein the controller is configured to control a coating direction of the coating liquid applied to the substrate by controlling a relative moving speed of the substrate holder and the elongated nozzle,
the elongated nozzle is provided in a state of being fixed,
the controller is configured to control the moving mechanism to move the substrate holder in the one direction, and, at the same time, move the substrate holder in a direction orthogonal to the one direction from a first position to a second position across the elongated nozzle while the coating liquid is ejected from the elongated nozzle, so as to move the substrate in a direction inclined with respect to the one direction and the orthogonal direction thereof to apply the coating liquid in a direction inclined with respect to the substrate held by the substrate holder, and
wherein the slit-shaped ejecting port extends in the one direction for a distance longer than a moving range of the substrate between the first position and the second position in the one direction.

6. The coating processing apparatus according to claim 5 , wherein the inclined direction is inclined by 45 degrees with respect to the one direction and the orthogonal direction thereof.

7. A coating processing method comprising:
ejecting a coating liquid containing an optical material from a slit-shaped ejecting port of an elongated nozzle while relatively moving a substrate holder that holds a substrate and the elongated nozzle in an orthogonal direction with respect to each other to apply the coating liquid to the substrate; and
moving the substrate holder in one direction from a first position to a second position, and at the same time, moving the elongated nozzle in a direction orthogonal to the one direction while the coating liquid is ejected from a slit-shaped ejecting port of the elongated nozzle, while controlling a relative moving speed of the substrate holder and the elongated nozzle, so as to apply the coating liquid in a direction inclined with respect to the substrate held by the substrate holder,
wherein the slit-shaped ejecting port extends in the one direction for a distance longer than a moving range of the substrate between the first position and the second position in the one direction.

8. The coating processing method according to claim 7 , wherein the elongated nozzle extends in the one direction, the substrate holder is moved in the one direction and, at the same time, the substrate holder is moved in the one direction and the direction orthogonal to the one direction, thereby a second coating liquid is applied to the substrate held by the substrate holder in the inclined direction with respect to the substrate held by the substrate holder.

9. The coating processing method according to claim 7 , wherein the elongated nozzle is provided in a state of extending in the one direction and being fixed, and
the substrate holder is moved in the one direction, and, at the same time, the substrate holder is moved in the one direction and the direction orthogonal to the one direction across the elongated nozzle, so as to apply a second coating liquid to the substrate held by the substrate holder in the inclined direction with respect to the substrate held by the substrate holder.

10. The coating processing method according to claim 7 , wherein the inclined direction is a direction that is inclined by 45 degrees with respect to the one direction and the orthogonal direction thereof.

11. The coating processing method according to claim 7 , wherein the coating liquid that is not applied to the substrate from among the coating liquid ejected from the elongated nozzle is collected by a collector provided below the substrate holder and the elongated nozzle.

12. A non-transitory computer-readable storage medium having stored therein a computer executable program that causes a computer to perform the coating processing method of claim 7 .

Assignees

• Tokyo Electron Ltd

Inventors

• Ikeda Fumihiko

Classifications

• G02B5/3016 Primary

  involving passive liquid crystal elements (optical properties of liquid crystals G02F1/0063; polarising elements associated with active liquid crystal devices G02F1/133528) · CPC title

• G02B5/30

  Polarising elements (light-modulating devices with active elements G02F1/00) · CPC title

• G02B1/11

  Anti-reflection coatings · CPC title

• G02B1/10 Primary

  Optical coatings produced by application to, or surface treatment of, optical elements (G02B1/08 takes precedence) · CPC title

• C03C17/002 Primary

  for flat glass, e.g. float glass · CPC title