Charged particle beam apparatus

US11335535B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11335535-B2
Application numberUS-202016920898-A
CountryUS
Kind codeB2
Filing dateJul 6, 2020
Priority dateAug 8, 2019
Publication dateMay 17, 2022
Grant dateMay 17, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects electrons emitted from the sample in response to irradiation of the electron beam by the electron beam optical system. The calculator calculates a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points.

First claim

Opening claim text (preview).

What is claimed is: 1. A charged particle beam apparatus, comprising: a charged particle beam optical system configured to irradiate a plurality of irradiation points on a sample, which are different in position or time, with a charged particle beam; a detector configured to detect electrons emitted from the sample in response to irradiation of the charged particle beam by the charged particle beam optical system; a calculator configured to calculate a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points, by calculating the dependence relationship between the irradiation points while changing a scan direction of each said irradiation point from a first scan direction from a first of said plurality of irradiation points to a second of said plurality of irradiation points, to a second scan direction from the second irradiation point to the first irradiation point, said second scan direction being an opposite direction from said first scan direction; an estimated structure database configured to store a correspondence relationship between the dependence relationship between the irradiation points and one of a plurality of corresponding equivalent circuits of an internal device structure; and a comparator configured to output the corresponding equivalent circuit by comparing a calculation result by the calculator with the corresponding dependence relationship contained in the estimated structure database, wherein the calculator is configured to compare detection results by the detector at each time point when a predetermined irradiation point is continuously irradiated with the charged particle beam, so as to calculate the dependence relationship between the irradiation points. 2. The charged particle beam apparatus according to claim 1 , further comprising: a display device, wherein the calculator is configured to generate a directed graph indicating the dependency relationship between the irradiation points, and display the directed graph on the display device. 3. The charged particle beam apparatus according to claim 2 , wherein the directed graph includes a weighting coefficient indicating strength of the dependence relationship between the irradiation points.

Assignees

Inventors

Classifications

  • using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title

  • G01R31/307Primary

    of integrated circuits · CPC title

  • with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

  • H01J37/244Primary

    Detectors; Associated components or circuits therefor · CPC title

  • Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen · CPC title

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What does patent US11335535B2 cover?
Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects ele…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification G01R31/307. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 17 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).