Water flux polymer membranes
US-9707524-B2 · Jul 18, 2017 · US
Block copolymer, preparation method thereof, and thin film structure comprising the same
US11319434B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11319434-B2 |
| Application number | US-201916731764-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 31, 2019 |
| Priority date | Dec 31, 2019 |
| Publication date | May 3, 2022 |
| Grant date | May 3, 2022 |
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- Title
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- Abstract
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Abstract
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A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.
First claim
Opening claim text (preview).
What is claimed is: 1. A block copolymer, comprising: a first block comprising repeat units represented by formula (I): wherein R comprises hydrogen or methyl, and R 3 comprises C1-5 alkyl; and a second block connected to the first block, wherein the second block comprises repeat units represented by formula (II) or (III): wherein R comprises hydrogen or methyl, R 3 comprises C1-5 alkyl, and R 1 and R 2 , independently, comprise C1-8 alkyl, wherein one end of the second block is connected to the first block, and the other end of the second block is connected to 2. The block copolymer as claimed in claim 1 , wherein the first block has a molecular weight of 3,000 to 60,000. 3. The block copolymer as claimed in claim 1 , wherein the second block has a molecular weight of 5,000 to 60,000. 4. The block copolymer as claimed in claim 1 , wherein one end of the first block is connected to the second block, and the other end of the first block is connected to 5. The block copolymer as claimed in claim 1 , wherein the block copolymer is represented by formula (IV): 6. The block copolymer as claimed in claim 5 , wherein the block copolymer has a molecular weight of 8,000 to 100,000. 7. A thin film structure, comprising: a polymer film having a surface; and the block copolymer as claimed in claim 1 , embedded in the polymer film. 8. The thin film structure as claimed in claim 7 , wherein the polymer film comprises polyvinylidene fluoride (PVDF), polysulfone (PS), polyether sulfone (PES), polyvinyl chloride (PVC) or polyacrylonitrile (PAN). 9. The thin film structure as claimed in claim 7 , wherein the second block has a coverage ratio, over the surface of the polymer film, of 20% to 60%.
Assignees
Inventors
Classifications
used for films · CPC title
Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers · CPC title
with only one layer of a composition containing a polymer binder (with more layers C08J7/042) · CPC title
Peroxides · CPC title
Acrylonitrile · CPC title
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Frequently asked questions
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- What does patent US11319434B2 cover?
- A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.
- Who is the assignee on this patent?
- Ind Tech Res Inst
- What technology area does this patent fall under?
- Primary CPC classification C08L53/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 03 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).