Pattern-forming method and composition

Patent metadata

Field	Value
Publication number	US-11270883-B2
Application number	US-202017018169-A
Country	US
Kind code	B2
Filing date	Sep 11, 2020
Priority date	Sep 12, 2019
Publication date	Mar 8, 2022
Grant date	Mar 8, 2022

Abstract

A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

First claim

What is claimed is:

1. A pattern-forming method comprising:
applying a first composition on a surface layer of a substrate to form a first coating film, the surface layer comprising a first region which comprises a metal atom, and a second region which comprises a silicon atom, wherein the first composition comprises a first polymer; and a solvent, the first polymer comprising: a first structural unit which comprises an acid-labile group; and a functional group which selectively bonds to a metal atom or an Si—OH bond;
heating the first coating film;
removing a portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated, thereby forming a first lamination portion in which the first coating film is formed on the substrate;
applying a second composition on the substrate on which the first lamination portion is formed to form a second coating film, wherein the second composition comprises: a second polymer comprising the first structural unit an acid generating agent and a solvent;
heating or exposing the second coating film such that the acid-labile group is dissociated from the first structural unit included in each of the first polymer and the second polymer due to an action of an acid generated from the acid generating agent upon the heating or exposing, and that graft polymerization occurs at dissociated portions of the first polymer and dissociated portions of the second polymer; and
rinsing the second coating film with a rinse agent to remove a portion of the second coating film heated or exposed, which is other than a portion formed on the first lamination portion, thereby forming a second lamination portion in which the second coating film is formed on the first lamination portion.

2. The pattern-forming method according to claim 1 , wherein the first polymer comprises the functional group at an end of a main chain thereof.

3. The pattern-forming method according to claim 1 , wherein the first polymer and second polymer each comprise the acid-labile group at an end of a side chain thereof.

4. The pattern-forming method according to claim 1 , wherein the functional group selectively bonds to the metal atom, and the functional group is a phosphonic acid group, a phosphonic acid ester group, a cyano group, a sulfanyl group, a monohydroxyboryl group, a phenolic hydroxyl group, a pyridine ring-containing group, an ethylenic carbon-carbon double bond-containing group, or a carbon-carbon triple bond-containing group.

5. The pattern-forming method according to claim 4 , wherein the functional group is a phosphonic acid group, a phosphonic acid ester group or a cyano group.

6. The pattern-forming method according to claim 1 , wherein the functional group selectively bonds to the Si—OH bond, and the functional group is a silanol group or a tertiary amino group.

7. The pattern-forming method according to claim 1 , wherein the first composition further comprises an acid generating agent.

8. The pattern-forming method according to claim 1 , wherein the second polymer further comprises the functional group.

9. The pattern-forming method according to claim 1 , wherein the first structural unit is represented by formula (1-1) or formula (1-2):

wherein,
in the formula (1-1) and the formula (1-2), R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; and X represents the acid-labile group; and
in the formula (1-1), R 2 represents a single bond, —O—, —COO—, or —CONH—; Ar represents a group obtained by removing from an arene having 6 to 20 ring atoms, (m+n+1) hydrogen atoms on an aromatic ring thereof; m is an integer of 0 to 10, wherein in a case in which m is 1, R 3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, in a case in which m is no less than 2, a plurality of R 3 s are identical or different from each other and each R 3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, or two or more of the plurality of R 3 s taken together represent an alicyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the two or more of the plurality of R 3 s bond; and n is an integer of 2 to 11, wherein a sum of m and n is no greater than 11, and in a case in which n is no less than 2, a plurality of Xs are identical or different from each other.

10. The pattern-forming method according to claim 9 , wherein X is represented by formula (2-1), formula (2-2), formula (2-3) or formula (2-4):

wherein, in the formulae (2-1) to (2-4), * denotes a bonding site to the oxygen atom in the formula (1-1) or the formula (1-2);
in the formula (2-1), R 4 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; R 5 and R 6 each independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R 5 and R 6 taken together represent an alicyclic structure having 3 to 20 ring atoms, together with the carbon atom to which R 5 and R 6 bond;
in the formula (2-2), R 7 represents a hydrogen atom; R 8 and R 9 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R 10 represents a divalent hydrocarbon group having 1 to 20 carbon atoms constituting an unsaturated alicyclic structure having 4 to 20 ring atoms, together with the carbon atom to which R 7 , R 8 , and R 9 each bond;
in the formula (2-3), R 11 and R 12 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, and R 13 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R 11 and R 12 taken together represent an alicyclic structure having 3 to 20 ring atoms, together with the carbon atom to which R 11 and R 12 bond, or R 12 and R 13 taken together represent an aliphatic heterocyclic structure having 5 to 20 ring atoms, together with the carbon atom to which R 12 bonds and with the oxygen atom to which R 13 bonds; and
in the formula (2-4), R 14 , R 15 , and R 16 each independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms.

11. The pattern-forming method according to claim 1 , wherein the metal atom constitutes a metal simple substance, an alloy, an electrically conductive nitride, or a silicide.

12. The pattern-forming method according to claim 1 , wherein the silicon atom constitutes a silicon atom simple substance, an oxide, a nitride, a carbon-doped oxide, a carbide, or a silicic acid ester.

13. The pattern-forming method according to claim 1 , wherein after the second coating film is rinsed, at least part of the portion of the second coating film which is formed on the first lamination portion remains.

14. The pattern-forming method according to claim 1 , further comprising:
applying a third composition on the substrate on which the second lamination portion is formed to form a third coating film, wherein the third composition comprises: a third polymer comprising the first structural unit; an acid generating agent; and a solvent;
heating or exposing the third coating film; and
rinsing the third coating film with a rinse agent to remove a portion of the third coating film heated or exposed, which is other than a portion formed on the second lamination portion, thereby forming a third lamination portion in which the third

Assignees

• Jsr Corp

Inventors

• Komatsu Hiroyuki
• SHIRATANI Motohiro

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P14/6528

  In-situ cleaning after layer formation, e.g. removing process residues · CPC title

• H10P14/683

  carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

• H10P14/6342 Primary

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title