Optical patterning systems and methods
US-2021311397-A1 · Oct 7, 2021 · US
US11367539B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11367539-B2 |
| Application number | US-202017103240-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 24, 2020 |
| Priority date | Nov 27, 2019 |
| Publication date | Jun 21, 2022 |
| Grant date | Jun 21, 2022 |
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Disclosed herein are methods of manipulating particles on solid substrates via optothermally-gated photon nudging.
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What is claimed is: 1. A method comprising: illuminating a first location of an optothermal system with electromagnetic radiation, wherein the optothermal system comprises: a substrate having a first surface; a surfactant layer disposed on the first surface of the substrate, wherein the surfactant layer is a solid thin film; and a first particle disposed on the surfactant layer, such that the surfactant layer is between the first particle and the first surface of the substrate; wherein the first particle is a first optothermal particle, the substrate is an optothermal substrate, or a combination thereof; wherein: when the first particle is the first optothermal particle, then the first optothermal particle is in thermal contact with the surfactant layer; and when the substrate is the optothermal substrate, then the optothermal substrate is in thermal contact with the surfactant layer; wherein the first location of the optothermal system includes at least a portion of the first particle such that: the first particle scatters at least a portion of the electromagnetic radiation, thereby producing a first radiation-pressure force on the first particle; and when the first particle is the first optothermal particle, the first optothermal particle converts at least a portion of the electromagnetic radiation into thermal energy; wherein, when the substrate is the optothermal substrate, the optothermal substrate converts at least a portion of the electromagnetic radiation into thermal energy; and wherein the thermal energy converted by the first optothermal particle, the optothermal substrate, or a combination thereof is sufficient to generate a manipulation region at a location of the surfactant layer proximate to the first location of the optothermal system; thereby: generating the manipulation region at the location of the surfactant layer proximate to the first location of the optothermal system, wherein the manipulation region has a temperature sufficient to induce a first-order phase transition from a solid phase to a liquid or quasi-liquid phase in the portion of the surfactant layer within the manipulation region; inducing the first-order phase transition in the portion of the surfactant layer within the manipulation region; producing the first radiation-pressure force on the first particle, wherein the first radiation-pressure force is sufficient to translate the first particle from a first location within the manipulation region to a second location within the manipulation region; and translating the first particle from the first location within the manipulation region to the second location within the manipulation region. 2. The method of claim 1 , wherein the substrate comprises glass, quartz, silicon dioxide, silicon nitride, a polymer, or a combination thereof. 3. The method of claim 1 , wherein the substrate comprises the optothermal substrate and the optothermal substrate comprises a plasmonic substrate, a metal substrate, a dielectric substrate, or a combination thereof. 4. The method of claim 1 , wherein the substrate comprises the optothermal substrate and the optothermal substrate comprises a plasmonic substrate and the electromagnetic radiation comprises a wavelength that overlaps with at least a portion of the plasmon resonance energy of the plasmonic substrate such that the manipulation region is generated by plasmon-enhanced photothermal effects. 5. The method of claim 1 , wherein the first particle comprises a metal particle, a semiconductor particle, an inorganic particle, or a combination thereof. 6. The method of claim 1 , wherein the first particle comprises a semiconductor particle, the semiconductor particle comprising a semiconductor selected from the group consisting of GeAs, GaAs, TiO 2 , Si, and combinations thereof. 7. The method of claim 1 , wherein the first particle comprises an inorganic particle comprising an inorganic perovskite. 8. The method of claim 1 , wherein the first particle comprises an inorganic particle comprising barium titanate, titanium nitride, or a combination thereof. 9. The method of claim 1 , wherein the first particle comprises the first optothermal particle and the first optothermal particle comprises a plasmonic particle and the electromagnetic radiation comprises a wavelength that overlaps with at least a portion of the plasmon resonance energy of the plasmonic particle such that the manipulation region is generated by plasmon-enhanced photothermal effects. 10. The method of claim 1 , wherein the electromagnetic radiation has: a power density of from 0.1 mW/μm 2 to 15 mW/μm 2 ; a power of from 0.1 mW to 5 mW; or a combination thereof. 11. The method of claim 1 , wherein the surfactant layer comprises cetrimonium bromide (CTAB), cetrimonium chloride (CTAC), sodium dodecyl sulfate (SDS), poly(methyl methacrylate) (PMMA), or a combination thereof. 12. The method of claim 1 , wherein the surfactant layer has an average thickness of from 10 nm to 500 nm. 13. The method of claim 1 , wherein the first particle is not damaged during the method. 14. The method of claim 1 , further comprising: illuminating a third location of the optothermal system with electromagnetic radiation, wherein the optothermal system further comprises: a second particle disposed on the surfactant layer, such that the surfactant layer is between the second particle and the first surface of the substrate; wherein the second particle is a second optothermal particle, the substrate is the optothermal substrate, or a combination thereof; wherein: when the second particle is the second optothermal particle, then the second optothermal particle is in thermal contact with the surfactant layer; and when the substrate is the optothermal substrate, the optothermal substrate is in thermal contact with the surfactant layer; wherein the third location of the optothermal system includes at least a portion of the second particle such that: the second particle scatters at least a portion of the electromagnetic radiation, thereby producing a second radiation-pressure force on the second particle; and when the second particle is the second optothermal particle, the second optothermal particle converts at least a portion of the electromagnetic radiation into thermal energy; wherein, when the substrate is the optothermal substrate, the optothermal substrate converts at least a portion of the electromagnetic radiation into thermal energy; wherein the thermal energy converted by the second optothermal particle, the optothermal substrate, or a combination thereof is sufficient to generate a second manipulation region at a location of the surfactant layer proximate to the third location of the optothermal system; thereby: generating the second manipulation region at the location of the surfactant layer proximate to the third location of the optothermal system, wherein the second manipulation region has a temperature sufficient to induce the first-order phase transition from the solid phase to the liquid or quasi-liquid phase in the portion of the surfactant layer within the second manipulation region; inducing the first-order phase transition in the portion of the surfactant layer within the second manipulation region; producing the second radiation-pressure force on the second particle, wherein the second radiation-pressure force is sufficient to translate the second particle from a first location within the second manipulation region to a second location within the second manipulation region; and translating the second particle from the first location within the second manipulation region to th
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