Substrate treating method and treatment liquid
US-2024339317-A1 · Oct 10, 2024 · US
US11295947B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11295947-B2 |
| Application number | US-201917045615-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 26, 2019 |
| Priority date | May 2, 2018 |
| Publication date | Apr 5, 2022 |
| Grant date | Apr 5, 2022 |
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Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.
Opening claim text (preview).
The invention claimed is: 1. A process for producing ozone water comprising: A: preparing a solution A in which at least one of hydrochloric acid, acetic acid, and citric acid is added to pure water to adjust pH to a predetermined value (pH); B: dissolving ozone gas supplied at a predetermined supply flow rate (Fo) and a predetermined supply pressure (Po) into solution A supplied at a predetermined supply flow rate (Fw) and a predetermined supply pressure (Pw) to generate solution B; and C: heating any of the pure water, the solution A, and the solution B so that the liquid temperature of the ozone water to be generated becomes a predetermined temperature, wherein: (1) the predetermined value (pH) is 4 or less, (2) a concentration (N) (g/Nm 3 ) of ozone gas is 200 g per Nm 3 ≤N, (3) Po and Pw are within the following ranges: 0.15 MPa≤Po≤0.695 MPa, 0.1 MPa≤Pw≤0.7 MPa, a value of (Pw−Po) is within the following range: 0.005 MPa≤(Pw−Po)≤0.2 MPa, and a relation between Po and Pw is: Po<Pw, (4) Fo and Fw are within the following ranges: 0.25 NL/min≤Fo≤80 NL/min, 0.5 L/min≤Fw≤40 L/min, (5) the predetermined temperature within a range of from 60° C. to 90° C., and (6) the C: heating any of the pure water, the solution A, and the solution B is performed at a timing that includes at least before, after, or concurrently with the B: dissolving ozone gas. 2. A process for producing ozone water comprising: A: preparing a solution A in which at least one of hydrochloric acid, acetic acid, and citric acid is added to pure water to adjust pH to a predetermined value (pH); B: dissolving ozone gas supplied at a predetermined supply flow rate (Fo) and a predetermined supply pressure (Po) into solution A supplied at a predetermined supply flow rate (Fw) and a predetermined supply pressure (Pw) to generate solution B; and C: heating any of the pure water, the solution A, and the solution B so that the liquid temperature of the ozone water to be generated becomes a predetermined temperature, wherein: (1) the predetermined value (pH) is 4 or less, (2) a concentration (N) (g/Nm 3 ) of ozone gas is 200 g per Nm 3 ≤N, (3) Po and Pw are within the following ranges: 0.15 MPa≤Po≤0.695 MPa, 0.1 MPa≤Pw≤0.7 MPa, a value of (Pw−Po) is within the following range: 0.005 MPa≤(Pw−Po)≤0.2 MPa, and a relation between Po and Pw is: Po<Pw, and (4) Fo and Fw are within the following ranges: 0.25 NL/min≤Fo≤80 NL/min, 0.5 L/min≤Fw≤40 L/min. 3. A process using an ozone water produced by the process as defined in claim 2 . 4. The method for producing ozone water according to claim 2 , wherein the C: heating any of the pure water, the solution A, and the solution B is not performed.
Cleaning during device manufacture · CPC title
by chemical means · CPC title
Ozone · CPC title
Static mixers (colloid-mills B02C; mixing valves F16K11/00) · CPC title
containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds · CPC title
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