Positive electrode active material and preparation method thereof, positive electrode plate, secondary battery, battery module, battery pack, and electric apparatus
US-2024429384-A1 · Dec 26, 2024 · US
US11335845B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11335845-B2 |
| Application number | US-201916255069-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 23, 2019 |
| Priority date | Jan 23, 2018 |
| Publication date | May 17, 2022 |
| Grant date | May 17, 2022 |
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Methods for making metastable lead-free piezoelectric materials are presented herein.
Opening claim text (preview).
What is claimed is: 1. A ferroelectric induced piezoelectric material having a piezoelectric response (d 33 ) of greater than about 5.2 pm V −1 wherein the piezoelectric material comprises a metastable SrHfO 3 polymorph with a P4 mm structure and wherein the polymorph is grown on a substrate suitable for epitaxial growth of the polymorph; and wherein the substrate is SrTiO 3 . 2. The material of claim 1 wherein the polymorph has a breakdown strength of greater than about 25 MV/cm. 3. The material of claim 1 wherein the polymorph is capable of a piezoelectric response (e 33 ) of at least 8.8 C m −2 . 4. The material of claim 1 having an average coercive field of about 83 kVcm −1 and a remnant polarization of about 1.2 μCcm −2 . 5. The material of claim 1 wherein the polymorph is epitaxially stabilized by a substrate upon which the polymorph is grown. 6. A method for making a lead-free piezoelectric material comprising the steps of using pulsed laser deposition to grow epitaxial films from a SrHfO 3 target on a SrTiO 3 substrate wherein the lead-free piezoelectric material has a response of 5.2 pm V −1 for a 35 nm film, wherein the film comprises a metastable SrHfO 3 polymorph with a P4 mm structure and identifying the lead-free piezoelectric material comprising a piezoelectric tensor (e ij max ) of greater than 3 C m −2 by using density functional theory (DFT); and identifying a substrate that is capable of epitaxially stabilizing the piezoelectric material. 7. The method of claim 6 wherein the growth takes place at a temperature of greater than about 450° C. 8. The method of claim 6 wherein the growth takes place at a total pressure of about 100 mTorr oxygen. 9. The method of claim 6 wherein the growth takes place by using a pulse rate of the laser of between about 10 and about 40 Hz. 10. The method of claim 6 wherein the lead-free piezoelectric material has a breakdown strength of greater than about 25 MV/cm. 11. The method of claim 6 wherein the lead-free piezoelectric material is a film that is capable of a ferroelectric-induced large signal effective converse piezoelectric response of 5.2 pm V −1 . 12. The method of claim 6 wherein the lead-free piezoelectric material has an average coercive field of about 83 kVcm −1 and a remnant polarization of about 1.2 μCcm −2 .
Complex oxides · CPC title
characterised by the substrate · CPC title
obtained by TEM, STEM, STM or AFM · CPC title
Compounds of hafnium · CPC title
Heating of the material to be evaporated · CPC title
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