Vacuum pump, main sensor, and thread groove stator

US11346349B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11346349-B2
Application numberUS-201816495296-A
CountryUS
Kind codeB2
Filing dateMar 2, 2018
Priority dateMar 23, 2017
Publication dateMay 31, 2022
Grant dateMay 31, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A vacuum pump includes: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor includes at least a pair of electrodes disposed in the internal flow path at an interval corresponding to the prescribed thickness, and a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, and the capacitance detection circuit detects that a deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in an increase rate of the capacitance.

First claim

Opening claim text (preview).

What is claimed is: 1. A vacuum pump, comprising: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor includes: at least a pair of electrodes disposed in the internal flow path at an interval corresponding to the prescribed thickness; and a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, and the capacitance detection circuit is configured to determine a rate of change of the capacitance between the pair of electrodes and to detect that a deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in the rate of change of the capacitance. 2. The vacuum pump according to claim 1 , wherein the interval of the pair of electrodes is set to one to two times an interval between the rotating portion and the stator portion at the detection object position. 3. The vacuum pump according to claim 1 , wherein the pair of electrodes have a flat plate shape and are disposed in parallel. 4. The vacuum pump according to claim 1 , wherein the pair of electrodes have a cylindrical shape and are disposed concentrically and coaxially. 5. The vacuum pump according to claim 1 , wherein the main sensor is disposed inside an outlet port-side flow path which connects an outlet of the exhaust mechanism and an outlet port of the vacuum pump to each other. 6. The vacuum pump according to claim 5 , wherein the main sensor is disposed at a portion farthest from the outlet port of the vacuum pump in the outlet port-side flow path. 7. The vacuum pump according to claim 1 , wherein the pair of electrodes are disposed so as to extend in a flow direction of gas that flows inside the internal flow path. 8. The vacuum pump according to claim 1 , wherein the exhaust mechanism includes a thread groove pump in a rearmost stage thereof, and a gas vent hole is provided in a vicinity of an outlet of the thread groove pump. 9. The vacuum pump according to claim 1 , further comprising an auxiliary sensor including a pair of electrodes which are disposed inside the internal flow path and which are connected to the capacitance detection circuit, wherein an interval between the pair of electrodes of the auxiliary sensor is set shorter than the interval between the pair of electrodes of the main sensor. 10. The vacuum pump according to claim 1 , being configured such that an applied voltage between the pair of electrodes of the main sensor is equal to or lower than 100 V. 11. The vacuum pump according to claim 1 , wherein an insulating layer is formed on a surface of the pair of electrodes of the main sensor. 12. The vacuum pump according to claim 1 , wherein the capacitance detection circuit and the pair of electrodes of the main sensor are only energized during detection. 13. A main sensor comprising: at least a pair of electrodes disposed in an internal flow path formed between a rotating portion and a stator portion of a vacuum pump at an interval corresponding to a prescribed thickness for deposited material; a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, and wherein the capacitance detection circuit is configured to determine a rate of change of the capacitance between the pair of electrodes and to detect that deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in the rate of change of the capacitance. 14. A thread groove stator of a thread groove pump in a vacuum pump, the thread groove stator comprising a gas vent hole in a vicinity of an outlet of the thread groove pump wherein the gas vent hole is positioned proximate a main sensor that comprises: at least a pair of electrodes disposed at an interval corresponding to a prescribed thickness for a deposited material; and a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, wherein the capacitance detection circuit is configured to determine a rate of change of the capacitance between the pair of electrodes and to detect that the deposited material has reached the prescribed thickness on the basis of a drop in the rate of change of the capacitance.

Assignees

Inventors

Classifications

  • using capacitive means · CPC title

  • for measuring thickness {(measuring during the manufacture of coatings C23C14/54)} · CPC title

  • F04D27/00Primary

    Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids · CPC title

  • Combinations of two or more different types of pumps · CPC title

  • Preventing clogging or obstruction of flow paths by dirt, dust, or foreign particles · CPC title

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What does patent US11346349B2 cover?
A vacuum pump includes: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor …
Who is the assignee on this patent?
Edwards Japan Ltd
What technology area does this patent fall under?
Primary CPC classification F04D27/00. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue May 31 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).