Cleaning water supply device

Patent metadata

Field	Value
Publication number	US-11319226-B2
Application number	US-201816603417-A
Country	US
Kind code	B2
Filing date	Mar 20, 2018
Priority date	Apr 14, 2017
Publication date	May 3, 2022
Grant date	May 3, 2022

Abstract

A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a cleaning water line for causing the cleaning water to flow, cleaning machines to which the cleaning water is supplied from the cleaning water line, a solute removal unit into which excess cleaning water is introduced from the cleaning water line, and a collecting line for returning collected water from which the solute is removed to a tank and the like.

First claim

The invention claimed is:

1. A cleaning water supply device, comprising:
an ultrapure water line;
a cleaning water production unit that produces cleaning water at a certain concentration by adding a pH adjuster and/or an oxidation-reduction potential adjuster to ultrapure water from the ultrapure water line;
a cleaning water line that performs supplying cleaning water to a cleaning machine from the cleaning water production unit; and
a removal unit that removes a solute from excess cleaning water from the cleaning water line, the removal unit including an ion exchange resin and/or a platinum group catalyst.

2. The cleaning water supply device according to claim 1 , wherein the cleaning water production unit comprises means for supplying the ultrapure water to the ultrapure water line by a fixed amount, and means for supplying the solute to the ultrapure water by a fixed amount.

3. The cleaning water supply device according to claim 2 , wherein:
the cleaning machine is a multi-chamber single-water cleaning machine in which a large number of valves open and close on an irregular basis, including a plurality of individual cleaning machines each being connected to the cleaning water line; and
the cleaning water production unit produces the cleaning water by an amount that is larger than a total of maximum usage amount of all of the cleaning machines.

4. The cleaning water supply device according to claim 1 , wherein the removal unit comprises an ion exchange resin, an electric regeneration-type ion exchange device, or a platinum nano colloid supported resin.

5. The cleaning water supply device according to claim 3 , wherein an amount of the cleaning water supplied from the cleaning water production unit to the cleaning water line is 120% or more relative to a total of maximum usage amount of all of the individual cleaning machines.

6. The cleaning water supply device according to claim 5 , further comprising a plurality of branching pipes each being connected to the cleaning water line, a plurality of another pipes each being connected to each of the plurality of individual cleaning machines, a plurality of pumps and valves, one pump and one valve being interposed between one of the branching pipes and one of the another pipes, and a plurality of returning pipes each being connected between one of the another pipes and the cleaning water line through another valve, so that one or more individual cleaning machines required is only operated.

7. The cleaning water supply device according to claim 6 , wherein the removal unit includes the ion exchange resin and the platinum group catalyst.

8. The cleaning water supply device according to claim 7 , wherein the cleaning water production unit comprises a chemical solution tank, a chemical injection pump and a chemical injection pipe through which chemical in the chemical solution tank is supplied to the cleaning water line.

9. The cleaning water supply device according to claim 7 , wherein the cleaning water production unit includes a deaeration device for removing gas components, and a gas dissolving device provided in the cleaning water line.

10. The cleaning water supply device according to claim 8 , further comprising a hydrogen peroxide removal device provided in the cleaning water line, the chemical being added after the hydrogen peroxide removal device.

11. The cleaning water supply device according to claim 8 , wherein an inert gas is supplied to the chemical solution tank.

Assignees

• Kurita Water Ind Ltd

Inventors

• Morita Hiroshi
• GAN Nobuko

Classifications

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• C02F1/42 Primary

  by ion-exchange (ion-exchange in general B01J) · CPC title

• C02F2209/06

  pH · CPC title