Tin oxide mandrels in patterning

Patent metadata

Field	Value
Publication number	US-11355353-B2
Application number	US-201916260764-A
Country	US
Kind code	B2
Filing date	Jan 29, 2019
Priority date	Jan 30, 2018
Publication date	Jun 7, 2022
Grant date	Jun 7, 2022

Abstract

Tin oxide films are used as mandrels in semiconductor device manufacturing. In one implementation the process starts by providing a substrate having a plurality of protruding tin oxide features (mandrels) residing on an exposed etch stop layer. Next, a conformal layer of spacer material is formed both on the horizontal surfaces and on the sidewalls of the mandrels. The spacer material is then removed from the horizontal surfaces exposing the tin oxide material of the mandrels, without fully removing the spacer material residing at the sidewalls of the mandrel (e.g., leaving at least 50%, such as at least 90% of initial height at the sidewall). Next, mandrels are selectively removed (e.g., using hydrogen-based etch chemistry), while leaving the spacer material that resided at the sidewalls of the mandrels. The resulting spacers can be used for patterning the etch stop layer and underlying layers.

First claim

What is claimed is:

1. An etching apparatus comprising:
(a) an etching process chamber having an inlet for a process gas;
(b) a substrate holder configured for holding a semiconductor substrate in the etching process chamber; and
(c) a process controller comprising program instructions for:
(i) on the semiconductor substrate comprising a patterned photoresist layer overlying a tin oxide layer, and an intermediate layer comprising at least one of a silicon-containing material and a carbon-containing material, causing an etching of the intermediate layer to transfer a pattern of the patterned photoresist layer to the intermediate layer, followed by causing an etching of a plurality of openings in the tin oxide layer, wherein etching the plurality of openings in the tin oxide layer comprises etching the tin oxide layer using at least one of a hydrogen-based etch chemistry and a chlorine-based etch chemistry;
(ii) causing photoresist layer removal using an oxygen-based chemistry;
(iii) causing an intermediate layer removal to form a plurality of tin oxide protruding features on the substrate; and
(iv) causing an etching of a layer of a spacer material coating the plurality of tin oxide protruding features and an etch stop layer material, on the semiconductor substrate such that the spacer material is completely removed from the horizontal surfaces of the semiconductor substrate without being completely removed at the sidewalls of the plurality of tin oxide protruding features using a spacer material etch chemistry having an etch selectivity of greater than 1 for the spacer material relative to tin oxide, wherein the spacer material etch chemistry further has a selectivity of greater than 1 for the spacer material relative to the etch stop layer material, and wherein the etch stop layer material is different from both tin oxide and the spacer material.

2. The etching apparatus of claim 1 , wherein the spacer material is a silicon-containing material and the spacer material etch chemistry is a fluorine-based chemistry.

3. The etching apparatus of claim 2 , wherein the fluorine-based chemistry is a fluorocarbon-based chemistry and wherein the program instructions in (c) comprise program instructions for causing formation of a plasma in a gas comprising a fluorocarbon to etch the silicon- containing spacer material from the horizontal surfaces of the semiconductor substrate.

4. The etching apparatus of claim 1 , wherein the spacer material is selected from the group consisting of silicon oxide, silicon nitride, silicon carbide, SiOC, SiNO, SiCNO, and SiCN.

5. The etching apparatus of claim 1 , wherein the spacer material is titanium dioxide.

6. The etching apparatus of claim 5 , wherein the spacer material etch chemistry is a chlorine-based etch chemistry.

7. The etching apparatus of claim 1 , wherein the program instructions further comprise program instructions for causing removal of the plurality of the tin oxide protruding features without causing complete removal of spacer material that resided at the sidewalls of the plurality of the tin oxide protruding features.

8. The etching apparatus of claim 1 , wherein the program instructions further comprise program instructions for causing removal of the plurality of the tin oxide protruding features without causing complete removal of spacer material that resided at the sidewalls of the plurality of the tin oxide protruding features by exposing the semiconductor substrate to a hydrogen-based etch chemistry that results in a formation of a tin hydride.

9. The etching apparatus of claim 1 , wherein the program instructions further comprise program instructions for causing removal of the plurality of the tin oxide protruding features without causing complete removal of the spacer material that has previously resided at the sidewalls of the plurality of the tin oxide protruding features, thereby forming a plurality of spacers residing over the etch stop layer material, wherein causing removal of the plurality of the tin oxide protruding features comprises causing contacting of the semiconductor substrate with a plasma-activated hydrogen-containing reactant selected from the group consisting of H 2 , HBr, NH 3 , H 2 O, a hydrocarbon, and combinations thereof.

10. The etching apparatus of claim 9 , wherein the spacer material is a silicon-containing material.

11. The etching apparatus of claim 9 , wherein the spacer material is titanium dioxide.

12. The etching apparatus of claim 1 , wherein the apparatus is configured for generating a plasma in a process gas.

13. The etching apparatus of claim 1 , wherein the spacer material is a silicon-containing material, and the spacer material etch chemistry is a fluorine-based chemistry, wherein the program instructions further comprise program instructions for causing removal of the plurality of the tin oxide protruding features without causing complete removal of the spacer material that has previously resided at the sidewalls of the plurality of the tin oxide protruding features, thereby forming a plurality of spacers residing over the etch stop layer material, wherein causing removal of the plurality of the tin oxide protruding features comprises causing contacting of the semiconductor substrate with a tin oxide etch chemistry comprising plasma-activated hydrogen- containing reactant selected from the group consisting of H 2 , NH 3 , a hydrocarbon, and combinations thereof, wherein the tin oxide etch chemistry has an etch selectivity of greater than 1 for tin oxide relative to the silicon-containing spacer material.

14. An etching apparatus comprising:
(a) an etching process chamber having an inlet for a process gas;
(b) a substrate holder configured for holding a semiconductor substrate in the etching process chamber; and
(c) a process controller comprising program instructions for:
(i) on the semiconductor substrate comprising a plurality of first protruding features having a tin oxide layer coating the sidewalls of the plurality of first protruding features, etching and removing the plurality of first protruding features without completely removing the tin oxide layer that resided at the sidewalls of the plurality of the first protruding features to thereby form a plurality of tin oxide protruding features; and
(ii) after formation of the plurality of tin oxide protruding features, and after deposition of a layer of a spacer material to coat the plurality of tin oxide protruding features, causing an etching of the layer of the spacer material coating the plurality of tin oxide protruding features and an etch stop layer material, on the semiconductor substrate such that the spacer material is completely removed from the horizontal surfaces of the semiconductor substrate without being completely removed at the sidewalls of the plurality of tin oxide protruding features using a spacer material etch chemistry having an etch selectivity of greater than 1 for the spacer material relative to tin oxide, wherein the spacer material etch chemistry further has a selectivity of greater than 1 for the spacer material relative to the etch stop layer material, and wherein the etch stop layer material is different from both tin oxide and the spacer material.

15. The etching apparatus of claim 14 , wherein the plurality of first protruding features having a tin oxide layer coating the sidewalls of the plurality of first protruding features are photoresist protruding features.

Assignees

• Lam Res Corp

Inventors

• Yu Jengyi
• Tan Samantha Siamhwa
• Heo Seongjun
• Volosskiy Boris
• Kanakasabapathy Sivananda Krishnan
• Wise Richard
• Pan Yang
• Wu Hui-Jung

Classifications

• H10P14/3412

  including tin · CPC title

• H10P95/70

  Chemical treatments · CPC title

• H10P76/4085 Primary

  characterised by the processes involved to create the masks · CPC title

• H10P72/0612

  Production flow monitoring, e.g. for increasing throughput · CPC title

• H10P72/0606

  Position monitoring, e.g. misposition detection or presence detection · CPC title