Plasma treatment method

Patent metadata

Field	Value
Publication number	US-11373847-B2
Application number	US-201916664925-A
Country	US
Kind code	B2
Filing date	Oct 27, 2019
Priority date	Dec 29, 2016
Publication date	Jun 28, 2022
Grant date	Jun 28, 2022

Abstract

A plasma treatment method is provided. The method includes generating a planar plasma in a plasma treatment chamber, observing an effective influence region of the planar plasma by using an optical observation system in which an observation lens has a transparent substrate and a fluorescent coating thereon, adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma, and then adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma. A location of a sample is adjusted to within the effective influence region, and a plasma treatment is then performed on the sample.

First claim

What is claimed is:

1. A plasma treatment method, comprising:
generating a planar plasma in a plasma treatment chamber;
observing an effective influence region of the planar plasma by using an optical observation system, wherein the optical observation system comprises an observation lens, and the observation lens comprises a transparent substrate, a fluorescent coating located on a surface of the transparent substrate, and a shelter coating between the transparent substrate and the fluorescent coating;
adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate for obtaining a location and a thickness range of the effective influence region of the planar plasma;
adjusting a location of a sample to within the effective influence region; and
performing a plasma treatment on the sample.

2. The plasma treatment method of claim 1 , further comprising, before adjusting the location of the sample, adjusting a thickness and the location of the effective influence region of the planar plasma.

3. The plasma treatment method of claim 1 , wherein the step of observing the brightness change of the fluorescent coating and the transparent substrate comprises a visual observation or using a digital camera.

4. The plasma treatment method of claim 3 , further comprising using an external analysis equipment to confirm and check an accuracy of the digital camera.

5. The plasma treatment method of claim 1 , wherein the sample has a 3D surface, and the effective influence region of the planar plasma is changed by adjusting a pressure to process different regions on the 3D surface.

6. The plasma treatment method of claim 1 , further comprising, after generating the planar plasma, enlarging or shrinking the effective influence region of the planar plasma by adjusting a pressure.

7. The plasma treatment method of claim 6 , wherein the pressure is between 0.1 torr and 500 torr.

8. The plasma treatment method of claim 1 , wherein a gas flowing while generating the planar plasma comprises a reactive gas or an inert gas.

9. The plasma treatment method of claim 8 , wherein the inert gas comprises helium, neon, argon, nitrogen, or a combination thereof, and the reactive gas comprises oxygen, ammonia, hydrogen, or a combination thereof.

10. The plasma treatment method of claim 8 , wherein a flow of the gas is between 0.5 sccm and 200 sccm.

11. The plasma treatment method of claim 1 , wherein the thickness range of the effective influence region of the planar plasma is between 0.1 mm and 20.0 mm.

12. The plasma treatment method of claim 1 , wherein an electric field for generating the planar plasma is between 2 kV/cm and 30 kV/cm.

13. The plasma treatment method of claim 1 , further comprising, before performing the plasma treatment, adjusting an electric field of the planar plasma to change a hydrophilicity and a hydrophobicity of a surface of the sample.

14. The plasma treatment method of claim 1 , further comprising disposing a pattern mask on a surface of the sample to perform the plasma treatment on a predetermined site of the sample.

Assignees

• Ind Tech Res Inst

Inventors

• Hsieh Hung-Yuan

Classifications

• C23C16/04

  Coating on selected surface areas, e.g. using masks · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H01J37/32733

  Means for moving the material to be treated · CPC title

• C23C18/2006

  by other methods than those of C23C18/22 - C23C18/30 · CPC title

• H01J37/3299

  Feedback systems · CPC title