Block copolymer

Patent metadata

Field	Value
Publication number	US-11299572-B2
Application number	US-201716463616-A
Country	US
Kind code	B2
Filing date	Nov 29, 2017
Priority date	Nov 30, 2016
Publication date	Apr 12, 2022
Grant date	Apr 12, 2022

Abstract

The present application can provide a block copolymer and a use thereof. The block copolymer of the present application can have excellent self-assembly properties or phase separation characteristics and excellent etching selectivity, and various other functions as required can be freely imparted thereto.

First claim

The invention claimed is:

1. A block copolymer comprising a polymer segment A having a unit represented by Formula 1 below and a polymer segment B different from the polymer segment A:

wherein, R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is an oxygen atom, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is an oxygen atom or —SiH 2 —, and Y is a monovalent substituent comprising an aromatic ring structure to which a linear hydrocarbon chain having 8 or more chain-forming atoms is linked, where a carbon atom of the linear hydrocarbon chain is optionally replaced with oxygen, nitrogen or sulfur, and the linear hydrocarbon chain is substituted with a hydrocarbon functional group containing one or more silicon atoms or iron atoms.

2. The block copolymer according to claim 1 , wherein X is an oxygen atom, —C(═O)—O— or —O—C(═O)—.

3. The block copolymer according to claim 1 , wherein X is —C(═O)—O—.

4. The block copolymer according to claim 1 , wherein the linear hydrocarbon chain comprises 8 to 20 chain-forming atoms.

5. The block copolymer according to claim 1 , wherein the chain-forming atom is carbon, oxygen, nitrogen or sulfur.

6. The block copolymer according to claim 1 , wherein the chain-forming atom is carbon or oxygen.

7. The block copolymer according to claim 1 , wherein Y is represented by Formula 2 below:
—P-Q-Z  [Formula 2]

wherein, P is an arylene group, Q is a single bond, an oxygen atom or —NR 3 —, where R 3 is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group, and Z is the linear hydrocarbon chain having 8 or more chain-forming atoms and substituted with a hydrocarbon functional group comprising one or more silicon atoms or iron atoms.

8. The block copolymer according to claim 1 , wherein the hydrocarbon functional group is a functional group represented by Formula 4 below or a silsesquioxanyl group:

wherein, each of R is independently a hydrogen atom or an alkyl group, L is a single bond or an oxygen atom, and n is a number in a range of 0 to 10.

9. The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 5 below

wherein, B is a monovalent substituent having an aromatic structure containing one or more halogen atoms.

10. The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 6 below:

wherein, X 2 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, and W is an aryl group containing at least one halogen atom.

11. The block copolymer according to claim 1 , wherein the polymer segment B comprises a unit of Formula 7 below:

wherein, X 2 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where X 1 is a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, and R 1 to R 5 are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, where the number of halogen atoms contained in R 1 to R 5 is 1 or more.

12. A polymer film comprising the block copolymer of claim 1 , wherein the block copolymer is self-assembled.

13. A method for forming a polymer film, which comprises forming on a substrate a polymer film comprising the block copolymer of claim 1 , wherein the block copolymer is self-assembled.

14. A patterning method comprising a process of selectively removing, from a laminate having a substrate, and a polymer film formed on the substrate and comprising the block copolymer of claim 1 , any one of the polymer segments in the block copolymer, wherein the block copolymer is self-assembled.

15. The block copolymer according to claim 1 , wherein the linear hydrocarbon chain is directly connected to the ring structure or is connected via a linker.

16. The block copolymer according to claim 15 , wherein the linker is an oxygen atom, a sulfur atom, —NR 1 —, —S(═O) 2 —, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, where R 1 is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group and X 1 is a single bond, an oxygen atom, a sulfur atom, —NR 2 —, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group, and where R 2 is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group.

17. The block copolymer according to claim 1 , wherein the hydrocarbon functional group is a trialkylsiloxy group, a butyldimethylsilane group, a trimethylsilane group, a dimethylsilylmethyltrimethylsilane group, a trimethylsilyltrisilane group or a silsesquioxanyl group.

18. The block copolymer according to claim 1 , wherein the polymer segment A is present in a range of 10 mol % to 90 mol %.

Assignees

• Lg Chemical Ltd

Inventors

• Lee Je Gwon
• Park No Jin
• Kim Jung Keun
• Choi Eun Young
• Ku Se Jin
• Lee Mi Sook
• Ryu Hyung Ju
• Yoon Sung Soo

Classifications

• H10P50/28

  of insulating materials · CPC title

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• G03F1/00

  Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof · CPC title

• C08F212/20

  Fluorine · CPC title

• C08F220/22

  Esters containing halogen · CPC title