Crucible molds

US11377751B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11377751-B2
Application numberUS-202016796482-A
CountryUS
Kind codeB2
Filing dateFeb 20, 2020
Priority dateFeb 20, 2020
Publication dateJul 5, 2022
Grant dateJul 5, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods for forming a unitized crucible assembly for holding a melt of silicon for forming a silicon ingot are disclosed. In some embodiments, the methods involve a porous crucible mold having a channel network with a bottom channel, an outer sidewall channel that extends from the bottom channel, and a central weir channel that extends from the bottom channel. A slip slurry may be added to the channel network and the liquid carrier of the slip slurry may be drawn into the mold. The resulting green body may be sintered to form the crucible assembly.

First claim

Opening claim text (preview).

What is claimed is: 1. A crucible mold comprising: a lower portion; an upper portion disposed above the lower portion, the upper portion forming: a central weir channel; and an inner weir channel; wherein the upper portion and lower portion together form:  a bottom channel; and  a sidewall channel fluidly connected to the bottom channel, wherein the central weir channel and inner weir channel extend from the bottom channel; and a central weir peg that extends laterally across the central weir channel to form an opening in a central weir of a crucible formed from the mold. 2. The crucible mold as set forth in claim 1 wherein the upper portion comprises a flange, the flange resting on the lower portion. 3. The crucible mold as set forth in claim 1 wherein the crucible mold is porous. 4. The crucible mold as set forth in claim 3 wherein the crucible mold is made of porous silica. 5. The crucible mold as set forth in claim 1 comprising an inner weir peg that extends laterally across the inner weir channel to form an opening in an inner weir of a crucible formed from the mold. 6. The crucible mold as set forth in claim 1 wherein the bottom channel is rounded. 7. The crucible mold as set forth in claim 1 wherein the upper portion has a main body having lower surface and the lower portion has a main body having an upper surface, the lower and upper surfaces forming the bottom channel and the sidewall channel. 8. The crucible mold as set forth in claim 7 wherein the upper portion comprises a flange that extends from the main body of the upper portion, the flange resting on the main body of the lower portion. 9. The crucible mold as set forth in claim 7 wherein at least a portion of the lower surface is rounded and at least portion of the upper surface is rounded.

Assignees

Inventors

Classifications

  • Moulds for making shaped articles with cavities or holes open to the surface {, e.g. with blind holes} · CPC title

  • Moulds or cores (uniquely adapted to particular casting processes B22D); Moulding processes · CPC title

  • C30B15/12Primary

    Double crucible methods · CPC title

  • Moulds therefor (absorbent moulds in general B28B7/344) · CPC title

  • C30B29/06Primary

    Silicon · CPC title

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What does patent US11377751B2 cover?
Methods for forming a unitized crucible assembly for holding a melt of silicon for forming a silicon ingot are disclosed. In some embodiments, the methods involve a porous crucible mold having a channel network with a bottom channel, an outer sidewall channel that extends from the bottom channel, and a central weir channel that extends from the bottom channel. A slip slurry may be added to the …
Who is the assignee on this patent?
Globalwafers Co Ltd
What technology area does this patent fall under?
Primary CPC classification C30B15/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 05 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).