Display substrate, manufacturing method thereof, and display apparatus

Patent metadata

Field	Value
Publication number	US-11329115-B2
Application number	US-201916620653-A
Country	US
Kind code	B2
Filing date	Mar 22, 2019
Priority date	Dec 6, 2018
Publication date	May 10, 2022
Grant date	May 10, 2022

Abstract

The present disclosure relates to a pixel structure. The pixel structure may include a base substrate; a first insulating island on a side of the base substrate; a first electrode on a side of the first insulating island opposite front the base substrate; a second electrode on the base substrate and at a peripheral area of the first insulating island; an active layer electrically connected to the first electrode and the second electrode; a second insulating layer on a side of the active layer opposite from the base substrate; a gate electrode on a side of the second insulating layer opposite from the base substrate; and a third insulating layer on a side of the gate electrode opposite from the base substrate.

First claim

What is claimed is:

1. A pixel structure, comprising:
a base substrate;
a first insulating island on a side of the base substrate;
a first electrode on a side of the first insulating island opposite from the base substrate;
a second electrode on the base substrate and at a peripheral area of the first insulating island;
an active layer electrically connected to the first electrode and the second electrode;
a second insulating layer on a side of the active layer opposite from the base substrate;
a gate electrode on a side of the second insulating layer opposite from the base substrate; and
a third insulating layer on a side of the gate electrode opposite from the base substrate; wherein,
the third insulating layer encloses a groove structure with the first electrode;
the third insulating layer covers at least a side surface of one of the active layer, the second insulating layer or the gate electrode to form the groove structure with the first electrode;
a height of the first insulating island in a direction perpendicular to the base substrate is greater than a height of the second electrode in the direction perpendicular to the base substrate;
the first electrode and the second electrode are two different electrodes selected from a source electrode and a drain electrode; and
wherein the second electrode comprises a first sub-electrode and a second sub-electrode spaced apart from each other, the first sub-electrode and the second sub-electrode are on opposite sides of the first insulating island.

2. The pixel structure of claim 1 , wherein a surface of the second electrode opposite from the base substrate is not in a same level with a surface of the first insulating island opposite from the base substrate.

3. The pixel structure of claim 1 , wherein the third insulating layer serves as side walls of the groove structure, and the first electrode serves as a bottom of the groove structure.

4. The pixel structure of claim 3 , wherein the second electrode is in contact with side surfaces of the first insulating island.

5. The pixel structure of claim 1 , wherein the first electrode is conformal with the first insulating island.

6. The pixel structure of claim 1 , wherein the active layer contacts with the first and second electrodes and with side surfaces of the first insulating island.

7. The pixel structure of claim 1 , wherein the second insulating layer is conformal with the active layer.

8. The pixel structure of claim 1 , wherein the gate electrode is conformal with the second insulating layer.

9. The pixel structure of claim 1 , wherein a portion of the third insulating layer is conformal with the gate electrode and another portion thereof covers side surfaces of the active layer, the second insulating layer and the gate electrode to form the groove structure with the first electrode.

10. The pixel structure of claim 1 , wherein the active layer contacts with a side surface of the first insulating island and a side surface of the first electrode.

11. The display substrate of claim 1 , wherein at least a surface of the third insulating layer opposite from the base substrate is hydrophobic.

12. A display apparatus, comprising the pixel structure of claim 1 .

13. A method of manufacturing a pixel structure, comprising:
forming a base substrate;
forming a first insulating island on a side of the base substrate;
forming a first electrode on a side of the first insulating island opposite from the base substrate;
forming a second electrode on the base substrate and at a peripheral area of the first insulating island;
forming an active layer electrically connected to the first electrode and the second electrode;
forming a second insulating layer on a side of the active layer opposite from the base substrate;
forming a gate electrode on a side of the second insulating layer opposite from the base substrate; and
forming a third insulating layer on a side of the gate electrode opposite from the base substrate; wherein,
the third insulating layer encloses a groove structure with the first electrode;
the third insulating layer covers at least a side surface of one of the active layer, the second insulating layer or the gate electrode to form the groove structure with the first electrode;
a height of the first insulating island in a direction perpendicular to the base substrate is greater than a height of the second electrode in the direction perpendicular to the base substrate;
the first electrode and the second electrode are two different electrodes selected from a source electrode and a drain electrode; and
the second electrode comprises a first sub-electrode and a second sub-electrode spaced apart from each other, and the first sub-electrode and the second sub-electrode are on opposite sides of the first insulating island.

14. The method of claim 13 , wherein a surface of the second electrode opposite from the base substrate is not in a same level with a surface of the first insulating island opposite from the base substrate.

15. The method of claim 13 , wherein the third insulating layer serves as side walls of the groove structure and the first electrode serves as a bottom of the groove structure.

16. The method of manufacturing a display substrate of claim 13 , further comprising:
exposing a portion of the third insulating layer outside the groove structure to an ultraviolet ray, so that a surface of the portion of the third insulating layer outside the groove structure opposite from the base substrate is hydrophobic.

Assignees

• Hefei Xinsheng Optoelectronics Technology Co Ltd
• Boe Technology Group Co Ltd

Inventors

• Song Wei
• Yan Liangchen
• Zhao Ce
• Kim Heekyu
• Ding Yuankui
• Cheng Leilei
• Hu Yingbin
• Li Wei
• Zhang Yang

Classifications

• H10K59/124

  Insulating layers formed between TFT elements and OLED elements · CPC title

• H10D30/6728 Primary

  Vertical TFTs · CPC title

• H10D30/6758

  characterised by the insulating substrates · CPC title

• H10D30/6757

  characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile (TFTs having channel structures for preventing kink or snapback effects H10D30/6708; TFTs having lightly-doped source or drain extensions H10D30/6715) · CPC title

• H10D30/6729

  characterised by the electrodes · CPC title